1,864 research outputs found

    EINFLUSS DES AXIALSPALTES AUF DIE KENNLINIEN VON FLÜSSIGKEITSRINGMASCHINEN

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    Gravitational wave recoil in Robinson-Trautman spacetimes

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    We consider the gravitational recoil due to non-reflection-symmetric gravitational wave emission in the context of axisymmetric Robinson-Trautman spacetimes. We show that regular initial data evolve generically into a final configuration corresponding to a Schwarzschild black-hole moving with constant speed. For the case of (reflection-)symmetric initial configurations, the mass of the remnant black-hole and the total energy radiated away are completely determined by the initial data, allowing us to obtain analytical expressions for some recent numerical results that have been appeared in the literature. Moreover, by using the Galerkin spectral method to analyze the non-linear regime of the Robinson-Trautman equations, we show that the recoil velocity can be estimated with good accuracy from some asymmetry measures (namely the first odd moments) of the initial data. The extension for the non-axisymmetric case and the implications of our results for realistic situations involving head-on collision of two black holes are also discussed.Comment: 9 pages, 6 figures, final version to appear in PR

    Effect of the C-bridge length on the ultraviolet-resistance of oxycarbosilane low-k films

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    The ultra-violet (UV) and vacuum ultra-violet (VUV) resistance of bridging alkylene groups in organosilica films has been investigated. Similar to the Si-CH3 (methyl) bonds, the Si-CH2-Si (methylene) bonds are not affected by 5.6 eV irradiation. On the other hand, the concentration of the Si-CH2-CH2-Si (ethylene) groups decreases during such UV exposure. More significant difference in alkylene reduction is observed when the films are exposed to VUV (7.2 eV). The ethylene groups are depleted by more than 75% while only about 40% methylene and methyl groups loss is observed. The different sensitivity of bridging groups to VUV light should be taken into account during the development of curing and plasma etch processes of low-k materials based on periodic mesoporous organosilicas and oxycarbosilanes. The experimental results are qualitatively supported by ab-initio quantum-chemical calculations
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