180 research outputs found

    Thermal conductivity of InAs quantum dot stacks using AlAs strain compensating layers on InP substrate

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    International audienceThe growth and thermal conductivity of InAs quantum dot (QD) stacks embedded in GaInAs matrix with AlAs compensating layers deposited on (1 1 3)B InP substrate are presented. The effect of the strain compensating AlAs layer is demonstrated through Atomic Force Microscopy (AFM) and X-ray diffraction structural analysis. The thermal conductivity (2.7 W/m K at 300 K) measured by the 3ω method reveals to be clearly reduced in comparison with a bulk InGaAs layer (5 W/m K). In addition, the thermal conductivity measurements of S doped InP substrates and the SiN insulating layer used in the 3ω method in the 20-200 °C range are also presented. An empirical law is proposed for the S doped InP substrate, which slightly differs from previously presented results

    Self-assembled InAs quantum dots grown on InP (3 1 1)B substrates: Role of buffer layer and amount of InAs deposited

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    International audienceThe formation of InAs quantum dots by Stransky–Krastanow method on (3 1 1)B InP substrates has been studied. On Al0.48In0.52As alloy lattice matched on InP, large changes of the quantum dot structural characteristics have been observed as a function of the amount of InAs deposited and of the arsenic pressure during the InAs quantum dot formation. Small quantum dots (minimum diameter=20 nm) in very high density (1.3×1011 quantum dots per cm2) have been achieved in optimized growth conditions. These results are interpreted from the strong strain field interaction through the substrate at high density and from the InAs surface energy evolutions with the Arsenic pressure. The effect on quantum dot characteristics of the arsenic pressure during the growth of Al0.48In0.52As buffer layers has also been investigated. Despite the importance of this parameter on the Al0.48In0.52As clustering, weak changes have been observed

    Photoelectrochemical water oxidation of GaP 1−x Sb x with a direct band gap of 1.65 eV for full spectrum solar energy harvesting

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    International audienceHydrogen produced using artificial photosynthesis, i.e. solar splitting of water, is a promising energy alternative to fossil fuels. Efficient solar water splitting demands a suitable band gap to absorb near full spectrum solar energy and a photoelectrode that is stable in strongly alkaline or acidic electrolytes. In this work, we demonstrate for the first time, a perfectly relaxed GaP0.67Sb0.33 monocrystalline alloy grown on a silicon substrate with a direct band gap of 1.65 eV by molecular beam epitaxy (MBE) without any evidence of chemical disorder. Under one Sun illumination, the GaP0.67Sb0.33 photoanode with a 20 nm TiO2 protective layer and 8 nm Ni co-catalyst layer shows a photocurrent density of 4.82 mA cm−2 at 1.23 V and an onset potential of 0.35 V versus the reversible hydrogen electrode (RHE) in 1.0 M KOH (pH = 14) aqueous solution. The photoanode yields an incident-photon-to-current efficiency (IPCE) of 67.1% over the visible range between wavelengths 400 nm to 650 nm. Moreover, the GaP0.67Sb0.33 photoanode was stable over 5 h without degradation of the photocurrent under strong alkaline conditions under continuous illumination at 1 V versus RHE. Importantly, the direct integration of the 1.65 eV GaP0.67 Sb0.33 on 1.1 eV silicon may pave the way for an ideal tandem photoelectrochemical system with a theoretical solar to hydrogen efficiency of 27%

    Theoretical and experimental study of (In,Ga)As/GaP quantum dots

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    International audience(In,Ga)As/GaP(001) quantum dots (QDs) are grown by molecular beam epitaxy and studied both theoretically and experimentally. The electronic band structure is simulated using a combination of k*p and tight-binding models. These calculations predict an indirect to direct crossover with the In content and the size of the QDs. The optical properties are then studied in a low-In-content range through photoluminescence and time-resolved photoluminescence experiments. It suggests the proximity of two optical transitions of indirect and direct types

    Structural and optical analyses of GaP/Si and (GaAsPN/GaPN)/GaP/Si nanolayers for integrated photonics on silicon

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    International audienceWe report a structural study of molecular beam epitaxy-grown lattice-matched GaP/Si(0 0 1) thin layers with an emphasis on the interfacial structural properties, and optical studies of GaAsP(N)/GaP(N) quantum wells coherently grown onto the GaP/Si pseudo substrates, through a complementary set of characterization tools. Room temperature photoluminescence at 780 nm from the (GaAsPN/GaPN) quantum wells grown onto a silicon substrate is reported. Despite this good property, the time-resolved photoluminescence measurements demonstrate a clear influence of non-radiative defects initiated at the GaP/Si interface. It is shown from simulations, how x-ray diffraction can be used efficiently for analysis of antiphase domains. Then, qualitative and quantitative analyses of antiphase domains, micro-twins, and stacking faults are reported using complementarity of the local transmission electron microscopy and the statistical x-ray diffraction approaches

    Structural and optical properties of (In,Ga)As/GaP quantum dots and (GaAsPN/GaPN) diluted-nitride nanolayers coherently grown onto GaP and Si substrates for photonics and photovoltaics applications

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    San Francisco, California, United StatesInternational audienceLattice-matched GaP-based nanostructures grown on silicon substrates is a highly rewarded route for coherent integration of photonics and high-efficiency photovoltaic devices onto silicon substrates. We report on the structural and optical properties of selected MBE-grown nanostructures on both GaP substrates and GaP/Si pseudo-substrates. As a first stumbling block, the GaP/Si interface growth has been optimised thanks to a complementary set of thorough structural analyses. Photoluminescence and time-resolved photoluminescence studies of self-assembled (In,Ga)As quantum dots grown on GaP substrate demonstrate a proximity of two different types of optical transitions interpreted as a competition between conduction band states in X and Γ valleys. Structural properties and optical studies of GaAsP(N)/GaP(N) quantum wells coherently grown on GaP substrates and GaP/Si pseudo substrates are reported. Our results are found to be suitable for light emission applications in the datacom segment. Then, possible routes are drawn for larger wavelengths applications, in order to address the chip-to-chip and within-a-chip optical interconnects and the optical telecom segments. Finally, results on GaAsPN/GaP heterostructures and diodes, suitable for PV applications are reporte

    Croissance de boites quantiques sur InP(100) et (311)B

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