44 research outputs found

    Chemical vapor deposition growth

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    A chemical vapor deposition (CVD) reactor system with a vertical deposition chamber was used for the growth of Si films on glass, glass-ceramic, and polycrystalline ceramic substrates. Silicon vapor was produced by pyrolysis of SiH4 in a H2 or He carrier gas. Preliminary deposition experiments with two of the available glasses were not encouraging. Moderately encouraging results, however, were obtained with fired polycrystalline alumina substrates, which were used for Si deposition at temperatures above 1,000 C. The surfaces of both the substrates and the films were characterized by X-ray diffraction, reflection electron diffraction, scanning electron microscopy optical microscopy, and surface profilometric techniques. Several experiments were conducted to establish baseline performance data for the reactor system, including temperature distributions on the sample pedestal, effects of carrier gas flow rate on temperature and film thickness, and Si film growth rate as a function of temperature

    Chemical vapor deposition growth

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    A laboratory type CVD reactor system with a vertical deposition chamber and sample pedestal heated by an external RF coil has been extensively modified by installation of mass flow controllers, automatic process sequence timers, and special bellows-sealed air-operated valves for overall improved performance. Various film characterization procedures, including classical metallography, SEM analyses, X ray diffraction analyses, surface profilometry, and electrical measurements (resistivity, carrier concentration, mobility, spreading resistance profiles, and minority-carrier lifetime by the C-V-t method) area used to correlate Si sheet properties with CVD parameters and substrate properties. Evaluation procedures and measurements are given. Experimental solar cell structures were made both in epitaxial Si sheet (on sapphire substrates) and in polycrystalline material on alumina substrates, the former to provide an indication of what might be an upper limit on performance of the latter. Preliminary results are given, as obtained in cell structures not specially designed to allow for the unique properties of the sheet material, and fabricated in material known to be far from optimum for photovoltaic performance. Low power conversion efficiencies have been obtained in the epitaxial as well as the polycrystalline Si sheet

    Chemical vapor deposition growth

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    The objective was to investigate and develop chemical vapor deposition (CVD) techniques for the growth of large areas of Si sheet on inexpensive substrate materials, with resulting sheet properties suitable for fabricating solar cells that would meet the technical goals of the Low Cost Silicon Solar Array Project. The program involved six main technical tasks: (1) modification and test of an existing vertical-chamber CVD reactor system; (2) identification and/or development of suitable inexpensive substrate materials; (3) experimental investigation of CVD process parameters using various candidate substrate materials; (4) preparation of Si sheet samples for various special studies, including solar cell fabrication; (5) evaluation of the properties of the Si sheet material produced by the CVD process; and (6) fabrication and evaluation of experimental solar cell structures, using impurity diffusion and other standard and near-standard processing techniques supplemented late in the program by the in situ CVD growth of n(+)/p/p(+) sheet structures subsequently processed into experimental cells

    Production of XeO * in a CW microwave discharge

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    A low-power CW microwave discharge at 2.45 GHz was used to produce XeO * excimer molecules. It was found that a total gas pressure between 5 and 20 Torr, absorbed power of about 20ā€“100 W, and an oxygen-to-xenon ratio of 1āˆ¶100 maximized the XeO( 1 Sāˆ’ 1 D) green emission at 5200 to 5600 ƅ. The XeO * emission appeared in the cooler parts of the discharge near the containment tube walls and in the electric field nodes of the TM 012 resonant mode.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/45480/1/11090_2005_Article_BF01023916.pd

    Silicon Grain Delineation Using Ethylenediamine Pyrocatechol

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    Forestomach papillomas in flaky skin and steel-Dickie mutant mice.

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    Gastric papillomas were diagnosed in flaky skin (fsn/fsn) and steel-Dickie (Sl/Sld) mutant mice but not littermate controls. Both mutants suffer from severe anemia of differing causes. Immunohistochemical screening and Southern blot analyses failed to detect any evidence of a papillomavirus in the gastric lesions. Phenotypic expression of the fsn and Sld mutant genes may play an essential role in the spontaneous development of forestomach papillomas in these mouse mutants

    An Apparatus for Membrane-confined Analytical Electrophoresis

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    A membraneā€confined analytical electrophoresis apparatus for measuring the solution charge of macromolecules has been described previously (T. M. Laue et al., Anal. Biochem. 1989, 182, 377ā€“382). Presented here is a design for this apparatus, which permits the onā€line acquisition and display of absorbance data from up to 512 positions along an analysis chamber. Concentration distributions of macromolecules in solution can be monitored in the chamber to provide steadyā€state electrophoresis, electrophoretic mobility and diffusion measurements. Buffer chambers press semipermeable membranes against the open ends of a fusedā€silica cuvette to form the analysis chamber. This configuration permits both the flow of buffer and the establishment of an electric field across the cuvette, while retaining macromolecules in the field of view. Though a gel may be included in the analysis chamber, none is required for gradient stabilization. The volume of sample required for analysis is 8 Ī¼L, most of which is recoverable. Experimental conditions can be varied during study by simply changing the circulating buffer and/or the electric field. The analysis and buffer chambers are held in an aluminum housing that sits in an aluminum water jacket. The water jacket provides temperature control, shielding from external electrical noise and also serves as an optical mask. Plans for the cell assembly, optical system and the computer interface for data acquisition are provided. The assembly and operation of the apparatus and the analysis of data are described
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