7 research outputs found

    Quantifying the performances of SU-8 microfluidic devices: high liquid water tightness, long-term stability, and vacuum compatibility

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    Despite several decades of development, microfluidics lacks a sealing material that can be readily fabricated, leak-tight under high liquid water pressure, stable over a long time, and vacuum compatible. In this paper, we report the performances of a micro-scale processable sealing material for nanofluidic/microfluidics chip fabrication, which enables us to achieve all these requirements. We observed that micrometric walls made of SU-8 photoresist, whose thickness can be as low as 35 μ\mum, exhibit water pressure leak-tightness from 1.5 bar up to 5.5 bar, no water porosity even after 2 months of aging, and are able to sustain under 10510^{-5} mbar vacuum. This sealing material is therefore reliable and versatile for building microchips, part of which must be isolated from liquid water under pressure or vacuum. Moreover, the fabrication process we propose does not require the use of aggressive chemicals or high-temperature or high-energy plasma treatment. It thus opens a new perspective to seal microchips where delicate surfaces such as nanomaterials are present

    Dynamic instability of individual carbon nanotube growth revealed by in situ homodyne polarization microscopy

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    International audienceUnderstanding the kinetic selectivity of carbon nanotube growth at the scale of individual nanotubes is essential for the development of high chiral selectivity growth methods. Here we demonstrate that homodyne polarization microscopy can be used for high-throughput imaging of long individual carbon nanotubes under real growth conditions (at ambient pressure, on a substrate), and with sub-second time resolution. Our in situ observations on hundreds of individual nanotubes reveal that about half of them grow at a constant rate all along their lifetime while the other half exhibits stochastic changes in growth rates, and switches between growth, pause and shrinkage. Statistical analysis shows that the growth rate of a given nanotube essentially varies between two values, with similar average ratio (~1.7) regardless of whether the rate change is accompanied by a change in chirality. These switches indicate that the nanotube edge or the catalyst nanoparticle fluctuates between different configurations during growth

    C-13 NMR evidence for dynamics of nanotubes in ropes

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    We report on C-13 nuclear magnetic resonance from 10 up to 350 K on single wall carbon nanotubes. The magic angle spinning NMR spectrum shows one isotropic line at 126 ppm and the static spectrum a powder pattern typical for a curved graphene sheet. The T dependence of the spin-lattice relaxation rate T-1(-1) reveals an unusual phenomenon which could be explained by thermally activated small amplitude motion (SAM) of the nanotubes. If above 170 K, diffusion of twistons might be responsible for the local SAM of the C-13 sites, below this transition temperature frozen in twistons could appear with an orientational order of the nanotubes in the ropes

    Quantifying the performances of SU-8 microfluidic devices: high liquid water tightness, long-term stability, and vacuum compatibility

    No full text
    Despite several decades of development, microfluidics lacks a sealing material that can be readily fabricated, leak-tight under high liquid water pressure, stable over a long time, and vacuum compatible. In this paper, we report the performances of a micro-scale processable sealing material for nanofluidic/microfluidics chip fabrication, which enables us to achieve all these requirements. We observed that micrometric walls made of SU-8 photoresist, whose thickness can be as low as 35 μμm, exhibit water pressure leak-tightness from 1.5 bar up to 5.5 bar, no water porosity even after 2 months of aging, and are able to sustain under 10510^{-5} mbar vacuum. This sealing material is therefore reliable and versatile for building microchips, part of which must be isolated from liquid water under pressure or vacuum. Moreover, the fabrication process we propose does not require the use of aggressive chemicals or high-temperature or high-energy plasma treatment. It thus opens a new perspective to seal microchips where delicate surfaces such as nanomaterials are present
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