Li diffusion and electrochromism in amorphous and crystalline vanadium oxide thin film electrodes

Amorphous vanadium oxide films were synthesized onto ITO-coated glass substrates by the hot filament metal oxide deposition technique. The as-deposited samples were heat-treated in an argon atmosphere. X-ray diffraction analysis revealed that the films treated at 200 and 300 ºC were still amorphous, while those treated at 400 and 500 ºC were crystalline, with a V2O5 structure. All electrodes were electrochemically reversible for Li+ intercalation, exhibiting the electrochromic effect, observed from optical transmittance measurements at 632.8 nm. The Li-diffusion coefficient, DC, was measured by the galvanostatic intermittent titration technique (GITT) as function of the inserted charge. For the crystalline films it was observed that the optical absorbance and the DC increase with increasing Li insertion in the single-phase regions of crystalline Li xV2O5 and decrease in the two-phase regions. For the latter, an effective DC was considered. The presence of other vanadium oxides mixed to the V2O5 matrix was inferred for the crystalline films from the chronopotentiometric and DC measurements

Li diffusion and electrochromism in amorphous and crystalline vanadium oxide thin film electrodes

Amorphous vanadium oxide films were synthesized onto ITO-coated glass substrates by the hot filament metal oxide deposition technique. The as-deposited samples were heat-treated in an argon atmosphere. X-ray diffraction analysis revealed that the films treated at 200 and 300 ºC were still amorphous, while those treated at 400 and 500 ºC were crystalline, with a V2O5 structure. All electrodes were electrochemically reversible for Li+ intercalation, exhibiting the electrochromic effect, observed from optical transmittance measurements at 632.8 nm. The Li-diffusion coefficient, DC, was measured by the galvanostatic intermittent titration technique (GITT) as function of the inserted charge. For the crystalline films it was observed that the optical absorbance and the DC increase with increasing Li insertion in the single-phase regions of crystalline Li xV2O5 and decrease in the two-phase regions. For the latter, an effective DC was considered. The presence of other vanadium oxides mixed to the V2O5 matrix was inferred for the crystalline films from the chronopotentiometric and DC measurements.Filmes amorfos de óxido de vanádio foram depositados sobre substratos de vidro recobertos com ITO, pela técnica de deposição de filmes de óxidos metálicos por filamento aquecido. Os espectros de difração de raios-X mostraram que os filmes como-depositados tratados termicamente em atmosfera de argônio em 200 e 300 ºC continuaram amorfos e os tratados a 400 e 500 ºC tornaram-se policristalinos, com a estrutura do V2O5. Os eletrodos foram eletroquimicamente reversíveis sob intercalação de Li+, exibindo o efeito eletrocrômico, observado por medidas da transmitância ótica em 632,8 nm. O coeficiente de difusão do Li, DC, foi medido pela técnica de titulação galvanostática intermitente (GITT) em função da carga inserida. Para os filmes cristalinos, a absorbância ótica e o DC aumentam com a quantidade de Li inserido, nas regiões de fase única de Li xV2O5 cristalino e decrescem nas regiões de duas fases. Para essas, um DC efetivo foi considerado. Nos filmes cristalinos foi inferida a presença de outros óxidos de vanádio misturados à matriz de V2O5, através das medidas de cronopotenciometria e de DC.788794Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES

Developments in hot-filament metal oxide deposition (HFMOD)

Hot-filament metal oxide deposition (HFMOD) is a variant of conventional hot-filament chemical vapor deposition (HFCVD) recently developed in our laboratory and successfully used to obtain high-quality, uniform films of MOx WOx and VOx. The method employs the controlled oxidation of a filament of a transition metal heated to 1000 degrees C or more in a rarefied oxygen atmosphere (typically, of about 1 Pa). Metal oxide vapor formed on the surface of the filament is transported a few centimetres to deposit on a suitable substrate. Key system parameters include the choice of filament material and diameter, the applied current and the partial pressures of oxygen in the chamber. Relatively high film deposition rates, such as 31 nm min(-1) for MoOx, are obtained. The film stoichiometry depends on the exact deposition conditions. MoOx films, for example, present a mixture of MoO2 and MoO3 phases, as revealed by XPS. As determined by Li+ intercalation using an electrochemical cell, these films also show a colouration efficiency of 19.5 cm(2) C-1 at a wavelength of 700 nm. MOx and WOx films are promising in applications involving electrochromism and characteristics of their colouring/bleaching cycles are presented. The chemical composition and structure of VOx films examined using IRRAS (infrared reflection-absorption spectroscopy), RBS (Rutherford backscattering spectrometry) and XPS (X-ray photoelectron spectrometry) are also presented. (c) 2007 Elsevier B.V. All rights reserved