InAs QDs on InP : Polarization insensitive SOA and non-radiative Auger processes

International audienceAn efficient mechanical and electronic axial approximation of the strained 8x8 Hamiltonian is proposed for zinc-blende nanostructures with a cylindrical shape on (100) substrates. Vertically stacked InAs/InP columnar quantum dots (CQDs) for polarization insensitive semiconductor optical amplifier (SOA) in telecommunications applications are studied theoretically. Non-radiative Auger processes in InAs/InP quantum dots (QDs) are also investigated. It is shown that a multiband approach is necessary in both cases

Asymmetric Stark Shift in InAs/GaAsP(Q1.18) quantum dots grown on (311)B InP substrate

We present photocurrent (PC) spectroscopy of InAs/InGaAsP (Q1.18) quantum dots (QD) embedded in a PIN diode grown on InP(311)B substrate. From 300K and 77K spectra we deduce the transition energies for ground state of the dots. These energies are sensitive to applied bias and reveal an asymmetric quantum-confined Stark shift (QCSS) attributed to the presence of a strain-induced field in the dots

k.p theory beyond standard 8-band theory parametrization strategies and its applicability in electronic and optoelectronic devices design

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30-band k.p method for quantum semiconductor heterostructures

International audienceWe illustrate how the linear combination of zone center bulk bands combined with the full-zone k*p method can be used to accurately compute the electronic states in semiconductor nanostructures. To this end we consider a recently developed 30-band model which carefully reproduces atomistic calculations and experimental results of bulk semiconductors. The present approach is particularly suited both for short-period superlattices and large nanostructures where a three-dimensional electronic structure is required. This is illustrated by investigating ultrathin GaAs/ AlAs superlattices

Design of InGaAs/InP 1.55μm vertical cavity surface emitting lasers

International audienceThe design of an electrically pumped InGaAs quantum well based vertical cavity surface emitting laser (VCSEL) on InP substrate is presented. Such optically pumped VCSELs have already been demonstrated. To design electrically pumped VCSEL, three simulations steps are needed: optical simulation gives access to the electric field repartition, to design the active zone and the Bragg mirrors. Thermal simulation is helpful to design metallic contacts while the energy band diagram is obtained by electrical simulation to design the buried tunnel junction useful for carrier injection. All these simulations are compared to experiment

Design and fabrication of a tunable InP-based VCSEL using a electro-optic index modulator

International audienceWe present the first vertical surface emitting laser (VCSEL) operating at 1.55-μm comprising a electro-optic modulator inside its cavity. This material consists of nematic liquid crystal dispersed in a polymer material (nano-PDLC). This first VCSEL exhibits a 10 nm tuning range and an excellent side-mode suppression ratio higher than 20 dB over the whole spectral range. The device is formed by a conventional InP-based active region with an epitaxial and a dielectric Bragg mirror. The nano-PDLC layer length, close to 6 μm, is in agreement with a tunable laser emission without mode-hopping. Another decisive advantage, compared to mechanical solutions, is the tuning response time which is close to a few 10 μs to scan the full spectral range, making this device appropriate for some access network functions. This first version is optically pumped and requires 170 volts to obtain a 10 nm tunability

Theoretical study of highly strained InAs material from first-principles modelling: application to an ideal QD

International audienceWe study the properties of highly strained InAs material calculated from first principles modeling using ABINIT packages. We first simulate the characteristic of bulk InAs crystal and compare them with both experimental and density functional theory (DFT) results. Secondly, we focus our attention on the strain effects on InAs crystal with a gradual strain reaching progressively the lattice matched parameters of InP, GaAs and GaP substrates. The final part is dedicated to the study of a hypothetic spherical InAs/GaP quantum dot. The effect of hydrostatic deformations for both InAs Zinc-Blende phase and InAs RockSalt phase is discussed

Photoelectrochemical water oxidation of GaP 1−x Sb x with a direct band gap of 1.65 eV for full spectrum solar energy harvesting

International audienceHydrogen produced using artificial photosynthesis, i.e. solar splitting of water, is a promising energy alternative to fossil fuels. Efficient solar water splitting demands a suitable band gap to absorb near full spectrum solar energy and a photoelectrode that is stable in strongly alkaline or acidic electrolytes. In this work, we demonstrate for the first time, a perfectly relaxed GaP0.67Sb0.33 monocrystalline alloy grown on a silicon substrate with a direct band gap of 1.65 eV by molecular beam epitaxy (MBE) without any evidence of chemical disorder. Under one Sun illumination, the GaP0.67Sb0.33 photoanode with a 20 nm TiO2 protective layer and 8 nm Ni co-catalyst layer shows a photocurrent density of 4.82 mA cm−2 at 1.23 V and an onset potential of 0.35 V versus the reversible hydrogen electrode (RHE) in 1.0 M KOH (pH = 14) aqueous solution. The photoanode yields an incident-photon-to-current efficiency (IPCE) of 67.1% over the visible range between wavelengths 400 nm to 650 nm. Moreover, the GaP0.67Sb0.33 photoanode was stable over 5 h without degradation of the photocurrent under strong alkaline conditions under continuous illumination at 1 V versus RHE. Importantly, the direct integration of the 1.65 eV GaP0.67 Sb0.33 on 1.1 eV silicon may pave the way for an ideal tandem photoelectrochemical system with a theoretical solar to hydrogen efficiency of 27%

Modélisation physique de la structure électronique, du transport et de l'ionisation par choc dans les matériaux IV-IV massifs, contraints et dans les puits quantiques

This PhD thesis is devoted to the study of physical phenomena in SiGe devices involving high energy carriers which can induce impact ionization. A thirty-band k.p method has been developed to model energy band diagrams of bulk and strained Si, Ge and SiGe alloys on the whole Brillouin zone in a large energy range (11 eV around the band gap). This method gives access to the Luttinger parameters and the conduction band effective masses with a very good accuracy. Associated with an envelop function algorithm, the band diagrams of SiGe quantum wells have been obtained in the valence and in the conduction band. From these band diagrams, carrier densities of states are obtained in bulk and strained semiconductors and in quantum wells. Hole density of state masses in bulk and strained SiGe alloys have been calculated as a function of crystal temperature. Chapter 4 is devoted to transport study in SiGe alloys with a matrix resolution of the Boltzmann transport equation. From the density of state masses, hole mean mobilities are calculated in SiGe alloys. From high electric field transport simulation, impact ionization coefficients have been evaluated for electrons in strained Si and for holes in strained Ge. Electroluminescence measurements have been performed on Si/SiGe and Ge/SiGe HFETs. These data give access to experimental study of impact ionization.Ce travail est consacré à l'étude des phénomènes physiques dans les composants à base d'alliage SiGe en présence de fort champ électrique donc mettant en jeu des porteurs très énergétiques susceptibles d'induire de l'ionisation par choc. A l'aide d'une méthode k.p à 30 bandes, nous avons modélisé les structures électroniques complètes du Si, du Ge et des alliages Si1-xGex massifs et contraints sur une large gamme d'énergie (11 eV autour de la bande interdite) avec une très grande précision sur les paramètres de Luttinger ou les masses effectives. Associée au formalisme de la fonction enveloppe, cette méthode nous a fourni les relations de dispersion des sous-bandes en bande de valence et de conduction de puits quantiques à base d'alliages SiGe. Pour intégrer les structures électroniques dans la simulation du transport, nous avons calculé les densités d'états pour des structures électroniques 3D et 2D. Nous avons aussi obtenu les masses de densité d'états en fonction de la température dans les alliages SiGe massifs et contraints sur Si. Le chapitre 4 est consacré à l'étude du transport dans les alliages SiGe à partir d'une résolution déterministe de l'équation de Boltzmann. A l'aide des masses de densité d'états, nous avons calculé les mobilités moyennes des trous dans le SiGe. A partir de la simulation du transport à fort champ électrique des électrons dans le Si contraint sur SiGe et des trous dans le Ge contraint sur SiGe, nous avons obtenu les coefficients d'ionisation par choc dans ces matériaux. Des mesures d'électroluminescence réalisées sur des HFET à base d'alliages SiGe ont permis de remonter à quelques propriétés de l'ionisation par choc dans ces composants