Benchmark of Rigorous Methods for Electromagnetic Field Simulations

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO. With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.Comment: 12 pages, SPIE / BACUS conference Photomask Technology (2008

Relationship Bonds and Customer Loyalty: A Study Across Different Service Contexts

The benefits of customer relationship strategies are well known and somewhat established nowadays. Customer loyalty emerges as the crucial glue in developing a relational approach. However, relational bonds, which relate to customer loyalty, have not yet been fully explored. Also, there is little research that takes into account the effect of service types on customer relationships and bonding. This paper develops a conceptual framework based on previous literature with a complete set of different relational bonds and examines its influence on customer loyalty across search, experience and credence services through a survey-based empirical study, with a sample of 233 consumers. The results provide guidance to managers to differentiate customer relationship strategies according to each specific service context

Corporate identity at the stakeholder group level

There is a paucity of literature regarding the construction and operation of corporate identity at the stakeholder group level. This article examines corporate identity from the perspective of an individual stakeholder group, namely, front-line employees. A stakeholder group that is central to the development of an organization’s corporate identity as it spans an organization’s boundaries, frequently interacts with both internal and external stakeholders, and influences a firm’s financial performance by building customer loyalty and satisfaction. The article reviews the corporate identity, branding, services and social identity literatures to address how corporate identity manifests within the front-line employee stakeholder group, identifying what components comprise front-line employee corporate identity and assessing what contribution front-line employees make to constructing a strong and enduring corporate identity for an organization. In reviewing the literature the article develops propositions that, in conjunction with a conceptual model, constitute the generation of theory that is recommended for empirical testing

Revisiting the influence of institutional forces on the written business plan:A replication study

The present paper re-analyzes and extends a study on institutional forces and the written business plan (Honig and Karlsson in J Manag 30(1):29–48, 2004). We attempt to examine to what extent critical decision making is evident in model and variable choice, and whether the implications provided by systematic replication efforts may serve to provide additional and perhaps unrecognized theoretical and/or empirical observations. We find that the key result—formal business planning does not affect performance, does not hold. In fact, we find evidence that formal business planning affects survival but not profitability. The re-analysis also reveals, that institutional antecedents to formal planning appear to be fragile and prone to researcher biases due to different coding and assumptions. Our study underscores the consequences of access to original data and coding material, and to rely upon current methodological explanations for subsequent analyses

The effect of low temperature and low light intensity on nutrient removal from municipal wastewater by purple phototrophic bacteria (PPB)

There has been increased interest in alternative wastewater treatment systems to improve nutrient recovery while achieving acceptable TCOD, TN, and TP discharge limits. Purple phototrophic bacteria (PPB) have a high potential for simultaneous nutrient removal and recovery from wastewater. This study evaluated the PPB performance and its growth at different operating conditions with a focus on HRT and light optimization using a continuous-flow membrane photobioreactor (PHB). Furthermore, the effect of low temperature on PPB performance was assessed to evaluate the PPB’s application in cold-climate regions. In order to evaluate PPB performance, TCOD, TN, and TP removal efficiencies and Monod kinetic parameters were analyzed at different HRTs (36, 18, and 9 h), at temperatures of 22°C and 11°C and infrared (IR) light intensities of 50, 3, and 1.4 Wm-2. The results indicated that low temperature had no detrimental impact on PPB’s performance. The photobioreactor (PHB) with cold-enriched PPB has a high potential to treat municipal wastewater with effluent concentrations below target limits (TCOD˂ 50mgL-1, TN˂10 mgL-1, and TP˂1 mgL-1). Monod kinetic parameters Ks, K, Y, and Kd were estimated at 20-29 mgCODL-1, 1.6-1.9 mgCOD(mgVSS.d)-1, 0.47 mgVSS mgCOD-1, and 0.07-0.08 d-1 at temperatures of 11°C-22°C respectively. The results of the steady-state mass balances showed TCOD, TN, and TP recoveries of 80%-86%, which reflected PPB’s substrate and nutrient assimilation. Previous studies utilized high light intensities (˃ 50 Wm-2) to provide PPB with the maximum energy required for its growth. In order to enable the PPB technology as a practical approach in municipal wastewater treatment, light intensity must be optimized. Based on the literature, there is no study on PPB performance at low light intensities using a continuous-flow membrane photobioreactor. The effect of low light intensities of 3, and 1.4 Wm-2 on PPB performance was addressed in this study. The results indicated that PPB at a light intensity as low as 1.4 Wm-2 were able to treat municipal wastewater with effluent concentrations below above-mentioned target limits. Light intensity (1-50 Wm-2) had no detrimental impact on PPB performance and Monod kinetic parameters. This study showed that the optimized light intensity required for municipal wastewater treatment with PPB is significantly lower than previously indicated in the literature. The energy consumptions attributed to PHB’s illumination of 3, and 1.4 Wm-2 were determined to be 1.44, and 0.67 kWh/m3 which is significantly lower than previous studies (˃ 24 kWh/m3)

Three dimensional EUV simulations: a new mask near field and imaging simulation system

The integrated European research project "More Moore" is designed to push the limits of lithography to enable and exceed the requirements for the 22 nm node. Within the project the lithography group of Fraunhofer IISB is responsible for the development and evaluation of different simulation approaches for a predictive modeling of EUV (extreme ultraviolet) imaging technology for sub 22 nm features. During the first project year two new three dimensional EUV mask simulation models and a new EUV imaging model were developed. For the three dimensional mask near field simulation the modal method by Fourier expansion, developed by the project partner from Centre National de la Recherche Scientifique (CNRS) France, and the waveguide method (WG), developed by Fraunhofer IISB, are available. Both methods are rigorous electromagnetic field solver operating in the frequency domain. A good agreement with the established finite-difference time-domain (FDTD) method and a significantly higher performance compared to FDTD in case of periodic mask structures with rectangular elements can be observed. Additionally the WG method is able to simulate rigorously EUV masks with defective multilayers and with a full consideration of the defect geometry. The imaging model is characterized by a Jones pupil based representation of the imaging system and by a completely vectorial description of the light propagation, taking into account important polarization dependent effects like source polarization effects, mask topography polarization effects and effects resulting from light propagation in multilayer systems. This paper will present the new three dimensional WG method for the EUV mask near field simulation in combination with the vectorial imaging system and in comparison to our FDTD reference method. Typical 2D and 3D mask structures and new EUV mask concepts like phase shift masks with etched multilayers in combination with defect free and defective multilayers stacks are simulated exemplarily. Additionally aerial images and image CDs resulting from the two different simulation approaches (WG and FDTD) are compared as well as the mask near fields, the computation time, and the convergence

Fast near field simulation of optical and EUV masks using the waveguide method

A new and optimized waveguide based electromagnetic field solver for optical and EUV mask simulations is presented. After an introduction of the waveguide method, the convergence and speed optimization and the adaptation of the method to optical and EUV lithography mask simulations are presented. Additionally a model for the simulation of EUV multilayer defects and an optimized decomposition technique for three dimensional waveguide simulations enabling very fast computations as well as large mask area simulations is presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated exemplarily based on state-of-the-art optical and EUV masks