Charge-exchange plasma generated by an ion thruster

The charge exchange plasma generated by an ion thruster was investigated experimentally using both 5 cm and 15 cm thrusters. Results are shown for wide ranges of radial distance from the thruster and angle from the beam direction. Considerations of test environment, as well as distance from the thruster, indicate that a valid simulation of a thruster on a spacecraft was obtained. A calculation procedure and a sample calculation of charge exchange plasma density and saturation electron current density are included

FOOD RETAILING CONSOLIDATION: IMPLICATIONS FOR SUPPLY CHAIN MANAGEMENT PRACTICES

Agribusiness,

WHAT'S DRIVING FOOD DISTRIBUTION - FORCES FOR CHANGE

Agribusiness, Research and Development/Tech Change/Emerging Technologies,

High current electrical lead

An electrical lead has insulators imbedded in an inner conductor rod to form an annulus between the rod and a surrounding outer sheath. This annular space is filled with gas which conducts heat and prevents electrical leakage

Electrostatic ion rocket engine Patent

Electron bombardment ion rocket engine with improved propellant introduction syste

Electrostatic ion engine having a permanent magnetic circuit Patent

Ion engine with magnetic circuit for optimal discharg

Experimental Simulation of the Interaction of Biased Solar Arrays with the Space Plasma

The phenomenon of unexpectedly large leakage currents collected by small exposed areas of high voltage solar arrays operating in a plasma environment was investigated. Polyimide (Kapton) was the insulating material used in all tests. Both positive bias (electron collection) and negative bias (ion collection) tests were performed. A mode change in the electron collection mechanism was associated with a glow discharge process and was found to be related to the neutral background density. Results indicate that the glow discharge collection mode does not occur in a space environment where the background density is considerably lower than that of the vacuum facility used

Industrial ion source technology

An analytical model was developed to describe the development of a coned surface texture with ion bombardment and simultaneous deposition of an impurity. A mathematical model of sputter deposition rate from a beveled target was developed in conjuction with the texturing models to provide an important input to that model. The establishment of a general procedure that will allow the treatment of manay different sputtering configurations is outlined. Calculation of cross sections for energetic binary collisions was extened to Ar, Kr.. and Xe with total cross sections for viscosity and diffusion calculated for the interaction energy range from leV to 1000eV. Physical sputtering and reactive ion etching experiments provided experimental data on the operating limits of a broad beam ion source using CF4 as a working gas to produce reactive species in a sputtering beam. Magnetic clustering effects are observed when Al is seeded with Fe and sputtered with Ar(?) ions. Silicon was textured at a micron scale by using a substrate temperature of 600 C