3 research outputs found
The Growth of CdTe Layer on GaAs Substrate by MBE
We present the results of growth of CdTe layer on (013)GaAs substrate. The sequence processes include the preparation of GaAs surface by chemical etching and annealing in ultra-high vacuum, the growth of ZnTe layer on atomically clean GaAs surface and then the growth of CdTe layer on ZnTe/GaAs. All processes were carried out without removing GaAs substrate from MBE set. The processes were controlled by RHEED and single wavelength ellipsometry. We found that the evaporation of arsenic oxides and gallium oxides from the (001)GaAs surface were observed at over 400 and 500°C, respectively. The growth of CdTe on (001)GaAs leads to appearance of mixture orientations because of large mismatch of lattice parameters. We study the growth of ZnTe on (001)GaAs and (013)GaAs substrates to prevent the growth of mixture orientations. We study the influence of cadmium and tellurium ratio in molecular fluxes and temperature on the growth mechanism of ZnTe and CdTe, crystal perfection, surface roughness and defects density. The optimal condition for growth of high quality thick CdTe on GaAs substrate were found
HgCdTe quantum wells grown by molecular beam epitaxy
CdxHg₁₋xTe-based (x = 0 – 0.25) quantum wells (QWs) of 8 – 22 nm in
thickness were grown on (013) CdTe/ZnTe/GaAs substrates by molecular beam epitaxy.
The composition and thickness (d) of wide-gap layers (spacers) were x ∼ 0.7 mol.frac.
and d ∼ 35 nm, respectively, at both sides of the quantum well. The thickness and
composition of epilayers during the growth were controlled by ellipsometry in situ. It
was shown that the accuracy of thickness and composition were ∆x = ± 0.002, ∆d =
± 0.5 nm. The central part of spacers (10 nm thick) was doped by indium up to a carrier
concentration of ∼10¹⁵ cm⁻³
. A CdTe cap layer 40 nm in thickness was grown to protect
QW. The compositions of the spacer and QWs were determined by measuring the Е₁ and
Е₁+∆₁ peaks in reflection spectra using layer-by-layer chemical etching. The galvanomagnetic
investigations (the range of magnetic fields was 0 – 13 T) of the grown QW
showed the presence of a 2D electron gas in all the samples. The 2D electron mobility
µe = (2.4 – 3.5)×10⁵
cm²
/(V·s) for the concentrations N = (1.5 – 3)×10¹¹ cm⁻² (x < 0.11)
that confirms a high quality of the grown QWs