Can we see defects in capacitance measurements of thin-film solar cells?

Thermal admittance spectroscopy and capacitance-voltage measurements are well established techniques to study recombination-active deep defect levels and determine the shallow dopant concentration in photovoltaic absorbers. Applied to thin-film solar cells or any device stack consisting of multiple layers, interpretation of these capacitance-based techniques is ambiguous at best. We demonstrate how to assess electrical measurements of thin-film devices and develop a range of criteria that allow to estimate whether deep defects could consistently explain a given capacitance measurement. We show that a broad parameter space, achieved by exploiting bias voltage, time, and illumination as additional experimental parameters in admittance spectroscopy, helps to distinguish between deep defects and capacitive contributions from transport barriers or additional layers in the device stack. On the example of Cu(In,Ga)Se2 thin-film solar cells, we show that slow trap states are indeed present but cannot be resolved in typical admittance spectra. We explain the common N1 signature by the presence of a capacitive barrier layer and show that the shallow net dopant concentration is not distributed uniformly within the depth of the absorber

Patient-specific instrument can achieve same accuracy with less resection time than navigation assistance in periacetabular pelvic tumor surgery: A cadaveric study

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Absolute calibration of Analog Detectors using Stimulated Parametric Down Conversion

Spontaneous parametric down conversion has been largely exploited as a tool for absolute calibration of photon counting detectors, photomultiplier tubes or avalanche photodiodes working in Geiger regime. In this work we investigate the extension of this technique from very low photon flux of photon counting regime to the absolute calibration of analog photodetectors at higher photon flux. Moving toward higher photon rate, i.e. at high gain regime, with the spontaneous parametric down conversion shows intrinsic limitations of the method, while the stimulated parametric down conversion process, where a seed beam properly injected into the crystal in order to increase the photon generation rate in the conjugate arm, allows us to work around this problem. A preliminary uncertainty budget is discussed

Giant Electroresistance in Edge Metal-Insulator-Metal Tunnel Junctions Induced by Ferroelectric Fringe Fields

An enormous amount of research activities has been devoted to developing new types of non-volatile memory devices as the potential replacements of current flash memory devices. Theoretical device modeling was performed to demonstrate that a huge change of tunnel resistance in an Edge Metal-Insulator-Metal (EMIM) junction of metal crossbar structure can be induced by the modulation of electric fringe field, associated with the polarization reversal of an underlying ferroelectric layer. It is demonstrated that single three-terminal EMIM/Ferroelectric structure could form an active memory cell without any additional selection devices. This new structure can open up a way of fabricating all-thin-film-based, high-density, high-speed, and low-power non-volatile memory devices that are stackable to realize 3D memory architectureope

Bridging the Mid-Infrared-to-Telecom Gap with Silicon Nanophotonic Spectral Translation

Expanding far beyond traditional applications in optical interconnects at telecommunications wavelengths, the silicon nanophotonic integrated circuit platform has recently proven its merits for working with mid-infrared (mid-IR) optical signals in the 2-8 {\mu}m range. Mid-IR integrated optical systems are capable of addressing applications including industrial process and environmental monitoring, threat detection, medical diagnostics, and free-space communication. Rapid progress has led to the demonstration of various silicon components designed for the on-chip processing of mid-IR signals, including waveguides, vertical grating couplers, microcavities, and electrooptic modulators. Even so, a notable obstacle to the continued advancement of chip-scale systems is imposed by the narrow-bandgap semiconductors, such as InSb and HgCdTe, traditionally used to convert mid-IR photons to electrical currents. The cryogenic or multi-stage thermo-electric cooling required to suppress dark current noise, exponentially dependent upon the ratio Eg/kT, can limit the development of small, low-power, and low-cost integrated optical systems for the mid-IR. However, if the mid-IR optical signal could be spectrally translated to shorter wavelengths, for example within the near-infrared telecom band, photodetectors using wider bandgap semiconductors such as InGaAs or Ge could be used to eliminate prohibitive cooling requirements. Moreover, telecom band detectors typically perform with higher detectivity and faster response times when compared with their mid-IR counterparts. Here we address these challenges with a silicon-integrated approach to spectral translation, by employing efficient four-wave mixing (FWM) and large optical parametric gain in silicon nanophotonic wires

Manufacturing Process Control with VLSI-Compatible Sensors

Pressure sensor elements compatible with NMOS and CMOS VLSI fabrication processes, and suitable for on-line process control, are being devEnoped. The techniques employed offer either single Enements or flexible conformable arrays of capacitive or piezoresistive units. By using standard integrated circuit processing, the sensors themsEnves are naturally compatible with further Enectronic processing both on and off chip. Solid state sensors also offer cost effective batch fabrication processes and the ability to have signal conditioning and processing right on the substrate, without bulky interconnects and multiple packages

The Characteristics of Seebeck Coefficient in Silicon Nanowires Manufactured by CMOS Compatible Process

Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are measured. The obtained maximum Seebeck coefficient values are 122 μV/K for p-leg and −94 μV/K for n-leg. The maximum attainable power factor is 0.74 mW/m K2 at room temperature

Generation of photovoltage in graphene on a femtosecond time scale through efficient carrier heating

Graphene is a promising material for ultrafast and broadband photodetection. Earlier studies addressed the general operation of graphene-based photo-thermoelectric devices, and the switching speed, which is limited by the charge carrier cooling time, on the order of picoseconds. However, the generation of the photovoltage could occur at a much faster time scale, as it is associated with the carrier heating time. Here, we measure the photovoltage generation time and find it to be faster than 50 femtoseconds. As a proof-of-principle application of this ultrafast photodetector, we use graphene to directly measure, electrically, the pulse duration of a sub-50 femtosecond laser pulse. The observation that carrier heating is ultrafast suggests that energy from absorbed photons can be efficiently transferred to carrier heat. To study this, we examine the spectral response and find a constant spectral responsivity between 500 and 1500 nm. This is consistent with efficient electron heating. These results are promising for ultrafast femtosecond and broadband photodetector applications.Comment: 6 pages, 4 figure