Experimental study of energy distribution in ion-beam lithography

The paper reports two important results. Conducted a rigorous comparison of the sensitivity of the resist is polymethylmethacrylate (PMMA) to the irradiation of electron and ion beams. It is shown that, as in the case of electron irradiation, the resist shows both positive (at low doses) and negative (at higher doses) behavior of sensitivity. But compared with the electronic exposure, sensitivity of the resist is approximately a thousand times higher to the ion exposure, both the positive and negative areas....

Titanium Carbide Obtained by Magnetron Sputtering of Graphite on Heated Titanium Substrate

Titanium carbide was synthetized by sputtering graphite target on heated titanium substrate by magnetron sputtering process. The obtained samples were characterized by X-ray diffraction (XRD) analysis and Raman spectroscopy, the elemental analysis was made by Energy-dispersive X-ray spectroscopy (EDX). Titanium carbide (TiC) structure was obtained by deposition of sputtered carbon atoms and clusters to the resistively heated titanium substrate surface with temperatures 700 °C, 800 °C, 900 °C and 1000 °C. The XRD analysis showed that the formation of TiC structure is take place when the substrate is heated to 1000 °C. The Raman spectroscopy showed that when the incident power of laser is 100 % (35 mW) the structure is unstable in samples with the substrate temperatures 700 °C, 800 °C and 900 °C and the most stable titanium carbide structure is created when the substrate temperature is 1000 °C

R&d of CVD technique for graphene production

Currently production of large-sized graphene samples is of great importance due to the broad potential applications of this material with high physical performance. In this paper we consider one of the widely used methods of graphene production - chemical vapor deposition (CVD), which was worked out by our team. We used as a catalyst of Ni foil and carbon source were benzene vapor. Also, we show results of computer simulation by DFT methods that demonstrate possibility and effectiveness of graphene production by CVD method. The characteristics of graphene have been studied by optical microscopy and Raman spectroscopy. The results show high quality and homogeneity of the obtained graphene

Вплив температури підкладки на формування плівок карбіду титану

Протягом останніх десятиліть, плівки карбіду титану використовуються як матеріали для покриттів. Карбід титану проявляє чудові механічні та хімічні властивості, такі як висока температура плавлення, твердість і гарна хімічна та термічна стабільність. Плівки карбіду титану наносилися на скляні та монокристалічні кремнієві підкладки методом іонно-плазмового магнетронного розпилення при постійному струмі з об'єднаної мішені графіт/титан. Плівки карбіду титану з різними співвідношеннями C/Ti можуть бути нанесені методом магнетронного розпилення при постійному струмі з використанням титанових листів в області ерозії графітової мішені як джерела твердого вуглецю. Залежність температури підкладки (150, 250, 350, та 450 °С) від утворення фази карбіду титану вивчалася методом рентгеноструктурного аналізу та раманівської спектроскопії. Зразки досліджувалися двома різними раманівськими спектрометрами: AFM-Raman instrument Solver Spectrum (NT-MDT) з 473 нм лазером і NTegra Spectra (NT-MDT) з 473 нм і 633 нм лазерами. Стехіометрія осаджених плівок визначалася за допомогою енергодисперсійного рентгенівського спектроскопічного аналізу.Titanium carbide films have shown an extensive development during the last decades as coating materials. Titanium carbide shows excellent mechanical and chemical properties like a high melting point, hardness and great chemical and thermal stability. Titanium carbide films were deposited on glass and monocrystalline silicon substrates by direct current (DC) magnetron ion-plasma sputtering process from graphite/titanium combined target. Titanium carbide films with various C/Ti ratios can be deposited by DC magnetron sputtering using titanium sheets on the graphite target erosion area as a solid carbon source. The dependence of substrate temperature (150, 250, 350, and 450 °С) on the formation of titanium carbide phase was studied by X-ray diffraction analysis and Raman spectroscopy. The samples were studied by two different Raman spectrometers: AFM-Raman instrument Solver Spectrum (NT-MDT) with 473 nm laser and NTegra Spectra (NT-MDT) with 473 nm and 633 nm laser. The stoichiometry of deposited films was determined by energy-dispersive X-ray spectroscopy analysis

Experimental study of energy distribution in ion-beam lithography

The paper reports two important results. Conducted a rigorous comparison of the sensitivity of the resist is polymethylmethacrylate (PMMA) to the irradiation of electron and ion beams. It is shown that, as in the case of electron irradiation, the resist shows both positive (at low doses) and negative (at higher doses) behavior of sensitivity. But compared with the electronic exposure, sensitivity of the resist is approximately a thousand times higher to the ion exposure, both the positive and negative areas....