Effect of temperature on passive film formation of UNS N08031 Cr-Ni alloy in phosphoric acid contaminated with different aggressive anions

tThe influence of temperature and the effect of aggressive anions on the electrochemical behaviour of UNSN08031 stainless steel in a contaminated phosphoric acid solution were evaluated. Stabilisation of thepassive film was studied by potentiodynamic polarisation curves, potentiostatic tests, electrochemicalimpedance spectroscopy (EIS) measurements, Mott Schottky analysis and X-ray photoelectron spec-troscopy (XPS). The stability of the passive film was found to decrease as temperature increases. The filmformed on the stainless steel surface was a n-type semiconductor and the XPS spectrum revealed thepresence of fluoride ions.Authors express their gratitude to the Ministry of Education of Spain (MHE2011-00202) for its financial support during the stay at University of Manchester, to MAEC of Spain (PCI Mediterraneo C/8196/07, C/018046/08, D/023608/09 and D/030177/10) and to the Generalitat Valenciana (GV/2011/093) for the financial support. The authors would also like to acknowledge the support of the School of Materials at the University of Manchester for providing analytical and technical support for the study.Escrivá Cerdán, C.; Blasco Tamarit, ME.; García García, DM.; García Antón, J.; Akid, R.; Walton, J. (2013). Effect of temperature on passive film formation of UNS N08031 Cr-Ni alloy in phosphoric acid contaminated with different aggressive anions. Electrochimica Acta. 111:552-561. https://doi.org/10.1016/j.electacta.2013.08.040S55256111

Sidewall slopes and roughness of SU-8 HARMST

In recent years we have investigated the feasibility of deep X-ray lithography in SU-8 as a means of fabricating very high aspect ratio and densely packed arrays of square channels. We have demonstrated how to overcome the problems in adhesion and stiction accompanying the fabrication of such high aspect ratio structures. We have also examined how to calculate the development time of these structures and how this can be used to optimize the dimensional fidelity of the resulting structures. More recently we have considered the effect of the non-uniform dose deposition and beam hardening as a function of depth in the resist on factors such as the surface roughness and the sidewall taper. In this paper we describe our experimental program, review these results and discuss their implications for the operation of our target device-the lobster-eye telescope

Sidewall slopes and roughness of SU-8 HARMST

In recent years we have investigated the feasibility of deep X-ray lithography in SU-8 as a means of fabricating very high aspect ratio and densely packed arrays of square channels. We have demonstrated how to overcome the problems in adhesion and stiction accompanying the fabrication of such high aspect ratio structures. We have also examined how to calculate the development time of these structures and how this can be used to optimize the dimensional fidelity of the resulting structures. More recently we have considered the effect of the non-uniform dose deposition and beam hardening as a function of depth in the resist on factors such as the surface roughness and the sidewall taper. In this paper we describe our experimental program, review these results and discuss their implications for the operation of our target device-the lobster-eye telescope

Erratum: Sidewall slopes and roughness of SU-8 HARMST

Corrects an error in: Vora, K. D., Shew, B-Y., Lochel, B., Harvey, E. C., Hayes, J. P. and Pelle, A. G. (2008). Sidewall slopes and roughness of SU-8 HARMST. Microsystem Technologies 14 (9-11). 1701-1708. For the original article, see: http://hdl.handle.net/1959.3/35882