54 research outputs found

    A method to extract pure Raman spectrum of epitaxial graphene on SiC

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    A method is proposed to extract pure Raman spectrum of epitaxial graphene on SiC by using a Non-negative Matrix Factorization. It overcomes problems of negative spectral intensity and poorly resolved spectra resulting from a simple subtraction of a SiC background from the experimental data. We also show that the method is similar to deconvolution, for spectra composed of multiple sub- micrometer areas, with the advantage that no prior information on the impulse response functions is needed. We have used this property to characterize the Raman laser beam. The method capability in efficient data smoothing is also demonstrated.Comment: 3 figures, regular pape

    Epitaxial Graphene on Silicon Carbide

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    Spectral Current Density and Responsivity Scaling for Fourier Transform Photocurrent Spectroscopy

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    We propose and experimentally verify two methods to scale arbitrary units to photocurrent spectral density (A/eV) in Fourier Transform Photocurrent (FTPC) spectroscopy. We also propose the FTPC scaling to responsivity (A/W), provided a narrow-band optical power measurement is available. The constant background of the interferogram provides a precise determination of the photocurrent spectral density. The second method relies on the scaled amplitude of the interferogram. Although the latter method leads to more significant errors, it still provides good order of magnitude estimates of the total photocurrent. We demonstrate the technique on a calibrated InGaAs diode and weak responsivity SiC interdigital sensors. We identify a series of impurity-band and interband transitions in the SiC sensors.Comment: 5 pages, 4 figure

    Controlled epitaxial graphene growth within amorphous carbon corrals

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    Structured growth of high quality graphene is necessary for technological development of carbon based electronics. Specifically, control of the bunching and placement of surface steps under epitaxial graphene on SiC is an important consideration for graphene device production. We demonstrate lithographically patterned evaporated amorphous carbon corrals as a method to pin SiC surface steps. Evaporated amorphous carbon is an ideal step-flow barrier on SiC due to its chemical compatibility with graphene growth and its structural stability at high temperatures, as well as its patternability. The amorphous carbon is deposited in vacuum on SiC prior to graphene growth. In the graphene furnace at temperatures above 1200^\circC, mobile SiC steps accumulate at these amorphous carbon barriers, forming an aligned step free region for graphene growth at temperatures above 1330^\circC. AFM imaging and Raman spectroscopy support the formation of quality step-free graphene sheets grown on SiC with the step morphology aligned to the carbon grid

    Wafer bonding solution to epitaxial graphene - silicon integration

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    The development of graphene electronics requires the integration of graphene devices with Si-CMOS technology. Most strategies involve the transfer of graphene sheets onto silicon, with the inherent difficulties of clean transfer and subsequent graphene nano-patterning that degrades considerably the electronic mobility of nanopatterned graphene. Epitaxial graphene (EG) by contrast is grown on an essentially perfect crystalline (semi-insulating) surface, and graphene nanostructures with exceptional properties have been realized by a selective growth process on tailored SiC surface that requires no graphene patterning. However, the temperatures required in this structured growth process are too high for silicon technology. Here we demonstrate a new graphene to Si integration strategy, with a bonded and interconnected compact double-wafer structure. Using silicon-on-insulator technology (SOI) a thin monocrystalline silicon layer ready for CMOS processing is applied on top of epitaxial graphene on SiC. The parallel Si and graphene platforms are interconnected by metal vias. This method inspired by the industrial development of 3d hyper-integration stacking thin-film electronic devices preserves the advantages of epitaxial graphene and enables the full spectrum of CMOS processing.Comment: 15 pages, 7 figure

    Investigation of internal electric fields in graphene/6H-SiC under illumination by Pockels effect

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    In this paper, we introduce a method for mapping profiles of internal electric fields in birefringent crystals based on the electro-optic Pockels effect and measuring phase differences of low-intensity polarized light. In the case of the studied 6H-SiC crystal with graphene electrodes, the experiment is significantly affected by birefringence at zero bias voltage applied to the crystal and a strong thermo-optical effect. We dealt with these phenomena by adding a Soleil-Babinet compensator and using considerations based on measurements of crystal heating under laser illumination. The method can be generalized and adapted to any Pockels crystal that can withstand sufficiently high voltages. We demonstrate the significant formation of space charge in semi-insulating 6H-SiC under illumination by above-bandgap light

    Local work function measurements of plasma-fluorinated epitaxial graphene

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    International audiencePlasma-fluorination is an attractive route toward the work function engineering of graphene. The effect of surface topography of epitaxial graphene grown on silicon carbide on the increase in work function after plasma-fluorination was investigated using scanning Kelvin probe microscopy. Results of these studies demonstrate the ability of plasma-treatments to functionalize epitaxial graphene without significant surface roughening. For few-layer epitaxial graphene on the Si-face, work function distribution corresponds to its surface topography. A bimodal distribution is observed before and after fluorination and the separation between the two modes widens after the fluorination. For multi-layer epitaxial graphene on the C-face, no correlation is observed between the work function distribution and the surface topography. After fluorination, the work function is fairly uniform except in few peeled off areas that show a stronger work function contrast

    Plasmon-plasmon interaction and the role of buffer in epitaxial graphene micro-flakes

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    We investigate the origin of the translational symmetry breaking in epitaxially grown single-layer graphene. Despite the surface morphology of homogeneous graphene films influenced by the presence of mutually parallel SiC surface terraces, the far-infrared magneto-plasmon absorption is almost independent of the angle between the probing light polarization and the orientation of terraces. Based on a detailed analysis of the plasmon absorption lineshape and its behavior in the magnetic field, supported by confocal Raman mapping and atomic force microscopy, we explain this discrepancy by spontaneously formed graphene micro flakes. We further support our conclusions using data collected on artificially created graphene nanoribbons: we recognize similar plasmon origin in artificial ribbons and naturally formed grains. An unexpectedly large plasmon resonance redshift was observed in nanoribbons. In a hydrogen-intercalated sample (which does not contain the buffer), this redshift is quantitatively taken into account by a plasmon-plasmon interaction. In non-intercalated samples featuring a buffer layer, this redshift is due to an interplay between the plasmon-plasmon coupling and Coulomb screening by the buffer-induced interface states. This model determines the density of interface states in good agreement with experimentally reported values.Comment: 17 pages, 10 figures, 4 table

    Circular polarization in a non-magnetic resonant tunneling device

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    We have investigated the polarization-resolved photoluminescence (PL) in an asymmetric n-type GaAs/AlAs/GaAlAs resonant tunneling diode under magnetic field parallel to the tunnel current. The quantum well (QW) PL presents strong circular polarization (values up to -70% at 19 T). The optical emission from GaAs contact layers shows evidence of highly spin-polarized two-dimensional electron and hole gases which affects the spin polarization of carriers in the QW. However, the circular polarization degree in the QW also depends on various other parameters, including the g-factors of the different layers, the density of carriers along the structure, and the Zeeman and Rashba effects

    Axion Search by Laser-based Experiment OSQAR

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    International audienceLaser-based experimentOSQAR in CERN is aimed to the search of the axions by twomethods. The photon regeneration experiment is using two LHC dipole magnets of the length 14.3 m and magnetic field 9.5 T equipped with an optical barrier at the end of the first magnet. It looks as light shining through the wall. No excess of events above the background was detected at this arrangement. Nevertheless, this result extends the exclusion region for the axion mass. The second method wants to measure the ultra-fine Vacuum Magnetic Birefringence for the first time. An optical scheme with electro-optical modulator has been proposed, validated and subsequently improved. Cotton-Mouton constant for air was determined in this experiment setup
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