Ion beam processing of SiC for optical application

By means of McV oxygen ion implantation at elevated temperatures into 6H-SiC and subsequent thermal annealing buried SiC-SiO, layers with refractive indices reduced towards the value of SiO2 were formed. These layers act as optical barriers for the overlying weakly damaged SiC layers which, according to m-line spectroscopy measurements, show multimode waveguiding at the wavelength 633 nm. Focused Ga ion beams were used for maskless patterning of SiC either by amorphization followed by wet chemical etching or by physical sputtering. A combination of large area oxygen ion implantation with focused ion beam patterning offers a promising way to produce strip waveguides in SiC

Inorganic-organic hybrid polymers for information-technology from planar technology to 3-D nanostructures for application in photonic devices

Inorganic-organic hybrid polymers which are suitable for optical applications, were synthesized by hydrolysis/polycondensation reactions. The material can be processed by conventional photolithography as well as by two-photon processes using femtosecond laser pulses. The material will be briefly described and examples for 2- and 3-D lithography will be given, with particular emphasis on optical applications

Inorganic-organic hybrid materials for application in optical devices

Integrated passive and active optical devices are the key components in current and future data transfer technologies. In order to fulfill future requirements in miniaturization for diffractive, refractive and integrated optical devices, new materials with higher thermal stability and a better compatibility to processing techniques used in conventional semiconductor devices production are needed. Inorganic-organic hybrid polymers (ORMOCER((R))s) produced at fairly low costs with a high degree of reproducibility are now proven candidates. The materials can be functionalized such that their physical and chemical properties can be tailored towards, e.g. optical applications on wafer-scale such as waveguides, gratings or microoptical devices. The materials behave as a negative resist and can thus be patterned by UV exposure with good resolution. Besides, the materials are very well suited for thin and thick film packaging technology. We here particularly focus on materials for optical (telecom/microoptics) applications. The optical behavior is characterized and discussed with respect to the chemical functionalities. Additionally, some application examples of selected optical components are given, produced either by UV lithography or by replication technology.close10610