2,733 research outputs found

    Water Immersion Optical Lithography for the 45nm Node

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    It is possible to extend optical lithography by using immersion imaging methods. Historically, the application of immersion optics to microlithography has not been seriously pursued because of the alternative solutions available. As the challenges of shorter wavelength become increasingly difficult, immersion imaging becomes more feasible. We present results from research into 193nm excimer laser immersion lithography at extreme propagation angles (such as those produces with strong OAI and PSM). This is being carried out in a fluid that is most compatible in a manufacturable process, namely water. By designing a system around the optical properties of water, we are able to image with wavelengths down to 193nm. Measured absorption is below 0.50 cm at 185nm and below 0.05 cm\u27 at 193nm. Furthermore, through the development of oblique angle imaging, numerical apertures approaching 1.0 in air and 1.44 in water are feasible. The refractive index of water at 193nm (1.44) allows for exploration of the following: 1. k1 values approaching 0. 17 and optical lithography approaching 35nm. 2. Polarization effects at oblique angles (extreme NA). 3. Immersion and photoresist interactions with polarization. 4. Immersion fluid composition, temperature, flow, and micro-bubble influence on optical properties (index, absorption, aberration, birefringence). 5. Mechanical requirements for imaging, scanning, and wafer transport in a water media. 6. Synthesizing conventional projection imaging via interferometric imaging

    Europe’s first and last field trial of gene-edited plants?

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    On 5 June this year the first field trial of a CRISPR-Cas-9 gene-edited crop began at Rothamsted Research in the UK, having been approved by the UK Department for Environment, Food & Rural Affairs. However, in late July 2018, after the trial had started, the European Court of Justice ruled that techniques such as gene editing fall within the European Union's 2001 GMO directive, meaning that our gene-edited Camelina plants should be considered as genetically modified (GM). Here we describe our experience of running this trial and the legal transformation of our plants. We also consider the future of European plant research using gene-editing techniques, which now fall under the burden of GM regulation, and how this will likely impede translation of publicly funded basic researc

    Multi-Task Imitation Learning for Linear Dynamical Systems

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    We study representation learning for efficient imitation learning over linear systems. In particular, we consider a setting where learning is split into two phases: (a) a pre-training step where a shared kk-dimensional representation is learned from HH source policies, and (b) a target policy fine-tuning step where the learned representation is used to parameterize the policy class. We find that the imitation gap over trajectories generated by the learned target policy is bounded by O~(knxHNshared+knuNtarget)\tilde{O}\left( \frac{k n_x}{HN_{\mathrm{shared}}} + \frac{k n_u}{N_{\mathrm{target}}}\right), where nx>kn_x > k is the state dimension, nun_u is the input dimension, NsharedN_{\mathrm{shared}} denotes the total amount of data collected for each policy during representation learning, and NtargetN_{\mathrm{target}} is the amount of target task data. This result formalizes the intuition that aggregating data across related tasks to learn a representation can significantly improve the sample efficiency of learning a target task. The trends suggested by this bound are corroborated in simulation.Comment: Appeared in L4DC 2023. V3: corrected typo in assumption

    Immersion Microlithography at 193 nm with a Talbot Prism Interferometer

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    A Talbot interference immersion lithography system that uses a compact prism is presented. The use of a compact prism allows the formation of a fluid layer between the optics and the image plane, enhancing the resolution. The reduced dimensions of the system alleviate coherence requirements placed on the source, allowing the use of a compact ArF excimer laser. Photoresist patterns with a half-pitch of 45 nm were formed at an effective NA of 1.05. In addition, a variable-NA immersion interference system was used to achieve an effective NA of 1.25. The smallest half-pitch of the photoresist pattern produced with this system was 38 nm
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