28 research outputs found

    X-ray-ultraviolet beam splitters for the Michelson interferometer

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    International audienceWith the aim of realizing a Michelson interferometer working at 13.9 nm, we have developed a symmetrical beam splitter with multilayers deposited on the front and back sides of a silicon nitride membrane. On the basis of the experimental optical properties of the membrane, simulations have been performed to define the multilayer structure that provides the highest reflectivity-transmission product. Optimized Mo-Si multilayers have been successfully deposited on both sides of the membrane by use of the ion-beam sputtering technique, with a thickness-period reproducibility of 0.1 nm. Measurements by means of synchrotron radiation at 13.9 nm and at an angle of 45° provide a reflectivity of 14.2% and a transmission of 15.2% for a 60% s-polarized light, close to the simulated values. Such a beam splitter has been used for x-ray laser Michelson interferometry at 13.9 nm. The first interferogram is discussed

    X-ray multilayer monochromator with enhanced performance

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    International audienceAn x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown

    Design and characterization of extreme-ultraviolet broadband mirrors for attosecond science

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    International audienceA novel multilayer mirror was designed and fabricated based on a recently developed three-material technology aimed both at reaching reflectivities of about 20% and at controlling dispersion over a bandwidth covering photon energies between 35 and 50 eV. The spectral phase upon reflection was retrieved by measuring interferences in a two-color ionization process using high-order harmonics produced from a titanium: sapphire laser. We demonstrate the feasibility of designing and characterizing phase-controlled broadband optics in the extreme-ultraviolet domain, which should facilitate the manipulation of attosecond pulses for applications

    Two channel multilayer mirrors for astrophysics

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    International audienceA two-channel mirror reflecting both Fe-IX/X (λ = 17.1 nm) and He-II (30.4 nm) resonance lines at near normal incidence has been designed, fabricated and characterized. These two passbands are often chosen in space instruments designed for the observation of the solar corona. The mirror structure used for optimization is a superposition of two periodic multilayers with three components per period. It has been designed by using optimization software with an appropriate merit function. The theoretical reflectivity for both resonance lines can reach 0.25. It is shown that, by using a set of filters, one can select either the Fe-IX/X or the He-II channel. The spectral response of the two-channel mirror has been measured on synchrotron radiation source on a large wavelength range, from 12 nm to 35 nm. Experimental reflectivity reaches 0.32 for the Fe-IX/X line and 0.19 for the He-II line

    B/Si multilayers for soft X-ray and extreme ultraviolet optics

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    International audienceWith the development of x-ray sources, high reflectivity and selectivity multilayers for optics are becoming a field of interest for the spectral region of 13-40 nm. In this article, it is shown from theoretical computations that multilayers made of two light materials such as B/Si can be used for these applications. Such multilayers were deposited by electron evaporation. Their physical properties were studied by x-ray reflectometry analyses at two wavelengths: 0.154 and 12.6 nm. The results show that the multilayers are made of dense and pure materials and that the interfacial layer thickness ranges from 0.3 to 0.7 nm

    Development of Al-based multilayer optics for EUV

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    International audienceWe report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications
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