Muir Quartet, November 9, 1995

This is the concert program of the Muir Quartet performance on Thursday, November 9, 1995 at 8:00 p.m., at the Tsai Performance Center, 685 Commonwealth Avenue, Boston, Massachusetts. Works performed were String Quartet in C major, K. 465 "Dissonant" by Wolfgang Amadeus Mozart, String Quartet No. 1 "Kreutzer Sonata" by Leos Janacek, and Piano Quintet in C minor, Op. 115 by Gabriel Fauré. Digitization for Boston University Concert Programs was supported by the Boston University Humanities Library Endowed Fund

Nata Bob v. Kuo

USDC for the District of New Jerse

Effect of Lipid Composition on Nanostructured Lipid Carrier (NLC) on Ubiquinone Effectiveness as an Anti-aging Cosmetics

The purpose of this research is to determine the optimum composition of solid lipid and liquid lipid in order to increase the penetration and effectiveness of Q10 as antioxidant in anti-aging cosmetics. Solid lipid and liquid lipid used in this study were cetyl palmitate and caprylic, which were combined to four (4) different ratios, namely 10:0; 9:1; 7:3 and 5:5. NLC Q10 in this study was produced by high shear homogenization method at 3400 rpm for 5 cycles and at 24000 for 1 cycle. The fourth formula was evaluated in term of characteristics, penetration and effectiveness. From the pH test , it was known that all formulas met the skin pH range (4.0-6.0). For the particle size test , all formulas (NLC 1 - NLC 4) were in the range from 269.13 to 354.77 nm with NLC 3 (7: 3) had the smallest particle size. The results of viscosity and surface tension test were also consistent with the theory, where the addition of liquid lipid reduced viscosity and surface tension of the system. The entrapment efficiency (EE) demonstrated the EE of NLC 1: 22.24%; NLC 2: 24.71%; NLC 3: 58.21% and NLC 4:36.94%. The penetration test showed all systems were able to penetrate the dermis layer at the 5th hour. NLC 3 (7:3) had more rapid onset, while the NLC Q10 with the ratio of lipid 9:1, had slower onset of action but can penetrate farther than the other NLC Q10 system. The result of Q10 effectiveness test showed NLC 2 (9:1) has lowest total macrophage (23.33) and very dense collagen observation (score : 4). From this research, it can be concluded that NLC 2 (9:1) had the most optimal lipid composition to increase the penetration and effectiveness of Q10 as an antioxidant in anti-aging cosmetics

Sea breeze: Induced mesoscale systems and severe weather

Sea-breeze-deep convective interactions over the Florida peninsula were investigated using a cloud/mesoscale numerical model. The objective was to gain a better understanding of sea-breeze and deep convective interactions over the Florida peninsula using a high resolution convectively explicit model and to use these results to evaluate convective parameterization schemes. A 3-D numerical investigation of Florida convection was completed. The Kuo and Fritsch-Chappell parameterization schemes are summarized and evaluated

Studies of Neutrino-Electron Scattering at the Kuo-Sheng Reactor Neutrino Laboratory

Studies on electron antineutrino-electron elastic scattering were performed using a 200-kg CsI(Tl) scintillating crystal detector array at the Kuo-Sheng Nuclear Power Plant in Taiwan. The measured cross section of R(exp) = [1.00 +- 0.32(stat)]xR(SM) is consistent with the Standard Model expectation and the corresponding weak mixing angle derived is sin2T = 0.24 +- 0.05 (stat). The results are consistent with a destructive interference effect between neutral and charged-currents in this process. Limits on neutrino magnetic moment of mu(nu_(e)) < 2.0 x 10^(-10) mu_(B) at 90% confidence level and on electron antineutrino charge radius of r^(2) < (0.12 +- 2.07)x10^(-32) cm^2 were also derived.Comment: Parallel talk at ICHEP08, Philadelphia, USA, July 2008. 4 pages, LaTex, 4 eps figure

Recrystallized parylene as a mask for silicon chemical etching

This paper presents the first use of recrystallized parylene as masking material for silicon chemical etch. Recrystallized parylene was obtained by melting parylene C at 350°C for 2 hours. The masking ability of recrystallized parylene was tested in HNA (hydrofluoric acid, nitric acid and acetic acid) solution of various ratios, KOH (potassium hydroxide) solution and TMAH (tetramethylammonium hydroxide) at different temperatures and concentrations. It is found that interface between parylene and the substrate can be attacked, which results in undercuts. Otherwise, recrystallized parylene exhibited good adhesion to silicon, complete protection of unexposed silicon and silicon etching rates comparable to literature data