A Framework for the Application of Robust Design Methods and Tools

Robust Design Methods (RDM) have become a powerful concept to design more reliable products. However, even though there are many tools available and have been discussed widely in academia, there is still confusion and doubts in the industry about the use and effectiveness of these methods. Mostly the problems experienced in industry are related to a poor application or knowledge of the methods by the companies (Hasenkamp, et Al, 2007). Based on the authors� experiences in working in development engineering, it has shown that also the phase of application of the specific tools and methods and what those can deliver are not always clear. Expectations to the output are sometimes misleading and imply the incorrect utilization of tools. A categorization of tools, methods and techniques typically associated with robust design methodology in the literature is provided in this paper in terms of purpose and deliverables of the individual tool or method. The majority of tools aims for optimizing an existing design solution or give an indication of how robust a design is, which requires a somewhat settled design. Furthermore, the categorization presented in this paper shows a lack in the methodology for tools in the area of robustness prediction in early design. This categorization clarifies the underlying premises and deliverables of RDM tools for professionals working with design processes and can serve as guidance for an organization how to structure its development process and how to make most efficient use of the existing tools. When to apply, what tool or method, for which purpose can be concluded. The paper also contributes with a framework for researchers to derive a generic landscape or database for RDM build upon the main premises and deliverables of each method

The Translation between Functional Requirements and Design Parameters for Robust Design

AbstractThe specification of and justification for design parameter (DP) tolerances are primarily based on the acceptable variation of the functions’ performance and the functions’ sensitivity to the design parameters. However, why certain tolerances are needed is often not transparent, especially in complex products with multi-disciplinary development teams. In those cases, tolerance synthesis and analysis get complicated which introduces ambiguities and difficulties for system-integrators and lead engineers for the objective decision making in terms of trade-offs but also in terms of an efficient computer aided functional tolerancing. Non-optimal tolerances yield potentials for cost improvements in manufacturing and more consistency of the functional performance of the product. In this contribution a framework is proposed to overcome the observed problems and increase the clarity, transparency and traceability of tolerances by analyzing the translation between the DPs and their influence on the final function

Nanoparticle exposure at nanotechnology workplaces: A review

Risk, associated with nanomaterial use, is determined by exposure and hazard potential of these materials. Both topics cannot be evaluated absolutely independently. Realistic dose concentrations should be tested based on stringent exposure assessments for the corresponding nanomaterial taking into account also the environmental and product matrix. This review focuses on current available information from peer reviewed publications related to airborne nanomaterial exposure. Two approaches to derive realistic exposure values are differentiated and independently presented; those based on workplace measurements and the others based on simulations in laboratories. An assessment of the current available workplace measurement data using a matrix, which is related to nanomaterials and work processes, shows, that data are available on the likelihood of release and possible exposure. Laboratory studies are seen as an important complementary source of information on particle release processes and hence for possible exposure. In both cases, whether workplace measurements or laboratories studies, the issue of background particles is a major problem. From this review, major areas for future activities and focal points are identified

Mutant p53 proteins bind DNA in a DNA structure-selective mode

Despite the loss of sequence-specific DNA binding, mutant p53 (mutp53) proteins can induce or repress transcription of mutp53-specific target genes. To date, the molecular basis for transcriptional modulation by mutp53 is not understood, but increasing evidence points to the possibility that specific interactions of mutp53 with DNA play an important role. So far, the lack of a common denominator for mutp53 DNA binding, i.e. the existence of common sequence elements, has hampered further characterization of mutp53 DNA binding. Emanating from our previous discovery that DNA structure is an important determinant of wild-type p53 (wtp53) DNA binding, we analyzed the binding of various mutp53 proteins to oligonucleotides mimicking non-B DNA structures. Using various DNA-binding assays we show that mutp53 proteins bind selectively and with high affinity to non-B DNA. In contrast to sequence-specific and DNA structure-dependent binding of wtp53, mutp53 DNA binding to non-B DNA is solely dependent on the stereo-specific configuration of the DNA, and not on DNA sequence. We propose that DNA structure-selective binding of mutp53 proteins is the basis for the well-documented interaction of mutp53 with MAR elements and for transcriptional activities mediates by mutp53

The Variation Management Framework (VMF) for Robust Design

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Growth of Nanocrystalline MoSe2 Monolayers on Epitaxial Graphene from Amorphous Precursors

A new approach to the growth of MoSe2 thin films on epitaxial graphene on SiC(0001) by the use of modulated elemental reactants (MER) precursors has been reported. The synthesis applies a two-step process, where first an amorphous precursor is deposited on the substrate which self-assembles upon annealing. Films with a nominal thickness of about 1ML are successfully grown on epitaxial graphene monolayer as well as buffer layer samples. Characterization of the films is performed using XPS, LEED, AFM, and Raman spectroscopy. The films are nanocrystalline and show randomly rotated domains. This approach opens up an avenue to synthesize a number of new van-der-Waals systems on epitaxial graphene and other substrates