Hyponatremia as a marker of complicated appendicitis: A systematic review

Background: Acute appendicitis, the most common cause of acute surgical abdomen, is associated with intra-abdominal complications, such as perforation, that increase morbidity and mortality. Early and accurate preoperative diagnosis of complicated appendicitis mandates the identification of new diagnostic markers. This systematic review summarizes current literature on the adoption of hyponatremia as an early diagnostic and predictive marker of complicated appendicitis. Methods: Pubmed, Cochrane Library, Scopus, Google Scholar, WHO Global Health Library, System for Information on Grey Literature, ISI Web of Science, EBSCOHost and Virtual Health Library were searched in accordance with the PRISMA guidelines in order to identify original human studies investigating the association between hyponatremia and the presence or development of complicated appendicitis. Results: A total of 7 studies conducted in 6 different countries were identified. A prospective diagnostic accuracy study reported a strong association between hyponatremia and complicated appendicitis in children. The largest sample size study performed in adults reported a significant association between hyponatremia and perforated or gangrenous appendicitis. Conclusions: The admission serum sodium level measurement, a routinely performed, low-cost test, should be taken into account in patients with clinical presentation compatible with acute appendicitis and suspicion of underlying complications. Future well-designed prospective diagnostic accuracy studies are required to further establish the association between hyponatremia and perforated appendicitis. © 2020 Royal College of Surgeons of Edinburgh (Scottish charity number SC005317) and Royal College of Surgeons in Irelan

Plasma energy and work function of conducting transition metal nitrides for electronic applications

The combination of electrical conductivity, chemical and metallurgical stability, refractory character, having lattice constants that are close to those of III-nitrides makes transition metal nitrides promising candidates for electronics and device applications. We study the structure, stability, and the plasma energy of stoichiometric, transition metal nitrides of similar crystal quality as well as the widest variety of their ternaries ever reported. We establish the phase spaces of the plasma energy (6.9-10.5 eV) and the work function (3.7-5.1 eV) of these complex nitrides with their lattice constant (0.416-0.469 nm) and we investigate the limits of their application

Structure, electronic properties and electron energy loss spectra of transition metal nitride films

We present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features (metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratorie

Structure, electronic properties and electron energy loss spectra of transition metal nitride films

We present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features (metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratorie

Structure and electronic properties of conducting, ternary Ti xTa 1-xN films

We report on the electronic structure and optical properties of conducting ternary transition metal nitrides consisting of metals of different groups of the periodic table of elements. For the study of the bonding, electronic structure, and optical properties of conducting TixTa1−xN film growth, optical spectroscopy and ab initio calculations were used. Despite the different valence electron configuration of the constituent elements, Ta(d3s2) and Ti(d2s2), we show that TiN and TaN are completely soluble due to the hybridization of the d and sp electrons of the metals and N, respectively, that stabilizes the ternary TixTa1−xN systems to the rocksalt structure. The optical properties of TixTa1−xN have been studied using spectroscopic methods and detailed electronic structure calculations, revealing that the plasma energy of the fully dense TixTa1−xN is varying between 7.8 and 9.45 eV. Additional optical absorption bands are manifested due to the N p→Ti/Ta d interband transition the t2g→eg transition due to splitting of the metals’ d band, with the major exception of the Ti0.50Ta0.50N, where the eg unoccupied states are not manifested due to the local structure of the ternary system; this finding is observed for the first time and proves previous assignments of optical transitions in Ta

Structure, stability and bonding of ternary transition metal nitrides

Ternary transition metal nitrides have gained special attention in an effort to improve further the properties of the corresponding binary compounds. In this work, we present a comparative study of a very wide range of ternary transition metal nitrides of the form: TixMe1-xN and TaxMe1-xN (Me = Ti,Zr,Hf,Nb,Ta,Mo,W) over the whole x range (0 < x < 1) grown by Pulsed Laser Deposition (PLD) and by Dual Ion Beam Sputtering. We study the stability of the rocksalt structure in all these films experimentally and theoretically through ab-initio calculations. We investigate the validity of Vegard's rule and the effect of growth-dependent stresses to the lattice constan

Optical properties, structural parameters, and bonding of highly textured rocksalt tantalum nitride films

Tantalum nitride is an interesting solid with exceptional properties and it might be considered as a representative model system of the d3s2 transition metal nitrides. In this work highly textured, stoichiometric, rocksalt TaN(111) films have been grown on Si(100) by pulsed laser deposition. The films were under a triaxial stress, which has been determined by the sin2 ψ method. The stress-free lattice parameter was found to be 0.433±0.001 nm, a value which has been also determined by ab initio calculations within the local spin density approximation. The optical properties of TaN have been studied using spectroscopic ellipsometry and detailed band structure calculations. The electron conductivity of TaN is due to the Ta 5dt2g band that intercepts the Fermi level and is the source of intraband absorption. The plasma energies of fully dense rocksalt TaN were found to be 9.45 and 9.7 eV based on the experimental results and ab initio calculations, respectively. Additional optical absorption bands were also observed around 1.9 and 7.3 eV and attributed to be due to crystal field splitting of the Ta 5d band (t2g→eg transition) and the N p→Ta d interband transition, respectivel