Electronic band structure of a Tl/Sn atomic sandwich on Si(111)

A two-dimensional compound made of one monolayer of Tl and one monolayer of Sn on Si(111) has been found to have a sandwichlike structure in which the Sn layer (having the milk-stool arrangement) resides on the bulklike terminated Si(111) surface and the Tl layer (having the honeycomb-chained-trimer arrangement) is located above the Sn layer. The electronic band structure of the compound contains two spin-split surface-state bands, of which one is nonmetallic and the other is metallic. Near the Fermi level the metallic band is split with the momentum splitting Δk∥=0.037 Å−1 and energy splitting ΔEF=167 meV. The steep dispersion of the band when crossing the Fermi level corresponds to an electron velocity of ≈8.5×105 m/s, which is comparable to the value reported for graphene. The 2D Fermi contours have almost circular shape with spin texture typical for hexagonal surfaces

Synthesis of two-dimensional TlxBi1-x compounds and Archimedean encoding of their atomic structure

Crystalline atomic layers on solid surfaces are composed of a single building block, unit cell, that is copied and stacked together to form the entire two-dimensional crystal structure. However, it appears that this is not an unique possibility. We report here on synthesis and characterization of the one-atomic-layer-thick TlxBi1−x compounds which display quite a different arrangement. It represents a quasi-periodic tiling structures that are built by a set of tiling elements as building blocks. Though the layer is lacking strict periodicity, it shows up as an ideally-packed tiling of basic elements without any skips or halting. The two-dimensional TlxBi1−x compounds were formed by depositing Bi onto the Tl-covered Si(111) surface where Bi atoms substitute appropriate amount of Tl atoms. Atomic structure of each tiling element as well as arrangement of TlxBi1−x compounds were established in a detail. Electronic properties and spin texture of the selected compounds having periodic structures were characterized. The shown example demonstrates possibility for the formation of the exotic low-dimensional materials via unusual growth mechanisms

Single layer nickel disilicide on surface and as embedded layer

Single monolayers of various materials (e.g. graphene, silicene, bismuthene, plumbene, etc) have recently become fascinating and promising objects in modern condensed-matter physics and nanotechnology. However, growing a monolayer of non-layered material is still challenging. In the present report, it will be shown that single monolayer NiSi2 can be fabricated at Si(111) surface stabilized by either Tl, Pb or In monolayers. Nickel atoms were found to intercalate the stabilizing metal layers upon deposition and to reside in the interstitial sites inside the first silicon bilayer of bulk-like-terminated Si(111)1×1 surface. The interstitial positions almost coincide with the bulk NiSi2 atomic positions thus forming NiSi2 single layer. Atomic and electronic structure of formed systems is described in detail by means of a set of experimental techniques, including low-energy electron diffraction, scanning tunneling microscopy, angle-resolved photoemission spectroscopy and also first-principles density-functional-theory calculations. Quality of formed single monolayer NiSi2 was additionally confirmed by in situ four-probe transport measurements that show that single monolayer NiSi2 preserves a metallic-type conductivity down to 2.0 K. Moreover it was found that delta-type structure with atomic sheet of NiSi2 silicide embedded into a crystalline Si matrix can be fabricated using room-temperature overgrowth of a Si film onto the Tl stabilized NiSi2 surface layer. Confinement of the NiSi2 layer to a single atomic plane has been directly confirmed by high-resolution transmission electron microscopy

STM investigation of 2D alloys and compounds on Si(111) and Ge(111) surfaces

The work was supported by the Russian Science Foundation (Grant 14-12-00479)