Shifting donor-acceptor photoluminescence in N-doped ZnO

We have grown nitrogen-doped ZnO films grown by two kinds of epitaxial methods on lattice-matched ScAlMgO$_4$ substrates. We measured the photoluminescence (PL) of the two kinds of ZnO:N layers in the donor-acceptor-pair transition region. The analysis of excitation-intensity dependence of the PL peak shift with a fluctuation model has proven that our observed growth-technique dependence was explained in terms of the inhomogeneity of charged impurity distribution. It was found that the inhomogeneity in the sample prepared with the process showing better electrical property was significantly smaller in spite of the similar nitrogen concentration. The activation energy of acceptor has been evaluated to be $\approx 170$ meV, which is independent of the nitrogen concentration.Comment: 4 pages, 3 figures, 1 table, RevTeX4, to appear in the July issue of J. Phys. Soc. Jp

Quantum magnetoconductivity characterization of interface disorder in indium-tin-oxide films on fused silica

AbstractDisorder arising from random locations of charged donors and acceptors introduces localization and diffusive motion that can lead to constructive electron interference and positive magnetoconductivity. At very low temperatures, 3D theory predicts that the magnetoconductivity is independent of temperature or material properties, as verified for many combinations of thin-films and substrates. Here, we find that this prediction is apparently violated if the film thickness d is less than about 300 nm. To investigate the origin of this apparent violation, the magnetoconductivity was measured at temperatures T = 15 – 150 K in ten, Sn-doped In2O3 films with d = 13 – 292 nm, grown by pulsed laser deposition on fused silica. We observe a very strong thickness dependence which we explain by introducing a theory that postulates a second source of disorder, namely, non-uniform interface-induced defects whose number decreases exponentially with the interface distance. This theory obeys the 3D limit for the thickest samples and yields a natural figure of merit for interface disorder. It can be applied to any degenerate semiconductor film on any semi-insulating substrate

Introduction and recovery of point defects in electron-irradiated ZnO

We have used positron annihilation spectroscopy to study the introduction and recovery of point defects in electron-irradiated n-type ZnO. The irradiation (Eel=2MeV, fluence 6×10 exp 17 cm exp −2) was performed at room temperature, and isochronal annealings were performed from 300 to 600 K. In addition, monochromatic illumination of the samples during low-temperature positron measurements was used in identification of the defects. We distinguish two kinds of vacancy defects: the Zn and O vacancies, which are either isolated or belong to defect complexes. In addition, we observe negative-ion-type defects, which are attributed to O interstitials or O antisites. The Zn vacancies and negative ions act as compensating centers and are introduced at a concentration [VZn]≃cion≃2×10 exp 16 cm exp −3. The O vacancies are introduced at a 10-times-larger concentration [VO]≃3×10 exp 17 cm exp −3 and are suggested to be isolated. The O vacancies are observed as neutral at low temperatures, and an ionization energy of 100 meV could be fitted with the help of temperature-dependent Hall data, thus indicating their deep donor character. The irradiation-induced defects fully recover after the annealing at 600 K, in good agreement with electrical measurements. The Zn vacancies recover in two separate stages, indicating that the Zn vacancies are parts of two different defect complexes. The O vacancies anneal simultaneously with the Zn vacancies at the later stage, with an activation energy of EmV,O = 1.8 ± 0.1 eV. The negative ions anneal out between the two annealing stages of the vacancies.Peer reviewe

Introduction and recovery of Ga and N sublattice defects in electron-irradiated GaN

We have used positron annihilation spectroscopy to study the introduction and recovery of point defects introduced by 0.45 and 2 MeV electron irradiation at room temperature in n-type GaN. Isochronal annealings were performed up to 1220 K. We observe vacancy defects with specific lifetime of τV=190±15ps that we tentatively identify as N vacancies or related complexes in the neutral charge state in the samples irradiated with 0.45MeV electrons. The N vacancies are produced at a rate Σ0.45N≃0.25 cm exp −1. The irradiation with 2 MeV electrons produces negatively charged Ga vacancies and negative nonopen volume defects (negative ions) originating from the Ga sublattice, at a rate Σ2.0Ga≃5cm exp −1. The irradiation-induced N vacancies anneal out of the samples at around 600 K, possibly due to the motion of the irradiation-induced N interstitials. Half of the irradiation-induced Ga vacancies anneal out of the samples also around 600 K, and this is interpreted as the isolated Ga vacancies becoming mobile with a migration barrier of EV,GaM=1.8±0.1eV. Interestingly, we observe a change of charge state of the irradiation-induced negative ions from 2− to 1− likely due to a reconstruction of the defects in two stages at annealing temperatures of about 600 and 700 K. The negative ions anneal out of the samples together with the other half of the Ga vacancies (stabilized by, e.g., N vacancies and/or hydrogen) in thermal annealings at 800–1100K.Peer reviewe