13 research outputs found

    Gait speeds classifications by supervised modulation based machine-learning using Kinect camera

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    Early indication of some diseases such as Parkinson and Multiple Sclerosis often manifests with walking difficulties. Gait analysis provides vital information for assessing the walking patterns during the locomotion, especially when the outcomes are quantitative measures. This paper explores methods that can respond to the changes in the gait features during the swing stage using Kinect Camera, a low cost, marker-free, and portable device offered by Microsoft. Kinect has been exploited for tracking the skeletal positional data of body joints to assess and evaluate the gait performance. Linear kinematic gait features are extracted to discriminate between walking speeds by using five supervised modulation based machine-learning classifiers as follow: Decision Trees (DT), linear/nonlinear Support Vector Machines (SVMs), subspace discriminant and k-Nearest Neighbour (k-NN). The role of modulation techniques such as Frequency Modulation (FM) for increasing the efficiency of classifiers have been explored. The experimental results show that all five classifiers can successfully distinguish gait futures signal associated with walking patterns with high accuracy (average expected value of 86.19% with maximum of 92.9%). This validates the capability of the presented methodology in detecting key “indicators” of health events. Keywords: Gait Analysis, Kinematic Gait Features, Amplitude and Frequency Modulations, Baseband Signal, Passband Mapping, Machine-Learning, Classification Techniqu

    Ge quantum dot arrays grown by ultrahigh vacuum molecular beam epitaxy on the Si(001) surface: nucleation, morphology and CMOS compatibility

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    Issues of morphology, nucleation and growth of Ge cluster arrays deposited by ultrahigh vacuum molecular beam epitaxy on the Si(001) surface are considered. Difference in nucleation of quantum dots during Ge deposition at low (<600 deg C) and high (>600 deg. C) temperatures is studied by high resolution scanning tunneling microscopy. The atomic models of growth of both species of Ge huts---pyramids and wedges---are proposed. The growth cycle of Ge QD arrays at low temperatures is explored. A problem of lowering of the array formation temperature is discussed with the focus on CMOS compatibility of the entire process; a special attention is paid upon approaches to reduction of treatment temperature during the Si(001) surface pre-growth cleaning, which is at once a key and the highest-temperature phase of the Ge/Si(001) quantum dot dense array formation process. The temperature of the Si clean surface preparation, the final high-temperature step of which is, as a rule, carried out directly in the MBE chamber just before the structure deposition, determines the compatibility of formation process of Ge-QD-array based devices with the CMOS manufacturing cycle. Silicon surface hydrogenation at the final stage of its wet chemical etching during the preliminary cleaning is proposed as a possible way of efficient reduction of the Si wafer pre-growth annealing temperature.Comment: 30 pages, 11 figure

    CMOS-compatible dense arrays of Ge quantum dots on the Si(001) surface: hut cluster nucleation, atomic structure and array life cycle during UHV MBE growth

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    We report a direct observation of Ge hut nucleation on Si(001) during UHV molecular beam epitaxy at 360°C. Nuclei of pyramids and wedges were observed on the wetting layer (WL) (M × N) patches starting from the coverage of 5.1 Å and found to have different structures. Atomic models of nuclei of both hut species have been built as well as models of the growing clusters. The growth of huts of each species has been demonstrated to follow generic scenarios. The formation of the second atomic layer of a wedge results in rearrangement of its first layer. Its ridge structure does not repeat the nucleus. A pyramid grows without phase transitions. A structure of its vertex copies the nucleus. Transitions between hut species turned out to be impossible. The wedges contain point defects in the upper corners of the triangular faces and have preferential growth directions along the ridges. The derived structure of the {105} facet follows the paired dimer model. Further growth of hut arrays results in domination of wedges, and the density of pyramids exponentially drops. The second generation of huts arises at coverages >10 Å; new huts occupy the whole WL at coverages ~14 Å. Nanocrystalline Ge 2D layer begins forming at coverages >14 Å

    Control of tensile strain and interdiffusion in Ge/Si(001) epilayers grown by molecular-beam epitaxy

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    Tensile-strained and n-doped Ge has emerged as a potential candidate for the realization ofoptoelectronic devices that are compatible with the mainstream silicon technology. TensilestrainedGe/Si epilayers can be obtained by using the difference of thermal expansion coefficientsbetween Ge and Si. We have combined various surface, structural, and compositionalcharacterizations to investigate the growth mode and the strain state in Ge/Si epilayers grown bymolecular-beam epitaxy. The Ge growth was carried out using a two-step approach: a low temperaturegrowth to produce relaxed and smooth buffer layers, which is followed by a hightemperaturegrowth to get high quality Ge layers. The existence of a substrate temperature windowfrom 260 to 300 C is evidenced, which allows to completely suppress the Ge/Si Stranski-Krastanov growth. As a consequence of the high temperature growth, a tensile strain lying in therange of 0.22%–0.24% is obtained. Concerning the effect of thermal annealing, it is shown thatcyclic annealing may allow increasing the tensile strain up to 0.30%. Finally, we propose anapproach to use carbon adsorption to suppress Si/Ge interdiffusion, which represents one of themain obstacles to overcome in order to realize pure Ge-based optoelectronic devices
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