21 research outputs found

    Exchange Bias in Magnetic Topological Insulator Superlattices.

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    Magnetic doping and proximity coupling can open a band gap in a topological insulator (TI) and give rise to dissipationless quantum conduction phenomena. Here, by combining these two approaches, we demonstrate a novel TI superlattice structure that is alternately doped with transition and rare earth elements. An unexpected exchange bias effect is unambiguously confirmed in the superlattice with a large exchange bias field using magneto-transport and magneto-optical techniques. Further, the Curie temperature of the Cr-doped layers in the superlattice is found to increase by 60 K compared to a Cr-doped single-layer film. This result is supported by density-functional-theory calculations, which indicate the presence of antiferromagnetic ordering in Dy:Bi2Te3 induced by proximity coupling to Cr:Sb2Te3 at the interface. This work provides a new pathway to realizing the quantum anomalous Hall effect at elevated temperatures and axion insulator state at zero magnetic field by interface engineering in TI heterostructures

    Effect of sodium bicarbonate solution on methyltrimethoxysilane-derived silica aerogels dried at ambient pressure

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    Here we present an economical ambient pressure drying method of preparing monolithic silica aerogels from methyltrimethoxysilane precursor while using sodium bicarbonate solution as the exchanging solvent. We prepared silica aerogels with a density and a specific surface area of 0.053 g·cm−3 and 423 m2·g−1, respectively. The average pore diameter of silica aerogels is 23 nm as the pore specific volume is 1.11 cm3·g−1. Further, the contact angle between water droplet and the surface of silica aerogels in specific condition can be as high as 166°, which indicates a super-hydrophobic surface of aerogels

    Controlling the half-metallicity of Heusler/Si(1 1 1) interfaces by a monolayer of Si–Co–Si

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    By using first-principles calculations we show that the spin-polarization reverses its sign at atomically abrupt interfaces between the half-metallic Co₂ (Fe,Mn)(Al,Si) and Si(1 1 1). This unfavourable spin-electronic configuration at the Fermi-level can be completely removed by introducing a Si–Co–Si monolayer at the interface. In addition, this interfacial monolayer shifts the Fermi-level from the valence band edge close to the conduction band edge of Si. We show that such a layer is energetically favourable to exist at the interface. This was further confirmed by direct observations of CoSi₂ nano-islands at the interface, by employing atomic resolution scanning transmission electron microscopy

    Element specific spin and orbital moments of nanoscale CoFeB amorphous thin films on GaAs(100)

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    CoFeB amorphous films have been synthesized on GaAs(100) and studied with X-ray magnetic circular dichroism (XMCD) and transmission electron microscopy (TEM). We have found that the ratios of the orbital to spin magnetic moments of both the Co and Fe in the ultrathin amorphous film have been enhanced by more than 300% compared with those of the bulk crystalline Co and Fe, and specifically a large orbital moment of 0.56 μB from the Co atoms has been observed and at the same time the spin moment of the Co atoms remains comparable to that of the bulk hcp Co. The results indicate that the large uniaxial magnetic anisotropy (UMA) observed in the ultrathin CoFeB film on GaAs(100) is related to the enhanced spin-orbital coupling of the Co atoms in the CoFeB. This work offers experimental evidences of the correlation between the UMA and the element specific spin and orbital moments in the CoFeB amorphous film on the GaAs(100) substrate, which is of significance for spintronics applications

    Effect of annealing on the structure and magnetic properties of Co2FeAl0.5Si0.5 thin films on Ge(111)

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    Abstract We present a magnetic and structural properties study of epitaxially grown B2-ordered full Heusler Co2FeSi0.5Al0.5 single crystal films on Ge(111) substrates, as a function of annealing temperature. Hysteresis loop measurements reveal that the magnetic properties of Co2FeSi0.5Al0.5 are stable up to 450 °C while ferromagnetic resonance linewidth measurements show a reduction of Gilbert damping from 5.6 × 10−3 to 2.9 × 10−3 for as-grown and annealed film, respectively. Above 500 °C, the films have increased coercivity, decreased saturation magnetisation, and show characteristic two-magnon scattering resonance line-shapes. Magnetic inhomogeneities developed within the film when annealed above 500 °C were correlated to significant interdiffusion at the film-substrate interface, as confirmed by scanning transmission electron microscopy and electron energy loss spectroscopy. By performing first-principles calculations based on atomistic models developed from atomically-resolved microscopy images, we show the magnetic moment of the Co2FeSi0.5Al0.5 film reduces upon Co substitution by Ge atoms

    The role of chemical structure on the magnetic and electronic properties of Co2FeAl0.5Si0.5/Si(111) interface

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    We show that Co2FeAl0.5Si0.5 film deposited on Si(111) has a single crystal structure and twin related epitaxial relationship with the substrate. Sub-nanometer electron energy loss spectroscopy shows that in a narrow interface region there is a mutual inter-diffusion dominated by Si and Co. Atomic resolution aberration-corrected scanning transmission electron microscopy reveals that the film has B2 ordering. The film lattice structure is unaltered even at the interface due to the substitu- tional nature of the intermixing. First-principles calculations performed using structural models based on the aberration corrected electron microscopy show that the increased Si incorporation in the film leads to a gradual decrease of the magnetic moment as well as significant spin-polarization reduction. These effects can have significant detrimental role on the spin injection from the Co2FeAl0.5Si0.5 film into the Si substrate, besides the structural integrity of this junction

    Correlation between spin transport signal and Heusler/semiconductor interface quality in lateral spin-valve devices

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    We show direct evidence for the impact of Heusler/semiconductor interfaces atomic structure on the spin transport signals in semiconductor-based lateral spin-valve (LSV) devices. Based on atomic scale Z-contrast scanning transmission electron microscopy and energy dispersive x-ray spectroscopy we show that atomic order/disorder of Co2FeAlSi (CFAS)/-Ge LSV devices is critical for the spin injection in Ge. By conducting a postannealing of the LSV devices, we find 90% decrease in the spin signal while there is no difference in the electrical properties of the CFAS /n-Ge contacts and in the spin diffusion length of the n-Ge layer. We show that the reduction in the spin signals after annealing is attributed to the presence of intermixing phases at the Heusler/semiconductor interface. First-principles calculations show how that intermixed interface region has drastically reduced spin polarization at the Fermi level, which is the main cause for the significant decrease of the spin signal in the annealed devices above 300 C

    Magnetic and structural depth profiles of Heusler alloy Co2FeAl0.5Si0.5 epitaxial films on Si(1 1 1)

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    The depth-resolved chemical structure and magnetic moment of Co2FeAl0.5Si0.5, thin films grown on Si(1 1 1) have been determined using x-ray and polarized neutron reflectometry. Bulk-like magnetization is retained across the majority of the film, but reduced moments are observed within 45˚A of the surface and in a 25˚A substrate-interface region. The reduced moment is related to compositional changes due to oxidation and diffusion, which are further quantified by elemental profiling using electron microscopy with electron energy loss spectroscopy. The accuracy of structural and magnetic depth-profiles obtained from simultaneous modeling is discussed using different approaches with different degree of constraints on the parameters. Our approach illustrates the challenges in fitting reflectometry data from these multi-component quaternary Heusler alloy thin films
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