Maternal and perinatal outcomes after bariatric surgery: a spanish multicenter study

The final publication is avaliable at Springer Link[Abstract] Background. Bariatric surgery (BS) has become more frequent among women of child-bearing age. Data regarding the underlying maternal and perinatal risks are scarce. The objective of this nationwide study is to evaluate maternal and perinatal outcomes after BS. Methods. We performed a retrospective observational study of 168 pregnancies in 112 women who underwent BS in 10 tertiary hospitals in Spain over a 15-year period. Maternal and perinatal outcomes, including gestational diabetes mellitus (GDM), pregnancy-associated hypertensive disorders (PAHD), pre-term birth cesarean deliveries, small and large for gestational age births (SGA, LGA), still births, and neonatal deaths, were evaluated. Results were further compared according to the type of BS performed: restrictive techniques (vertical-banded gastroplasty, sleeve gastrectomy, and gastric banding), Roux-en-Y gastric bypass (RYGB), and biliopancreatic diversion (BPD). Results. GDM occurred in five (3 %) pregnancies and there were no cases of PAHD. Women whose pregnancies occurred before 1 year after BS had a higher pre-gestational body mass index (BMI) than those who got pregnant 1 year after BS (34.6 ± 7.7 vs 30.4 ± 5.3 kg/m2, p = 0.007). In pregnancies occurring during the first year after BS, a higher rate of stillbirths was observed compared to pregnancies occurring after this period of time (35.5 vs 16.8 %, p = 0.03). Women who underwent BPD delivered a higher rate of SGA babies than women with RYGB or restrictive procedures (34.8, 12.7, and 8.3 %, respectively). Conclusions. Pregnancy should be scheduled at least 1 year after BS. Malabsorptive procedures are associated to a higher rate of SGA births

Role of age and comorbidities in mortality of patients with infective endocarditis

[Purpose]: The aim of this study was to analyse the characteristics of patients with IE in three groups of age and to assess the ability of age and the Charlson Comorbidity Index (CCI) to predict mortality. [Methods]: Prospective cohort study of all patients with IE included in the GAMES Spanish database between 2008 and 2015.Patients were stratified into three age groups:<65 years,65 to 80 years,and ≥ 80 years.The area under the receiver-operating characteristic (AUROC) curve was calculated to quantify the diagnostic accuracy of the CCI to predict mortality risk. [Results]: A total of 3120 patients with IE (1327 < 65 years;1291 65-80 years;502 ≥ 80 years) were enrolled.Fever and heart failure were the most common presentations of IE, with no differences among age groups.Patients ≥80 years who underwent surgery were significantly lower compared with other age groups (14.3%,65 years; 20.5%,65-79 years; 31.3%,≥80 years). In-hospital mortality was lower in the <65-year group (20.3%,<65 years;30.1%,65-79 years;34.7%,≥80 years;p < 0.001) as well as 1-year mortality (3.2%, <65 years; 5.5%, 65-80 years;7.6%,≥80 years; p = 0.003).Independent predictors of mortality were age ≥ 80 years (hazard ratio [HR]:2.78;95% confidence interval [CI]:2.32–3.34), CCI ≥ 3 (HR:1.62; 95% CI:1.39–1.88),and non-performed surgery (HR:1.64;95% CI:11.16–1.58).When the three age groups were compared,the AUROC curve for CCI was significantly larger for patients aged <65 years(p < 0.001) for both in-hospital and 1-year mortality. [Conclusion]: There were no differences in the clinical presentation of IE between the groups. Age ≥ 80 years, high comorbidity (measured by CCI),and non-performance of surgery were independent predictors of mortality in patients with IE.CCI could help to identify those patients with IE and surgical indication who present a lower risk of in-hospital and 1-year mortality after surgery, especially in the <65-year group

Procedure for directly obtaining the extinction coefficient of low absorption materials

[ES] Procedimiento de obtención directa del coeficiente de extinción de materiales de pequeña absorción, que comprende las etapas de proporcionar una muestra depositando en un sustrato (1) dos láminas (3, 4), una de mayor grosor (X1) y una de un grosor (X2) menor de un material (2) de baja absorción, proporcionar un haz de luz (5) con una polarización p en una longitud de onda de trabajo, que incide en las láminas (3, 4) siguiendo el ángulo θB de Brewster, crear un movimiento relativo con una frecuencia determinada entre el haz de luz (5) y la muestra de tal manera que el haz de luz (5) se desplace entre las dos láminas (3, 4), obtener una diferencia de transmitancia (ΔT) entre las dos láminas (3, 4), y derivar a partir de ello el coeficiente de extinción k.[EN] Procedure for directly obtaining the extinction coefficient of low absorption materials, comprising the steps of providing a sample by depositing two sheets (3, 4) on a substrate (1), one thicker (X1) and one thicker (X1). X2) smaller than a material (2) with low absorption, provide a beam of light (5) with a polarization p at a working wavelength, which hits the sheets (3, 4) following the Brewster angle θB , create a relative movement with a certain frequency between the light beam (5) and the sample in such a way that the light beam (5) moves between the two sheets (3, 4), obtain a transmittance difference (ΔT) between the two sheets (3, 4), and derive from this the extinction coefficient k.NoConsejo Superior de Investigaciones Científicas (CSIC)A1 Solicitud de patente con informe sobre el estado de la técnic

Far UV-enhanced Al mirrors with a Ti seed film

7 pags., 4 figs.A Ti seed film is investigated towards improving the far UV reflectance of Al/MgF2 mirrors. Samples were initially coated with a Ti film in half of the area and they were later coated in the full area with an Al film and protected with MgF2. All materials were deposited by evaporation. Samples were prepared with the MgF2 layer deposited either at room temperature (RT) or at 225°C. A 3-nm thick Ti seed film was seen to significantly increase the reflectance of Al/MgF2 mirrors at the well-known reflectance dip centered at ∼160 nm; this was attributed to a reduction of short-range surface roughness at the Al/MgF2 interface, which is responsible for radiation absorption through surface-plasmon (SP) coupling. SP absorption was more efficiently reduced with a Ti seed film on samples fully deposited at RT. A Ti seed film as thin as 1 nm provided the largest SP absorption reduction, and the SP dip was almost completely removed.Agencia Estatal de Investigación (PID2019-105156GB-I00).Peer reviewe

New tools for optical constant calculation and analysis

Conferencia invitada. -- 304. PTB-Seminar, Helmholtz-Building of the Berlin-Charlottenburg, October 19th - 20th, 2017Peer Reviewe

Improved broadband and narrowband far UV coatings

237th Meeting Online Planner of the American Astronomical Society, 12-15 January 2021, virtually anywhereNASA Ultraviolet & visible light (UV-Vis) SIG and Technology Interest Group (TIG

Far-UV reflectance and stress of narrowband AlF3/LaF3 multilayers

14 pags., 9 figs., 3 tabs.Upcoming space instrumentation, such as LUMOS (LUVOIR Ultraviolet MultiObject Spectrograph) in LUVOIR (Large Ultraviolet Optical Infrared Surveyor) mission, demands efficient narrowband coatings centered in the far UV (FUV). Narrowband FUV coatings can be prepared with all-dielectric multilayers (MLs) based on two fluorides. This research evaluates the performance of AlF3/LaF3 FUV MLs prepared by thermal evaporation and compares this performance with MgF2/LaF3 MLs, which were previously investigated. FUV reflectance, stress, and the influence of substrate materials have been investigated, along with ML stability over time when stored in a desiccator. Coatings were deposited both on fused silica and on CaF2 crystals, two common optical substrates. AlF3/LaF3 MLs exhibited reduced stress compared with MgF2/LaF3 MLs, resulting in a larger thickness threshold before crack generation. This enables preparing MLs with more layers and hence with higher performance. AlF3/LaF3 MLs underwent lower reflectance decay over time compared with MgF2/LaF3 MLs. Fresh MLs centered at ~160 nm displayed a peak reflectance close to 100%, and most of the AlF3/LaF3 MLs kept a reflectance of 99% after several months of storage. The bandwidth of AlF3/LaF3 MLs for a given number of layers was found to be somewhat larger than for MgF2/LaF3 MLs.Agencia Estatal de Investigación (BES-2017-081909, ESP2016- 76591-P, PID2019-105156GB-I00); Ministerio de Economía, Industria y Competitividad, Gobierno de España (BES-2017-081909)

Polarizers tuned at key far-UV spectral lines for space instrumentation

8 pags., 4 figs., 2 tabs. -- EUV and X-ray Optics: Synergy between Laboratory and Space V. -- SPIE Optics + Optoelectronics, 2017, Prague, Czech RepublicPolarimetry is a valuable technique to help us understand the role played by the magnetic field of the coronal plasma in the energy transfer processes from the inner parts of the Sun to the outer space. Polarimetry in the far ultraviolet (FUV: 100-200 nm), which must be performed from space due to absorption in terrestrial atmosphere, supplies fundamental data of processes that are governed by the Doppler and Hanle effects on resonantly scattered line-emission. To observe these processes there are various key spectral lines in the FUV, from which H I Lyman ¿ (121.6 nm) is the strongest one. Hence some solar physics missions that have been proposed or are under development plan to perform polarimetry at 121.6 nm, like the suborbital missions CLASP I (2015) and CLASP II (2018), and the proposed solar missions SolmeX and COMPASS and stellar mission Arago. Therefore, the development of efficient FUV linear polarizers may benefit these and other possible future missions. C IV (155 nm) and Mg II (280 nm) are other spectral lines relevant for studies of solar and stellar magnetized atmospheres. High performance polarizers can be obtained with optimized coatings. Interference coatings can tune polarizers at the spectral line(s) of interest for solar and stellar physics. Polarizing beamsplitters consist in polarizers that separate one polarization component by reflection and the other by transmission, which enables observing the two polarization components simultaneously with a single polarizer. They involve the benefit of a higher efficiency in collection of polarization data due to the use of a single polarizer for the two polarization components and they may also facilitate a simplified design for a space polarimeter. We present results on polarizing beamsplitters tuned either at 121.6 nm or at the pair of 155 and 280 nm spectral lines.We acknowledge support by the European Community–Research Infrastructure Action under the FP6 ‘Structuring the European Research Area’ Programme (through the Integrated Infrastructure Initiative ‘Integrating Activity on Synchrotron and Free Electron Laser Science’); measurements were performed under ELETTRA proposal numbers 20115134, 20120059, 20125119, 20130201, 20135237, 20140171, 20150344, and 2015497. This work was also supported by the National Programme for Research, Subdirección General de Proyectos de Investigación, Ministerio de Ciencia e Innovación, project numbers AYA2013-42590-P and ESP2016-76591-P. We also acknowledge support by the Italian Ministry of University and Research (MIUR) under the Programmi di Ricerca Scientifica di Rilevante Interesse Nazionale—Bando 2012.Peer Reviewe

Optimization of the deposition parameters of MgF2/LaF3 narrowband reflective FUV multilayers

14 pags., 7 figs., 3 tabs.The development of efficient dielectric coatings in the far UV (FUV) is demanded for upcoming space instrumentation, such as LUMOS (LUVOIR Ultraviolet Multi-Object Spectrograph) in LUVOIR mission, among other applications. Multilayers (MLs) based on MgF2 and LaF3 have been developed in the last decades for the 157-nm and 193-nm lithography, demonstrating excellent optical properties. Yet, the deposition procedure to obtain coatings with optimal performance has not been fully detailed in the open literature, such as the dependence of ML performance with deposition and post-deposition temperature. This research investigates the effect of the substrate deposition temperature of MgF2/LaF3 ML coatings prepared by thermal evaporation on FUV reflectance, stress, roughness, as well as the performance of the coatings and their evolution over time. The relatively higher expansion coefficient of these two fluorides in comparison with fused silica substrates results in a large tensile stress for coatings deposited at high temperature and later cooled down to room temperature. Such stress may result in coating cracking and delamination. A compromise deposition temperature of ∼240°C and 13 bilayers was found for optimal ML reflectance peaked at ∼160 nm before cracks are generated. Above this deposition temperature, stress increased, which resulted in an extension of the cracked area and in a slight roughness increase and FUV reflectance decrease. MLs that were deposited at room temperature and later annealed resulted in a similar reflectance and stress to those of hot-deposited coatings for a given temperature.Ministerio de Economía, Industria y Competitividad, Gobierno de España (BES-2017-081909, ESP2016-76591-P, PID2019-105156GB-I00).Peer reviewe

Enhanced Far-UV reflectance of Al mirrors protected with hot-deposited MgF2

9 pags., 6 figs., 1 tab. -- Event: SPIE Optical Systems Design, 2018, Frankfurt, GermanyMirrors based on Al protected with a MgF2 film provide high reflectance over a broad spectral range down to the wavelength of 120 nm in the Far UV (FUV). After more than 50 years since the development of this technology, a significant FUV reflectance enhancement has been obtained in the last years. Such enhancement originates mostly in the higher transparency of the MgF2 protective layer deposited on a hot Al-coated substrate. Research has been conducted at GOLD to measure the dependence of the FUV reflectance enhancement with MgF2 deposition temperature. A reflectance enhancement was found for freshly-prepared samples; moreover, the reflectance degradation over time of Al films protected with hot-deposited MgF2 was also smaller than for the coatings deposited at room temperature. A reflectance as high as 90% was measured at 121.6 nm (hydrogen Lyman ¿ line) for aged samples. A FUV reflectance enhancement was also obtained on samples fully deposited at room temperature and later annealed in vacuum. The reflectance of Al mirrors as a function of MgF2 deposition temperature, as well as of post-deposition annealed mirrors, and their stability over time is presented. Structural data on film roughness, density, and main crystal orientations for mirrors with a MgF2 film deposited both at room temperature and at 250°C are also presented.This work was supported by the National Programme for Research, Subdirección General de Proyectos de Investigación, Ministerio de Ciencia e Innovación, grants AYA2013-42590-P and ESP2016-76591-P.Peer Reviewe