Visualization of defect-induced excitonic properties of the edges and grain boundaries in synthesized monolayer molybdenum disulfide

Atomically thin two-dimensional (2D) transition metal dichalcogenides (TMDCs) are attractive materials for next generation nanoscale optoelectronic applications. Understanding nanoscale optical behavior of the edges and grain boundaries of synthetically grown TMDCs is vital for optimizing their optoelectronic properties. Elucidating the nanoscale optical properties of 2D materials through far-field optical microscopy requires a diffraction-limited optical beam diameter sub-micron in size. Here we present our experimental work on spatial photoluminescence (PL) scanning of large size ( $\geq 50$ microns) monolayer MoS$_2$ grown by chemical vapor deposition (CVD) using a diffraction limited blue laser beam spot (wavelength 405 nm) with a beam diameter as small as 200 nm allowing us to probe nanoscale excitonic phenomena which was not observed before. We have found several important features: (i) there exists a sub-micron width strip ($\sim 500$ nm) along the edges that fluoresces $\sim 1000 \%$ brighter than the region far inside; (ii) there is another brighter wide region consisting of parallel fluorescing lines ending at the corners of the zig-zag peripheral edges; (iii) there is a giant blue shifted A-excitonic peak, as large as $\sim 120$ meV, in the PL spectra from the edges. Using density functional theory calculations, we attribute this giant blue shift to the adsorption of oxygen dimers at the edges, which reduces the excitonic binding energy. Our results not only shed light on defect-induced excitonic properties, but also offer an attractive route to tailor optical properties at the TMDC edges through defect engineering.Comment: 10 pages, 4 figures in Journal of Physical Chemistry C, 201

Photoresponse of Natural van der Waals Heterostructures

Van der Waals (vdW) heterostructures consisting of two dimensional materials offer a platform to obtain material by design and are very attractive owing to novel electronic states. Research on 2D van der Waals heterostructures (vdWH) has so far been focused on fabricating individually stacked atomically thin unary or binary crystals. Such systems include graphene (Gr), hexagonal boron nitride (h-BN) and member of the transition metal dichalcogenides family. Here we present our experimental study of the opto-electronic properties of a naturally occurring vdWH, known as Franckeite, which is a complex layered crystal composed of lead, tin, antimony, iron and sulfur. We present here that thin film franckeite (60 nm < d < 100 nm) behave as narrow band gap semiconductor demonstrating a wide band photoresponse. We have observed the band-edge transition at ~ 1500 nm (~830 meV) and high external quantum efficiency (EQE~3%) at room temperature. Laser power resolved and temperature resolved photocurrent measurements reveal that the photo-carrier generation and recombination are dominated by continuously distributed trap states within the band gap. To understand wavelength resolved photocurrent, we also calculated the optical absorption properties via density functional theory. Finally, we have shown that the device has fast photoresponse with rise time as fast as ~ 1 ms. Our study provides a fundamental understanding of the optoelectronic behavior in a complex naturally occurring vdWH and can open up the possibilities of producing new type of nanoscale optoelectronic devices with tailored properties.Comment: 10 pages, 5 figures (to be appeared in ACS NANO

Ultra-scaled MoS 2 transistors and circuits fabricated without nanolithography

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Ultra-scaled MoS2 transistors and circuits fabricated without nanolithography

The future scaling of semiconductor devices can be continued only by the development of novel nanofabrication techniques and atomically thin transistor channels. Here we demonstrate ultra-scaled MoS2 field-effect transistors (FETs) realized by a shadow evaporation method which does not require nanofabrication. The method enables large-scale fabrication of MoS2 FETs with fully gated ∼10 nm long channels. The realized ultra-scaled MoS2 FETs exhibit very small hysteresis of current–voltage characteristics, high drain currents up to ∼560 A m−1, very good drain current saturation for such ultra-short devices, subthreshold swing of ∼120 mV dec−1, and drain current on/ off ratio of ∼106 in air ambient. The fabricated ultra-scaled MoS2 FETs are also used to realize logic gates in n-type depletion-load technology. The inverters exhibit a voltage gain of ∼50 at a power supply voltage of only 1.5 V and are capable of in/out signal matching