Characterization and System Identification of XY Flexural Mechanism Using Double Parallelogram Manipulator for High Precision Scanning

This article represents modeling of double parallelogram flexural manipulator derived from basic classical mechanics theory. Fourth order vibration wave equation is used for mathematical modeling and its performance is determined for step input and sinusoidal forced input. Static characterization of DFM is carried out to determine stiffness and force deflection characteristics over the entire motion range and dynamic characteristics is carried out using Transient response and Frequency response. Transient response is determined using step input to DFM which gives system properties such as damping, rise time and settling time. These parameters are then compared with theoretical model presented previously. Frequency response of DFM system gives characteristics of system with different frequency inputs which is used for experimental modeling of DFM device. Here, Voice Coil Motor is used as Actuator and optical encoder is used for positioning sensing of motion stage. It is noted that theoretical model is having 5% accuracy with experimental results. To achieve better position and accuracy, PID and LQR (Linear Quadratic Regulator) implementation was carried out on experimental model. PID gains are optimally tuned by using Ziegler Nichols approach. PID control is implemented experimentally using dSPACE DS1104 microcontroller and Control Desk software. Experimentally, it is observed that positioning accuracy is less than 5 μm. Further multiple DFM blocks are arranged for developing XY flexural mechanism and static characterization was carried out on it. The comparison of experimental and FEA results for X-direction and Y-direction is presented at end of paper

The Nanolithography Toolbox

This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices

Mechanical design of microresonators : modeling and applications

xiii, 342 p. : ill. ; 23 cm

Mechanics of microelectromechanical systems

This book offers a comprehensive coverage to the mechanics of microelectromechanical systems (MEMS), which are analyzed from a mechanical engineer's viewpoint as devices that transform an input form of energy into output mechanical motion (in the case of actuation) or that can operate with the reversed functionality (as in sensors) and convert an external stimulus, such as mechanical motion, into (generally) electric energy. The impetus of this proposal stems from the perception that such an approach might contribute to a more solid understanding of the principles governing the mechanics of M

Mechanics of microelectromechanical systems / Nicolae Lobontiu, Ephrahim Garcia.

Includes bibliographical references and index.book fair 2012xi, 405 p. :"This book offers a comprehensive coverage to the mechanics of microelectromechanical systems (MEMS), which are analyzed from a mechanical engineer's viewpoint as devices that transform an input form of energy into output mechanical motion (in the case of actuation) or that can operate with the reversed functionality (as in sensors) and convert an external stimulus, such as mechanical motion, into (generally) electric energy."--Jacket

Full factorial DOE to determine the influence of the process parameters in cleaning water jets used in sewer cleaning

Industrial cleaning is a classic application of water jets technology. In the late 1950s, when reliable high pressure pumps were built, the usage of water jets spread widely in the field of pipes and sewerage cleaning. In our particular case, water jets using pressure between 100 and 200 bars are being used. The operational behaviour of these systems is dependent on the process parameters, which can vary, causing variations in the impact force. The experiment consists in the research method used in the study of the impact forces that occur in the sewerage cleaning head system. To determine the influence process parameters have on impact forces, the full factorial method was used. In order to measure the impact forces between the water jet and a flat and rigid surface, a stand was designed and built for generating pressure water jets, as well as a device to measure the impact forces