6 research outputs found
Electronic temperatures, densities and plasma X-ray emission of a 14.5 GHz Electron-Cyclotron Resonance Ion Source
We have performed a systematic study of the Bremsstrahlung emission from the
electrons in the plasma of a commercial 14.5 GHz Electron-Cyclotron Resonance
Ion Source. The electronic spectral temperature and the product of ionic and
electronic densities of the plasma are measured by analyzing the Bremsstrahlung
spectra recorded for several rare gases (Ar, Kr, Xe) as a function of the
injected power. Within our uncertainty, we find an average temperature of ? 48
keV above 100W, with a weak dependency on the injected power and gas
composition. Charge state distributions of extracted ion beams have been
determined as well, providing a way to disentangle the ionic density from the
electronic density. Moreover X-ray emission from highly charged argon ions in
the plasma has been observed with a high-resolution mosaic crystal
spectrometer, demonstrating the feasibility for high-precision measurements of
transition energies of highly charged ions, in particular of the magnetic
dipole (M1) transition of He-like of argon ions
Contribution of ion emission to sputtering of uranium dioxide by highly charged ions
Measurements of the cluster size (n) distribution of secondary
(UO ions from sputtering of uranium dioxide (UO by
Ne8+, Ar8+ and Xe ions (q=10, 23) at fixed kinetic energy
(81 keV) have been performed with a time-of-flight mass spectrometer. The
cluster ion yields Y follow a power law with
. This is in contrast to a statistical recombination
of the constituents upon ejection, but in agreement with the predictions of
collective ejection models. Such a power law was also observed in the
electronic stopping regime with MeV/u ions. The exponent is found
to decrease with increasing projectile mass (and thus total sputter yield)
at fixed kinetic energy. The ratio of emitted ionic clusters to monomers
varies from 3 to 4.5 depending on the projectile. The contribution of
positive ions to the total sputtering yield amounts to about 0.03%