Fabrication Of Smooth Diamond Films On Sio2 By The Addition Of Nitrogen To The Gas Feed In Hot-filament Chemical Vapor Deposition

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Impact of Penny Brohn UK’s Living Well course on informal caregivers of people with cancer

Objectives: This study evaluated the change in the concerns, wellbeing and lifestyle behaviours of informal caregivers of people with cancer attending Penny Brohn UK’s Living Well Course (LWC), a self-management education intervention. Design: A pre-post-course design collected self-reported quantitative and qualitative data from informal caregivers attending a LWC. Setting/Location: Penny Brohn UK is a UK based charity (not-for-profit) providing specialist integrative, whole person support, free of charge, to people affected by cancer. Subjects: Informal caregivers taking part in a Penny Brohn UK LWC between June 2014 and May 2016 attending alongside the person with cancer. Intervention: The LWC is a structured 15 hour, multi-modal group self-management educational course, designed to help people affected by cancer learn tools and techniques to help build resilience. Trained facilitators deliver LWCs to around 12 people with various types and stages of cancer, and their informal caregivers. Outcome measures: MYCaW (Measure Yourself Concern and Wellbeing) completed pre-course and at 6 weeks post-course; and bespoke 6 week follow up Patient Reported Experience Measure (PREM). Results: 480 informal caregivers attended a LWC June 2014 to May 2016. 118 completed a 6 week follow up MYCaW: MYCaW Concerns 1 and 2 showed statistically significant improvements (p<.0001), there was no significant improvement in wellbeing. Informal caregivers’ most reported concerns relating to themselves were psychological and emotional issues (59%). The primary concern of the caregiver for the care recipient was related to the physical health of the person with cancer (40%). 87% of responding informal caregivers stated the LWC enabled health self-management. Conclusions: The LWC was followed by an improvement in informal caregivers’ concerns, and increased self-management of their own health needs. More studies, with larger sample size, are needed to explore if better self-management by informal caregivers may also lead to improvements in patients’ health and wellbeing

The PHENIX Experiment at RHIC

The physics emphases of the PHENIX collaboration and the design and current status of the PHENIX detector are discussed. The plan of the collaboration for making the most effective use of the available luminosity in the first years of RHIC operation is also presented.Comment: 5 pages, 1 figure. Further details of the PHENIX physics program available at http://www.rhic.bnl.gov/phenix

Laser Ablation Inductively Coupled Plasma Mass Spectrometry: Achievements, Problems, Prospects

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Electron Emission Enhanced Chemical Vapor Deposition (eeecvd) For The Fabrication Of Diverse Silicon-containing Films

Amorphous films (a-C:H:Si and a-C:H:Si:O) were grown in a vacuum chamber containing a hot filament on substrates held on a copper plate to which a bias voltage could be applied. This modified hot-filament chemical vapor deposition process was used to fabricate various types of amorphous thin film from mixtures of tetramethylsilane (TMS) or hexamethyldisiloxane (HMDSO) diluted in argon or argon/nitrogen mixtures. Electrical characteristics of the process, deposition rates, and film structures were investigated as a function of the deposition parameters, particularly the proportion of nitrogen in the chamber feed. For film characterization, transmission infrared spectroscopy (IRS) was employed. Without a significant substrate current, deposition rates were negligible. Thus, electron impact fragmentation of the monomer molecules is a key process in film deposition using this technique. The method shows promise and versatility for the fabrication of a wide range of amorphous films, including, for example, a-C:H and a-C:H:O. © 2001 Elsevier Science B.V. All rights reserved.398-399591596Yasuda, H., (1985) Plasma Polymerization, , Academic Press, OrlandoBrennan, G., Dunllop, D., (1992) Plasma Deposition, Treatment, and Etching of Polymers, , R. d.'Agostino (Ed.), Academic Press, BostonMota, R.P., Shiosawa, T., Durrant, S.F., Bica de Moraes, M.A., (1995) J. Vac. Sci. Technol. A, 13, p. 2747Chen, Y., Wang, E.G., Chen, F., (1996) Mod. Phys. Lett. B, 10, p. 567Durrant, S.F., Castro, S.G., Cisneros, J.I., Da Cruz, N.C., Bica de Moraes, M.A., (1994) J. Vac. Sci. Technol. A, 14, p. 118Durrant, S.F., Mota, R.P., Bica de Moraes, M.A., (1992) J. Appl. Phys, 71, p. 448Baranauskas, V., Tosin, M.C., Peterlevitz, A.C., Ceragioli, H.J., Durrant, S.F., (2000) Mater. Sci. & Eng. B, 69-70, p. 171Liu, Y., Cohen, M.L., (1989) Sci., 245, p. 841Loboda, M.J., Seifferly, J.A., Dall, F.C., (1994) J. Vac. Sci. Technol. A, 12, p. 90Aumaille, K., Vallee, C., Granier, A., Goullet, A., Gaboriau, F., Turban, G., (2000) Thin Solid Films, 359, p. 188Theil, J.A., Brace, J.G., Knoll, R.W., (1994) J. Vac. Sci. Technol. A, 12, p. 1365Zhang, Z.Y., Zhao, W., Wang, X.W., Lei, T.M., Chen, Z.M., Zhou, S.X., (2000) Mater. Sci. Eng. B - Solid State Mater. Adv. Technol., 75, p. 177Zhou, X.T., Wang, N., Au, F.C.K., Lai, H.L., Peng, H.Y., Bello, I., Lee, C.S., Lee, S.T., (2000) Mater. Sci. Technol. A - Structural Mater. Properties Microstructure and Processing, 286, p. 119Chapman, B., (1980) Glow Discharge Processes: Sputtering and Plasma Etching, p. 106. , Wiley, N.YWang, J., De Moraes, M.A.B., Landers, R., Trasferetti, B.C., Plasmas and Polymers, , submittedDa Cruz, N.C., Durrant, S.F., Bica de Moraes, M.A., (1998) J. Polym. Sci. B, Polym. Phys., 36, p. 1873Baranauskas, V., Li, B.B., Peterlevitz, A., Tosin, M.C., Durrant, S.F., (1999) J. Appl. Phys., 85, p. 7455Cai, S., Fang, J., Yu, X., (1992) J. Appl. Polym. Sci., 44, p. 13

Fluorinated Polymer Films From R.f. Plasmas Containing Benzene And Sulfur Hexafluorine

Mixtures of C6H6 and SF6 were polymerized in an r.f. discharge. Actinometry (quantitative optical emission spectroscopy) was used to determine trends in the plasma concentrations of the species F, H and CH as a function of the proportion of SF6 in the feed. Infrared spectroscopy and electron spectroscopy for chemical analysis were employed to characterize the deposited material. Increasing proportions of SF6 in the feed produced increased fragmentation of the benzene molecules and greater fluorination of the deposited material. The deposition rate, as determined by optical interferometry, was found to be enhanced about 4 times by the presence of 10-20% SF6 in the feed. At 50% SF6 in the feed, deposition rates were greater than in pure C6H6 plasmas despite the (probably large) etching effect of atomic fluorine from the discharge. Relationships between the plasma composition, electron density and temperature, film composition and growth rate are discussed. © 1992.2201-2295302Yasuda, (1985) Plasma Polymerization, , Academic Press, New YorkCoburn, Winters, (1979) J. Vac. Sci. Technol., 16, p. 391Bruno, Capezzuto, Cicala, rf glow discharge of SiF4-H2 mixtures: Diagnostics and modeling of the a-Si plasma deposition process (1991) Journal of Applied Physics, 69, p. 7259d'Agostino, Cramarossa, Illuzzi, (1987) J. Appl. Phys., 61, p. 2754Clark, Abraham, (1982) J. Polym. Sci., Polym. Chem. Ed., 20, p. 1717d'Agostino, Cramarossa, Caloprico, d'Ettole, (1983) J. Appl. Phys., 54, p. 1284Strobel, Corn, Lyon, Korba, (1987) J. Polym. Sci., Part A: Polym. Chem., 25, p. 1295Durrant, Mota, de Moraes, (1992) J. Appl. Phys., 71, p. 448Coburn, Chen, (1980) J. Appl. Phys., 51, p. 3134Gottscho, Miller, Optical techniques in plasma diagnostics (1984) Pure and Applied Chemistry, 56, p. 189d'Agostino, Martinu, Pische, (1991) Plasma Chem. Plasma Process., 11, p. 1Scofield, (1976) J. Electron Spec. Rel. Phenom., 8, p. 129Wagner, Riggs, Davis, Moulder, Muilenberg, (1979) Handbook of Photoelectron Spectroscopy, p. 21. , 2nd edn., Perkin-Elmer, Eden Prairie, MNd'Agostino, Cramarossa, de Benedictis, Fracassi, Laska, Masek, (1985) Plasma Chem. Plasma Process., 5, p. 239Ryan, Plumb, (1990) Plasma Chem. Plasma Process., 10, p. 207d'Agostino, Flamm, (1981) J. Appl. Phys., 52, p. 162Morosoff, Crist, Bumgarner, Hsu, Yasuda, Free Radicals Resulting from Plasma Polymerization and Plasma Treatment (1976) Journal of Macromolecular Science: Part A - Chemistry, 10, p. 451Yasuda, Bumgarner, Marsh, Morosoff, (1976) J. Polym. Sci., Polym. Chem. Ed., 14, p. 195Wagner, Riggs, Davis, Moulder, Muilenberg, (1979) Handbook of Photoelectron Spectroscopy, p. 21. , 2nd edn., Perkin-Elmer, Eden Prairie, MNd'Agostino, Cramarossa, Fracassi, Desimoni, Sabbatini, Zambonin, Caporiccio, (1986) Thin Solid Films, 143, p. 163Buzzard, Soong, Bell, Plasma polymerization of tetrafluoroethylene in a field-free zone (1982) Journal of Applied Polymer Science, 27, p. 3965Strobel, Thomas, Lyons, (1987) J. Polym. Sci., Part A: Polym. Chem., 25, p. 3343Loh, Klausner, Baddour, Cohen, (1987) Polym. Eng. Sci., 27, p. 861d'Agostino, Cramarossa, de Benedictis, (1982) Plasma Chem. Plasma Process., 2, p. 21

Characterization Of Pecvd A-c:h:si:o:cl Films

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Thin films were produced by plasma enhanced chemical vapor deposition of tetramethylsilane, chloroform, and argon mixtures. The partial pressure of chloroform in the chamber feed, CCl, was varied from 0% to 40%. Amorphous hydrogenated carbon films also containing silicon, oxygen, and small amounts of chlorine, a-C:H:Si:O:Cl, were produced at deposition rates of up to about 220 nm min−1 (for a CCl of 40%). Transmission infrared analyses revealed the presence of OH groups in chlorinated films, along with, among others, CH, C=C, Si-CH, Si-CH2, and Si-O-Si groups. As revealed by energy dispersive x-ray spectroscopy, the films could be doped with chlorine to a maximum of about 3 at. %. Surface morphology and roughness were examined using scanning electron microscopy and atomic force microscopy. Tauc band gaps, calculated from transmission ultraviolet-visible near infrared spectra, tend to decrease from ∼3.4 eV for unchlorinated films to around 2.5 eV for those doped with chlorine. © 2017 American Vacuum Society.354CNPq, Conselho Nacional de Desenvolvimento Científico e TecnológicoConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq

Effects of cold SF6 plasma treatment on a-C:H, polypropylene and polystyrene

The effects of cold SF6 plasma treatment on amorphous hydrogenated carbon (FA), polypropylene (PP) and polystyrene (PS) were investigated as functions of gas pressure and applied power. An anticipated increase in hydrophobicity was confirmed by the greater water contact angles, θ, observed after all the treatments. Under the best conditions θ was increased by 50.8°, 57.2° and 21°, respectively. A rise and fall in θ was observed as the pressure of SF6 was increased, this trend being most consistent for FA. Although the plasma treatments caused some changes in surface roughness, measured using profilometry, there were no clear correlations between this parameter and θ. As revealed by Energy Dispersive X-ray Spectroscopy (EDS) and X-ray Photoelectron Spectroscopy (XPS), the treated surfaces were fluorinated. As the degree of fluorination under optimal conditions was 2.2 at.%, 10.4 at.% and 36.3 at.% for the FA, PP and PS, respectively, this factor was not alone responsible for the observed increases in θ. Sulfur was attached to the surface of all the treated samples. The relative surface carbon content was reduced by the treatments. The main causes of the changes in θ upon treatment were the induced compositional and structural changes. Ageing for ten days caused a typical decrease in θ of ~10°, probably caused by rotation of hydrophobic surface groups into the surface385CONSELHO NACIONAL DE DESENVOLVIMENTO CIENTÍFICO E TECNOLÓGICO - CNPQCOORDENAÇÃO DE APERFEIÇOAMENTO DE PESSOAL DE NÍVEL SUPERIOR - CAPESFUNDAÇÃO DE AMPARO À PESQUISA DO ESTADO DE SÃO PAULO - FAPESPsem informaçãosem informação2017/15853-

Growth Of Glassy Carbon On Natural Fibers

Diamond-like carbon films were grown on pyrolised bamboo substrates by hot filament-chemical vapor deposition from ethanol/hydrogen mixtures. Different stages of deposition of films grown on untreated substrates and substrates seeded with diamond dust were compared. Changes in film morphology and structure under changes in these parameters were investigated using scanning electron microscopy and Raman spectroscopy. Diamond-like carbon (DLC) with ball-like morphology on the micrometer scale and glassy DLC with a stacked planar structure were observed for depositions of > 2 h on unseeded and seeded substrates, respectively. Gasification of the fibers by hydrogen in the early stages of growth may play a role in film growth, but this requires further study. Nevertheless, DLC films can be grown on pyrolised bamboo substrates, which suggests that other carbonaceous substrates for film fabrication by hot-filament chemical vapor deposition also merit systematic investigation. © 2002 Elsevier Science B.V. All rights reserved.3041-3271277Kojima, A., Matsumoto, H., Kamiishi, Y., Sato, M., Otani, S., (2000) Sen-I Gakkaishi, 56 (2), p. 574Bessette, R.R., Medeiros, M.G., Patrissi, C.J., Deschenes, C.M., LaFrata, C.N., (2001) J. Power Sources, 96 (1), p. 240Sea, B.K., Choo, S.Y., Lee, T.J., Morooka, S., Song, S.K., (1995) Kor. J. Chem. Eng., 12 (4), p. 416Edie, D.D., (1998) Carbon, 36 (4), p. 345Takida, T., Inoue, K., Kimura, H., Kiyota, H., Saito, I., Kurusu, T., Iida, M., (2000) New Diamond Frontier Carbon Res., 10 (1), p. 50Wang, Y.Q., Zhou, B.L., Wang, Z.M., (1995) Carbon, 33 (4), p. 427Peherson, P.E., Glesener, J., Morrish, A., (1992) Thin Solid Films, 212 (1-2), p. 81Nakamura, Y., Tamaki, K., Watanabe, Y., Hirayama, S., (1994) J. Mater. Res., 9 (7), p. 1619Gruen, D.M., (1999) Annu. Rev. Mater. Sci., 29, p. 211Corat, E.J., Trava-Airoldi, V.J., Baranauskas, V., (1998) Key Eng. Mat., 138 (1), p. 195Baranauskas, V., Tosin, M.C., Peterlevitz, A.C., Ceragioli, H.J., Durrant, S.F., (2000) J. Appl. Phys., 88 (3), p. 1650Barros, R.C.M., Corat, E.J., Ferreira, N.G., Souza, T.M., Trava-Airoldi, V.J., Leite, N.F., Iha, K., (1996) Diam. Rel. Mater., 5, p. 1323Baranauskas, V., Peterlevitz, A.C., Ceragioli, H.J., Durrant, S.F., (2001) J. Vac. Sci. Tech. A, 19 (4), p. 1057Thareja, R.K., Dwivedi, R.K., Abhilasha, (1997) Phys. Rev. B, 55 (4), p. 2600Nemanich, R.J., Solin, S.A., (1979) Phys. Rev. B, 20, p. 392Yoshikawa, M., Katagiri, G., Ishida, H., Ishitani, A., Ono, M., Matsumura, K., (1989) Appl. Phys. Lett., 55, p. 2608Ferrari, A.C., Robertson, J., (2001) Phys. Rev. B, 63, p. 63Shroder, R.E., Nemanich, R.J., Glass, J.T., (1990) Phys. Rev. B, 41, p. 3738Okada, K., Kanda, H., Komatsu, S., Matsumoto, S., (2000) J. Appl. Phys, 88, p. 1674Suzuki, T., Yagi, M., Shibuki, K., Hasemi, M., (1994) Appl. Phys. Lett., 65 (5), p. 540Li, Z.D., Wang, L., Suzuki, T., Argoitia, A., Pirouz, P., Angus, J.C., (1993) J. Appl. Phys., 73 (2), p. 715Lambrecht, W.R.L., Lee, C.H., Segall, B., Angus, J.C., Li, Z.D., Sunkara, M., (1993) Nature, 364 (6438), p. 60

Effects Of Helium Ion Irradiation On Fluorinated Plasma Polymers

The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C2H2-SF6, C6H6-SF6 or C6F6 produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65dyn cm-1 range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically ~5%). The films produced from SF6-containing plasmas also contain S. For irradiation times of 80min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. © 2010 Elsevier B.V.20418-1930593063Inagaki, N., Tasaka, S., Imai, M., (1993) J. Appl. Polym. Sci., 48, p. 1963Inagaki, N., Tasaka, S., Suzuki, Y., (1994) J. Appl. Polym. Sci., 51, p. 2131Csernica, J., Rhodes, D.B., (1999) J. Polym. Eng., 19, p. 1Durrant, S.F., Mota, R.P., de Moraes, M.A.B., (1992) J. Appl. Phys., 71, p. 448Silverstein, M.S., Chen, R., Kesler, O., (1996) Polym. Eng. Sci., 36, p. 2542Durrant, S.F., Mota, R.P., de Moraes, M.A.B., (1992) Thin Solid Films, 220, p. 295D'Agostino, R., Cramarossa, F., Caloprico, V., d'Ettole, R., (1983) J. Appl. Phys., 54, p. 1284d'Agostino, R., Cramarossa, F., Iluzzi, F., (1987) J. Appl. Phys., 61, p. 2754Mogab, C.J., Adams, A.C., Flamm, D.L., (1978) J. Appl. Phys., 49, p. 3796Lopes, B.B., Davanzo, C.U., Schreiner, W., Durrant, S.F., (2008) Surf. Coat. Technol., 203, p. 526d'Agostino, R., Cramarossa, F., Fracassi, F., Desimoni, E., Sabbatini, L., Zamboni, R.G., Caporiccio, G., (1986) Thin Solid Films, 143, p. 163Rubio-Roy, M., Bertran, E., Pascual, E., Polo, M.C., Andujar, J.L., (2008) Diamond Relat. Mater., 17, p. 1728Schvarzman, M., Mathur, A., Hone, J., Jahnes, C., Wind, S.J., (2008) Appl. Phys. Lett., 93, p. 153105Guerrouani, N., Baldo, A., Maarouf, T., Belu, A.M., Kassis, C.M., Mas, A., (2007) J. Fluorine Chem., 18, p. 925Torrisi, L., Percolla, R., (1996) Nucl. Instrum. Methods B, 117, p. 387da Cruz, N.C., Lopes, B.B., Rangel, E.C., Bica de Moraes, M.A., Durrant, S.F., (2008) Surf. Coat. Technol., 203, p. 534da Cruz, N.C., Rangel, E.C., Tabacknics, M.H., Trasferetti, B.C., Davanzo, C.U., (2001) Nucl. Instrum. Methods Phys. Res., 175, p. 721Gelamo, R.V., Landers, R., Rouxinol, F.P.M., Trasferetti, B.C., Bica de Moraes, M.A., Davanzo, C.U., Durrant, S.F., (2007) Plasma Process. Polym., 4, p. 482Gelamo, R.V., Durrant, S.F., Trasferetti, B.C., Davanzo, C.U., Rouxinol, F.P.M., Bica de Moraes, M.A., (2007) Plasma Process. Polym., 4, p. 489Bellamy, L.J., (1975) The Infrared Spectra of Complex Molecules, 1. , Chapman and Hall, LondonBuijnsters, J.G., Gago, R., Jiménez, I., Camero, M., Agulló-Rueda, F., Gómez-Aleixandre, C., (2009) J. Appl. Phys., 105, p. 093510Ghimire, D.C., Adhikari, S., Aryal, H.R., Kalita, G., Umeno, M., (2009) Diamond Relat. Mater., 18, p. 465Yao, Z.Q., Yang, P., Huang, N., Sun, H., Wang, J., (2004) Surf. Coat. Technol., 186, p. 131Hakovirta, M., Lee, D.H., He, X.M., Nastasi, M., (2001) J. Vac. Sci. Technol. A, 19, p. 782Yasuda, H., Bumgarner, M.O., Marsh, H.C., Morosoff, N., (1976) J. Polym. Sci., Polym. Chem. Ed., 14, p. 195Nelea, V., Holvoet, S., Turgeon, S., Mantovani, D., (2009) J. Appl. Phys. D, 42, p. 22520