MEASURING LOCAL QUANTUM YIELD OF PHOTOLUMINESCENCE AND PHOTOTRANSFORMATIONS WITH LASER SCANNING MICROSCOPE

Measurement of local quantum yields for the photoluminescence of semiconductor nanocrystals (quantum dots) and photoinduced transformations of dye molecules in polymer films is demonstrated using a laser scanning microscope capable of mapping luminescence spectra and intensities of transmitted laser light. The confocal scanning microscope (Zeiss LSM710) was applied for both the induction of photochemical transformations and measurement The luminescence quantum yield values for quantum dots in different locations of a polymer film were found to differ, ostensibly depending on their aggregation. To measure photoisomerization quantum yield, the effects of scanning a tiny area of a polymer film with a focused beam on the intensities of luminescence and transmitted light were monitored

Reindustrialization, International Practices, and the Opportunities of Ekaterinburg (the case of the Uralmash district)

The article deals with the international practices of industrial areas renovation in the US and Spain. The main positive trends of the countries' development are described. The article also presents the theory of Mazayev, G.V. regarding the ranking of technological paradigms and their interconnection with a modern city. The city of Ekaterinburg is reviewed as a multi-paradigm city that includes industrial areas of the III technological paradigm. Considering the renovation from the point of view of the international practices and Mazayev's theory, a conclusion regarding Russia, particularly, Ekaterinburg, the Uralmash district, is made. The optimal path of developing the area of Uralmashzavod, PJSC, is presented. The conclusions regarding Ekaterinburg and, particularly, the Uralmash district are made based on the foreign countries' experience: the best scenario for the area of Uralmashzavod, PJSC will be transformation into a technology park with the advantages stated herein. © 2019 Published under licence by IOP Publishing Ltd

Surface relief model for photopolymers without cover plating

Relief surface changes provide interesting possibilities for storing diffractive optical elements on photopolymers and are an important source of information to characterize and understand the material behaviour. In this paper we present a 3-dimensional model based on direct measurements of parameters to predict the relief structures generated on the material. This model is successfully applied to different photopolymers with different values of monomer diffusion. The importance of monomer diffusion in depth is also discussed.This work was supported by the Ministerio de Ciencia e Innovación of Spain under projects FIS2008-05856-C02-01 and FIS2008-05856-C02-02 and by the Generalitat Valenciana of Spain under project PROMETEO/2011/021