333 research outputs found

    Involvement of the phosphoinositide 3-kinase/Akt signaling pathway in the resistance to therapeutic treatments of human leukemias.

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    The Evolution of Dust Disk Sizes from a Homogeneous Analysis of 1-10 Myr old Stars

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    We utilize ALMA archival data to estimate the dust disk size of 152 protoplanetary disks in Lupus (1-3 Myr), Chamaeleon I (2-3 Myr), and Upper-Sco (5-11 Myr). We combine our sample with 47 disks from Tau/Aur and Oph whose dust disk radii were estimated, as here, through fitting radial profile models to visibility data. We use these 199 homogeneously derived disk sizes to identify empirical disk-disk and disk-host property relations as well as to search for evolutionary trends. In agreement with previous studies, we find that dust disk sizes and millimeter luminosities are correlated, but show for the first time that the relationship is not universal between regions. We find that disks in the 2-3 Myr-old Cha I are not smaller than disks in other regions of similar age, and confirm the Barenfeld et al. (2017) finding that the 5-10 Myr USco disks are smaller than disks belonging to younger regions. Finally, we find that the outer edge of the Solar System, as defined by the Kuiper Belt, is consistent with a population of dust disk sizes which have not experienced significant truncation

    High quality superconducting niobium films produced by Ultra High Vacuum Cathodic Arc

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    The vacuum arc is a well-known technique to produce coating with enhanced adhesion and film density. Many cathodic arc deposition systems are actually in use in industry and research. They all work under (high) vacuum conditions in which water vapor pressure is an important source of film contamination, especially in the pulsed arc mode of operation. Here we present a Cathodic Arc system working under Ultra High Vacuum conditions (UHVCA). UHVCA has been used to produce ultra-pure niobium films with excellent structural and electrical properties at a deposition temperature lower than 100oC. The UHVCA technique therefore opens new perspectives for all applications requiring ultra-pure films or, as in the case of Plasma Immersion Ion Implantation, ultra-pure plasmas.Comment: submitted to AP
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