16 research outputs found

    Influence of released surface electrons on the pre-ionization of helium barrier discharges: laser photodesorption experiment and 1D fluid simulation

    No full text
    Abstract The presented work highlights the role of residual weakly-bound surface electrons acting as an effective seed electron reservoir that favors the pre-ionization of diffuse barrier discharges (BDs). A glow-like BD was operated in helium at a pressure of 500 mbar in between two plane electrodes each covered with float glass at a distance of 3 mm.The change in discharge development due to laser photodesorption of surface electrons was studied by electrical measurements and optical emission spectroscopy. Moreover, a 1D numerical fluid model of the diffuse discharge allowed the simulation of the laser photodesorption experiment, the estimation of the released surface electrons, and the understanding of their impact on the reaction kinetics in the volume. The breakdown voltage is clearly reduced when the laser beam at photon energy of 2.33 eV hits the cathodic dielectric that is charged with residual electrons during the discharge pre-phase. According to the adapted simulation, the laser releases only a small amount of surface electrons in the order of 10 pC. Nevertheless, this significantly supports the pre-ionization. Using a lower photon energy of 1.17 eV, the transition from the glow mode to the Townsend mode is induced due to a much higher electron yield up to 1 nC. In this case, both experiment and simulation indicate a retarded stepwise release of surface electrons initiated by the low laser photon energy

    The influence of negative ions in helium–oxygen barrier discharges: III. Simulation of laser photodetachment and comparison with experiment

    No full text
    Abstract The laser photodetachment experiment in a diffuse helium–oxygen barrier discharge is evaluated by a 1D fluid simulation. As in the experiment, the simulated discharge operates in helium with 400 ppm oxygen admixture at 500 mbar inside a discharge gap of 3 mm . The laser photodetachment is included by the interaction of negative ions with a temporally and spatially dependent photon flux. The simulation with the usually applied set of reactions and rate coefficients provides a much lower negative ion density than needed to explain the impact on the discharge characteristics in the experiment. Further processes for an enhanced negative ion formation and their capabilities of reproducing the experimental results are discussed. These further processes are additional attachment processes in the volume and the negative ion formation at the negatively charged dielectric. Both approaches are able to reproduce the measured laser photodetachment effect partially, but the best agreement with the experimental results is achieved with the formation of negative ions at the negatively charged dielectric

    Time-resolved QCLAS measurements in pulsed cc-rf CF4/H2 plasmas

    Get PDF
    Fluorocarbon containing capacitively coupled radio frequency (cc-rf) plasmas are widely used in technical applications and as model systems for fundamental investigations of complex plasmas. Absorption spectroscopy based on pulsed quantum cascade lasers (QCL) was applied in the mid-IR spectral range of 1269-1275 cm-1. Absolute densities of the precursor molecule CF4 and of the stable product C3F8 were measured with a time resolution of up to 1 ms in pulsed CF4/H2 asymmetrical cc-rf (13.56 MHz) discharges. For this purpose both the non-negligible temperature dependence of the absorption coefficients and the interference of the absorption features of CF4 and C3F8 had to be taken into account in the target spectral range. Therefore, at two different spectral positions composite absorption spectra were acquired under the same plasma conditions in order to discriminate between CF4 and C3F8 contributions. A total consumption of~ 12 % was observed for CF4 during a 1 s plasma pulse, whereas C3F8 appeared to be produced mainly from amorphous fluorocarbon layers deposited at the reactor walls. A gas temperature increase by ~ 100 K in the plasma pulse was estimated from the measurements. Additionally, not yet identified unresolved absorption (potentially from the excited CF4 molecule) was found during the àon-phase'

    Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C

    No full text
    Organic polymer thin films have been deposited on Si(100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using different C2Hm/N2 (m = 2, 4, 6) gas mixtures. The deposited films were characterized by various spectroscopic techniques. Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS) revealed the chemical functional groups present in the films. The surface chemical compositions have been derived from X-ray photo electron spectroscopy (XPS). FT-IRRAS and XPS show the presence of sp, sp2 and sp3 bonds of carbon and nitrogen. Various functional groups such as NH containing, saturated and unsaturated alkyl groups have been identified. Thin films obtained from C2H2/N2 and C2H4/N2 gas mixtures revealed a higher N/C ratio when compared to thin films obtained from C2H6/N2. Thickness, refractive index and extinction coefficient were evaluated by spectroscopic ellipsometry (SE). Significant differences between the films obtained with different gas mixtures are observed

    Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

    Get PDF
    Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C2Hm/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS), Raman spectroscopy, and ellipsometry. FT-IRRAS revealed the presence of sp3 and sp2 C–H stretching and C–H bending vibrations of bonds in the films. The presence of D and G bands was confirmed by Raman spectroscopy. Thin films obtained from C2H4/Ar and C2H6/Ar gas mixtures have ID/IG ratios of 0.45 and 0.3, respectively. The refractive indices were 2.8 and 3.1 for C2H4/Ar and C2H6/Ar films, respectively, at a photon energy of 2 eV

    Local Inflammatory Response after Intramuscularly Implantation of Anti-Adhesive Plasma-Fluorocarbon-Polymer Coated Ti6AI4V Discs in Rats

    Get PDF
    Orthopaedic implants and temporary osteosynthesis devices are commonly based on Titanium (Ti). For short-term devices, cell-material contact should be restricted for easy removal after bone healing. This could be achieved with anti-adhesive plasma-fluorocarbon-polymer (PFP) films created by low-temperature plasma processes. Two different PFP thin film deposition techniques, microwave (MW) and radiofrequency (RF) discharge plasma, were applied to receive smooth, hydrophobic surfaces with octafluoropropane (C3F8) or hexafluorohexane (C6F6) as precursors. This study aimed at examining the immunological local tissue reactions after simultaneous intramuscular implantation of four different Ti samples, designated as MW-C3F8, MW-C6F6, RF-C3F8 and Ti-controls, in rats. A differentiated morphometric evaluation of the inflammatory reaction was conducted by immunohistochemical staining of CD68+ macrophages, CD163+ macrophages, MHC class II-positive cells, T lymphocytes, CD25+ regulatory T lymphocytes, NK cells and nestin-positive cells in cryosections of surrounding peri-implant tissue. Tissue samples were obtained on days 7, 14 and 56 for investigating the acute and chronical inflammation (n = 8 rats/group). Implants with a radiofrequency discharge plasma (RF-C3F8) coating exhibited a favorable short- and long-term immune/inflammatory response comparable to Ti-controls. This was also demonstrated by the significant decrease in pro-inflammatory CD68+ macrophages, possibly downregulated by significantly increasing regulatory T lymphocytes

    PIC simulations of capacitively coupled oxygen rf discharges

    No full text
    Capacitively coupled discharges with a radio-frequency operated voltage (ccrf) are important for plasma assisted material processing. Experiments with electronegative oxygen ccrf discharges show a high-energy peak in the energy distribution of negative ions arriving at the anode, depending on the cathode material used. One possible explanation is ionization at or close to the surface of the cathode for the production of negative ions. By introducing an additional surface ionization model into a Particle-In-Cell (PIC) simulation with Monte Carlo Collisions (MCC) the experimental result is reproduced qualitatively. Comparison of one dimensional and two dimensional simulation results allows an improved understanding of the microscopic processes determining the dynamics of negative ions
    corecore