Compact imaging spectrometer for induced emissions

On the basis of spectral measurements made from the Space Shuttle and on models of the possible Space Station external environment, it appears likely that, even at the planned altitudes of Space Station, photon emissions will be induced. These emissions will occur to some degree throughout the ultraviolet-visible-infrared spectrum. The emissions arise from a combination of processes including gas phase collisions between relatively energetic ambient and surface emitted or re-emitted atoms or molecules, where the surface raises some species to excited energy states. At the present time it is not possible to model these processes or the anticipated intensity levels with any accuracy, as a number of fundamental parameters needed for such calculations are still poorly known or unknown. However, it is possible that certain spectral line and band features will exceed the desired goal that concomitant emissions not exceed the natural zodiacal background. Also, in the near infrared and infrared, it appears that this level will be exceeded to a significant degree. Therefore it will be necessary to monitor emission levels in the vicinity of Space Station, both in order to establish the levels and to better model the environment. A small spectrometer is briefly described which is suitable for monitoring the spectrum from 1200 A to less than or equal to 12,000 A. The instrument uses focal plane array detectors to image this full spectral range simultaneously. The spectral resolution is 4 to 12 A, depending on the portion of the wavelength range

Engineering support for an ultraviolet imager for the ISTP mission

Design and development activities were carried out for the Ultraviolet Imager (UVI) to be flown on the Polar Spacecraft of the INternational Solar Terrestrial Physics (ISTP) Mission. The following tasks were performed: (1) design and fabrication of prototype/engineering model of the UVI imager; (2) preliminary design review; (3) vacuum ultraviolet filter design; (4) auroral energy deposition code; (5) model of LBH vehicle glow; (6) laboratory measurement program of collision cross-sections; and (7) support of ISTP meetings

The Imaging Spectrometric Observatory for the ATLAS 1 mission

The Imaging Spectrometric Observatory (ISO) was flown on the ATLAS 1 mission and was enormously successful, providing a baseline database on the coupled stratospheric, mesospheric, thermospheric, and ionospheric regions. Specific ISO accomplishments include measurements of the hydroxyl radical, studies of the global ionosphere, retrieval of the concentrations of neutral species from the ISO data, studies of mesospheric oxygen emissions, retrieval of mesospheric O from oxygen emissions, studies of the OH Meinel bands and the search for the Herzberg III bands, search for metallic species, studies of thermospheric nitric oxide, auroral study of molecular nitrogen emissions, and studies of thermospheric species. Apart from participation in the data analysis, the primary post-flight responsibility of Marshall Space Flight Center was the delivery of the final post mission dataset. Support provided by the University of Alabama in Huntsville is described

Differential collision cross-sections for atomic oxygen: Analysis of space flight instruments for solar terrestrial physics

A summary of the status of the Cross-section Facility at MSFC is presented. A facility was designed, fabricated, assembled, tested, and operated for measurement of differential scattering cross sections important to understand the induced environment for a vehicle (e.g., Space Station) in low earth orbit. A user's manual for the facility is also presented. The performance of the facility was evaluated and found to be satisfactory in all the essential areas. Differential scattering cross sections were measured and results for the scattering measurements are included. Input to the development of the Ultraviolet Imager Optical System is also discussed. Design, fabrication, and evaluation of UV filters using a four-layer aluminum base are reported

VUV thin films, chapter 7

The application of thin film technology to the vacuum ultraviolet (VUV) wavelength region from 120 nm to 230 nm has not been fully exploited in the past because of absorption effects which complicate the accurate determination of the optical functions of dielectric materials. The problem therefore reduces to that of determining the real and imaginary parts of a complex optical function, namely the frequency dependent refractive index n and extinction coefficient k. We discuss techniques for the inverse retrieval of n and k for dielectric materials at VUV wavelengths from measurements of their reflectance and transmittance. Suitable substrate and film materials are identified for application in the VUV. Such applications include coatings for the fabrication of narrow and broadband filters and beamsplitters. The availability of such devices open the VUV regime to high resolution photometry, interferometry and polarimetry both for space based and laboratory applications. This chapter deals with the optics of absorbing multilayers, the determination of the optical functions for several useful materials, and the design of VUV multilayer stacks as applied to the design of narrow and broadband reflection and transmission filters and beamsplitters. Experimental techniques are discussed briefly, and several examples of the optical functions derived for selected materials are presented

Ionospheric effects in the Southern radiation anomaly

From introduction: As ionosphericist on the 4th South African National Antarctic Expedition, I spent twelve months at Sanae (70°18'S, 2°2l'W, L= 4) in 1963. In the course of routine vertical incidence soundings, it was noticed with some surprise that the frequency of occurrence of ionospheric blackouts was unexpectedly high. Initially this aroused considerable concern about the reliability of the equipment. In fact it has been · observed that some stations lying in and near the Southern Radiation Anomaly report such occasions as records lost due to non-ionospheric reasons. Coincidently, however, Gledhill and van Rooyen (1963), also of Rhodes University, predicted ionospheric irregularities and other geophysical phenomena in a region around Sanae where Ginsburg et al. (1962) observed high intensities of charged particles with Sputniks 5 and 6

Multilayer thin film design for far ultraviolet polarizers using an induced transmission and absorption technique

An explanation of induced transmission for spectral regions excluding the far ultraviolet (FUV) is given to better understand how induced transmission and absorption can be used to design effective polarizers in the FUV spectral region. We achieve high s-polarization reflectance and a high degree of polarization (P equals (Rs-Rp)/(Rs+Rp)) by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of Al as the substrate. For example, our polarizer designed for the Lyman-alpha line (lambda equals 121.6 nm) has 87.95 percent reflectance for the s-polarization case and 0.43 percent for the p-polarization case, with a degree of polarization of 99.03 percent. If a double reflection polarizer is made with this design, it will have a degree of polarization of 99.99 percent and s-polarization throughput of 77.35 percent

X ray, extreme and far ultraviolet optical thin films for space applications

Far and extreme ultraviolet optical thin film filters find many uses in space astronomy, space astrophysics, and space aeronomy. Spacebased spectrographs are used for studying emission and absorption features of the earth, planets, sun, stars, and the interstellar medium. Most of these spectrographs use transmission or reflection filters. This requirement has prompted a search for selective filtering coatings with high throughput in the FUV and EUV spectral region. Important progress toward the development of thin film filters with improved efficiency and stability has been made in recent years. The goal for this field is the minimization of absorption to get high throughput and enhancement of wavelength selection. The Optical Aeronomy Laboratory (OAL) at the University of Alabama in Huntsville has recently developed the technology to determine optical constants of bulk and film materials for wavelengths extending from x-rays (0.1 nm) to the FUV (200 nm), and several materials have been identified that were used for designs of various optical devices which previously have been restricted to space application in the visible and near infrared. A new design concept called the Pi-multilayer was introduced and applied to the design of optical coatings for wavelengths extending from x-rays to the FUV. Section 3 of this report explains the Pi-multilayer approach and demonstrates its application for the design and fabrication of the FUV coatings. Two layer Pi-stacks have been utilized for the design of reflection filters in the EUV wavelength range from 70 - 100 nm. In order to eliminate losses due to the low reflection of the imaging optics and increase throughput and out-of-band rejection of the EUV instrumentation we introduced a self-filtering camera concept. In the FUV region, MgF2 and LiF crystals are known to be birefringent. Transmission polarizers and quarterwave retarders made of MgF2 or LiF crystals are commercially available but the performances are poor. New techniques for the design of the EUV and FUV polarizers and quarterwave retarders are described in Section 5. X- and gamma-ray detectors rely on a measurement of the electron which is effected when a ray interacts with matter. The design of an x- and gamma-ray telescope to operate in a particular region of the spectrum is, therefore, largely dictated by the mechanism through which the rays interact. Energy selection and the focusing of the incident high energy rays can be achieved with spectrally selective high reflective multilayers. The design and spectral performance of narrowband reflective x-ray Pi-multilayers are presented in section 6

Filters for the International Solar Terrestrial Physics (ISTP) mission far ultraviolet imager

The far ultraviolet (FUV) imager for the International Solar Terrestrial Physics (ISTP) mission is designed to image four features of the aurora: O I lines at 130.4 nm and 135.6 nm and the N2 Lyman-Birge-Hopfield (LBH) bands between 140 nm - 160 nm (LBH long) and 160 nm - 180 nm (LBH long). In this paper we report the design and fabrication of narrow-band and broadband filters for the ISTP FUV imager. Narrow-band filters designed and fabricated for the O I lines have a bandwidth of less than 5 nm and a peak transmittance of 23.9 percent and 38.3 percent at 130.4 nm and 135.6 nm, respectively. Broadband filters designed and fabricated for LBH bands have the transmittance close to 60 percent. Blocking of out-of-band wavelengths for all filters is better than 5x10(exp -3) percent with the transmittance at 121.6 nm of less than 10(exp -6) percent

Radiation Damage Effects in Far Ultraviolet Filters and Substrates

New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al2O3, BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 R(sub E) orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials in the thin film format, we report on such an assessment here. Transmittances and reflectances of BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2 thin films on MgF2 substrates, Al2O3 thin films on fused silica substrates, uncoated fused silica and MgF2, and four multilayer filters made from these materials were measured from 120 nm to 180 nm before and after irradiation by 250 krads from a Co-60 gamma radiation source. No radiation-induced losses in transmittance or reflectance occurred in this wavelength range. Additional postradiation measurements from 160 nm to 300 nm indicated a 3 - 5% radiation-induced absorption near 260 nm in some of the samples with MgF2 substrates. From these measurements it is concluded that far ultraviolet filters made from the materials tested should experience less that 5% change from exposure to up to 250 krads of high energy radiation in space applications