Methods of tailoring the deposition of metals using self-assembled monolayers

In some aspects, the present disclosure provides methods of depositing a metal onto a nanomaterial which has been passivized with a self-assembled monolayer at a weakened point in the topography of the nanomaterial. In some embodiments, the weakened point is caused by the curvature of the topography. This method may be used to prepare electronic devices such as memory modules.Board of Regents, University of Texas Syste

Mononuclear and multinuclear phosphido, arsenido, and stibido complexes of aluminum, gallium and indium

" The present invention involves chemical compounds particularly useful for the preparation of thin films or layers of group 3/group 5 materials by MOCVD and other techniques. Such compounds may be represented as having the formulas [M(ER'R"").sub.3 ].sub.n or [RM(ER'R"").sub.2 ].sub.n or [R.sub.2 M(ER'R"")].sub.n wherein M is aluminum, gallium or indium; E is phosphorus, arsenic or antimony; R, R', and R"" are one or more of hydrogen, alkyl, aryl, alkyl-substituted aryl, cyclic alkyl, halide or other anionic group; and n is between about 1 and about 6. "Board of Regents, University of Texas Syste

Method of creating a dispersion of a liquid on a substrate

The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.Board of Regents, University of Texas Syste

Final Report: Catalytic Hydrocarbon Reactions over Supported Metal Oxides, August 1, 1995 - July 31, 1999

The research program focused on the catalysis of hydrodesulfurization (HDS) over molybdenum-based catalysts and how catalyst composition, redox ability, structure and neighboring sites control the catalytic properties of metal oxides. We sought to understand the catalytic features/sites that control hydrogenation, hydrogenolysis, and isomerization during HDS. Unprompted silica-supported molybdenum oxides and molybdenum sulfides were studied. Model catalyst systems were prepared from organometallic precursors or cluster compounds to generate supported structures that feature Mo(II) and Mo(IV) cations that are isolated or in ensembles and that have either Mo-O or Mo-S bonds. Conventional MOS{sub 2} catalysts, which contain both edge and rim sites, were be studied. Finally, single-layer MOS{sub 2} structures were also prepared from 2H-MoS{sub 2} powder so that the model systems could be compared against a disulfide catalyst that only involves rim sites. Catalytic reactions for thiophene and tetrahydrothione were studied over the various catalysts. Oxidation states were determined using X-ray photoelectron spectroscopy. X-ray crystallography was used to characterize and follow changes in the MOS{sub 2} structures. The program on metal oxides prepared supported oxides that have a specific structure and oxidation state to serve as model templates for the more complex commercial catalysts and then employed these structures in reaction studies. This focus area examined the relationships between structure and cation redox characteristics in oxidation catalysis. Infrared and Raman spectroscopy were used to characterize the cations and reaction intermediates

Growth of Ultra-thin Ruthenium and Ruthenium Alloy Films for Copper Barriers

We report approaches to grow ultrathin Ru films for application as a seed layer and Cu diffusion barrier. For chemical vapor deposition (CVD) with Ru3(CO)12 we show the role surface hydroxyl groups have in nucleating the Ru islands that grow into a continuous film in a Volmer-Weber process, and how the nucleation density can be increased by applying a CO or NH3 overpressure. Thinner continuous films evolve in the presence of a CO overpressure. We report an optimun ammonia overpressure for Ru nucleation and that leads to deposition of smoother Ru thin films. Finally, we report a comparison of amorphous Ru films that are alloyed with P or B and demonstrate 3-nm thick amorphous Ru(B) films function as a Cu diffusion barrier