Charge carrier transport and deep levels recharge in avalanche s-diodes based on GaAs

Carrier transport and deep-level recharging in semiconductor avalanche S-diode structures have been investigated. Gallium-arsenide n+–π–ν–n structures with the diffusion distribution of deep iron acceptors have been studied. It has been found by solving the continuity and Poisson equations with the use of a commercial software that the electron injection affects the avalanche breakdown voltage and the spacecharge region broadens due to capture of avalanche holes on negative iron ions in the π-region. It is demonstrated by comparing the results of numerical calculation with the experimental data that the S-shaped I–V characteristic of the diffusion avalanche S-diodes cannot be explained within the previously proposed mechanism of capture of avalanche holes on the deep iron levels

High oxygen sensitivity of TiO2 thin films deposited by ALD

The gas sensitivity and structural properties of TiO2 thin films deposited by plasma-enhanced atomic layer deposition (ALD) were examined in detail. The TiO2 thin films are deposited using Tetrakis(dimethylamido)titanium(IV) and oxygen plasma at 300 °C on SiO2 substrates followed by annealing at temperatures of 800 °C. Gas sensitivity under exposure to O2 within the temperature range from 30 °C to 700 °C was studied. The ALD-deposited TiO2 thin films demonstrated high responses to O2 in the dynamic range from 0.1 to 100 vol. % and low concentrations of H2, NO2. The ALD deposition allowed the enhancement of sensitivity of TiO2 thin films to gases. The greatest response of TiO2 thin films to O2 was observed at a temperature of 500 °C and was 41.5 arb. un. under exposure to 10 vol. % of O2. The responses of TiO2 thin films to 0.1 vol. % of H2 and 7 × 10–4 vol. % of NO2 at a temperature of 500 °C were 10.49 arb. un. and 10.79 arb. un., correspondingly. The resistance of the films increased due to the chemisorption of oxygen molecules on their surface that decreased the thickness of the conduction channel between the metal contacts. It was suggested that there are two types of adsorption centers on the TiO2 thin films surface: oxygen is chemisorbed in the form of O2– on the first one and O– on the second one

Charge carrier transport and deep levels recharge in avalanche s-diodes based on GaAs

Carrier transport and deep-level recharging in semiconductor avalanche S-diode structures have been investigated. Gallium-arsenide n+–π–ν–n structures with the diffusion distribution of deep iron acceptors have been studied. It has been found by solving the continuity and Poisson equations with the use of a commercial software that the electron injection affects the avalanche breakdown voltage and the spacecharge region broadens due to capture of avalanche holes on negative iron ions in the π-region. It is demonstrated by comparing the results of numerical calculation with the experimental data that the S-shaped I–V characteristic of the diffusion avalanche S-diodes cannot be explained within the previously proposed mechanism of capture of avalanche holes on the deep iron levels

β-Ga₂O₃ Schottky Barrier Diode with Ion Beam Sputter-Deposited Semi-Insulating Layer

Vertical Schottky barrier diodes based on an ion beam sputter (IBS)-deposited β-Ga2O3 film on a single-crystalline (2¯01) unintentionally doped (UID) β-Ga2O3 with a Ni contact were developed. To form ohmic Ti/Ni contacts, the IBS-Ga2O3/UID β-Ga2O3 structures were wet-etched, and an indium tin oxide (ITO) intermediate semiconductor layer (ISL) was deposited on the opposite surface of the UID β-Ga2O3. The IBS-deposited Ga2O3 layer was polycrystalline and semi-insulating. Low leakage currents, rectification ratios of 3.9 × 108 arb. un. and 3.4 × 106 arb. un., ideality factors of 1.43 and 1.24, Schottky barrier heights of 1.80 eV and 1.67 eV as well as breakdown voltages of 134 V and 180 V were achieved for diodes without and with ITO-ISL, respectively. The surface area of the IBS-Ga2O3 film acted as a thin dielectric layer and, together with the preliminary wet etching, provided low leakage currents and relatively high Schottky barrier heights. Diodes with a Schottky barrier based on a Ni/IBS-deposited Ga2O3 film contact were demonstrated for the first time

Avalanche delay and dynamic triggering in gaas-based s-diodes doped with deep level impurity

The article is concerned with a detailed switching delay effect exhibited by avalanche S-diodes-superfast GaAs closing switches doped with deep Fe centers. The current and voltage time dependences are simulated in a simplified generator. The dynamic electric field and charge profiles in the structures are calculated. This article describes an impact that Fe capture cross sections of free charge carriers have on delayed switching. The simulation results show that delayed switching is associated with deep center recharging in a double injection mode due to three different processes. There are two different delay mechanisms to be herewith distinguished. A delay effect is experimentally viewed to control the dynamic switching voltage (and the avalanche breakdown voltage) using constant voltage adjustment capability enabled by a triggering circuit supply. The authors demonstrate the way it is possible to adjust the amplitude of current nanosecond pulses in the range of 20-45 A through a lidar transmitter circuit with a semiconductor laser and nonoptimized S-diode. The findings are consistent with the results of numerical simulation

The mechanism of superfast switching of avalanche S-diodes based on GaAs doped with Cr and Fe

The results of theoretical and experimental investigation of charge carrier transport in avalanche S-diodes based on π-ν-n and π-n structures are presented. High-ohmic layers of the diodes were made by diffusion of deep chromium and iron acceptors into n-GaAs. It is shown that recharge of the deep acceptors in the avalanche regime should lead to expansion of the space charge region into the π-layer and formation of step-type current-voltage characteristics rather than the S-type. It has been found experimentally that the switching of the S-diode is superfast (the time of switching is less than the transient time of the carriers through the active region). The obtained results are in contradiction with the earlier proposed mechanism of deep-level recharging. Thus, this mechanism has been revised. The comparison of the obtained results with the literature data allows one to find the only mechanism of superfast switching, which is associated with generation of collapsing field domains due to the Gunn effect under the avalanche breakdown condition. According to the experiment, the switching time of S-diodes depends on the applied voltage and the type of the deep-level impurity. The S-diodes can operate in relaxation oscillator and sharper circuits. The use of the S-diodes in a sharper circuit with a moderate voltage rate of 1011 V/s allows generating the voltage pulses with amplitude of 700 V and a rising edge of 250 ps at a load of 50 Ω

The mechanism of superfast switching of avalanche S-diodes based on GaAs doped with Cr and Fe

The results of theoretical and experimental investigation of charge carrier transport in avalanche S-diodes based on π-ν-n and π-n structures are presented. High-ohmic layers of the diodes were made by diffusion of deep chromium and iron acceptors into n-GaAs. It is shown that recharge of the deep acceptors in the avalanche regime should lead to expansion of the space charge region into the π-layer and formation of step-type current-voltage characteristics rather than the S-type. It has been found experimentally that the switching of the S-diode is superfast (the time of switching is less than the transient time of the carriers through the active region). The obtained results are in contradiction with the earlier proposed mechanism of deep-level recharging. Thus, this mechanism has been revised. The comparison of the obtained results with the literature data allows one to find the only mechanism of superfast switching, which is associated with generation of collapsing field domains due to the Gunn effect under the avalanche breakdown condition. According to the experiment, the switching time of S-diodes depends on the applied voltage and the type of the deep-level impurity. The S-diodes can operate in relaxation oscillator and sharper circuits. The use of the S-diodes in a sharper circuit with a moderate voltage rate of 1011 V/s allows generating the voltage pulses with amplitude of 700 V and a rising edge of 250 ps at a load of 50 Ω

Avalanche delay and dynamic triggering in GaAs-based S-diodes doped with deep level impurity

Abstract The article is concerned with a detailed switching delay effect exhibited by avalanche S-diodes-superfast GaAs closing switches doped with deep Fe centers. The current and voltage time dependences are simulated in a simplified generator. The dynamic electric field and charge profiles in the structures are calculated. This article describes an impact that Fe capture cross sections of free charge carriers have on delayed switching. The simulation results show that delayed switching is associated with deep center recharging in a double injection mode due to three different processes. There are two different delay mechanisms to be herewith distinguished. A delay effect is experimentally viewed to control the dynamic switching voltage (and the avalanche breakdown voltage) using constant voltage adjustment capability enabled by a triggering circuit supply. The authors demonstrate the way it is possible to adjust the amplitude of current nanosecond pulses in the range of 20—45 A through a lidar transmitter circuit with a semiconductor laser and nonoptimized S-diode. The findings are consistent with the results of numerical simulation