Mesoscopic Structures and Coexisting Phases in Silica Films

Silica films represent a unique two-dimensional film system, exhibiting both crystalline and vitreous forms. While much scientific work has focused on the atomic-scale features of this film system, mesoscale structures can play an important role for understanding confined space reactions and other applications of silica films. Here, we report on mesoscale structures in silica films grown under ultrahigh vacuum and examined with scanning tunneling microscopy (STM). Silica films can exhibit coexisting phases of monolayer, zigzag, and bilayer structures. Both holes in the film structure and atomic-scale substrate steps are observed to influence these coexisting phases. In particular, film regions bordering holes in silica bilayer films exhibit vitreous character, even in regions where the majority film structure is crystalline. At high coverages mixed zigzag and bilayer phases are observed at step edges, while at lower coverages silica phases with lower silicon densities are observed more prevalently near step edges. The STM images reveal that silica films exhibit rich structural diversity at the mesoscale

Bending Rigidity of 2D Silica

A chemically stable bilayers of SiO2 (2D silica) is a new, wide band gap 2D material. Up till now graphene has been the only 2D material where the bending rigidity has been measured. Here we present inelastic helium atom scattering data from 2D silica on Ru(0001) and extract the first bending rigidity, κ, measurements for a nonmonoatomic 2D material of definable thickness. We find a value of κ=8.8  eV±0.5  eV which is of the same order of magnitude as theoretical values in the literature for freestanding crystalline 2D silica

Two-Dimensional Iron Tungstate: A Ternary Oxide Layer With Honeycomb Geometry

The exceptional physical properties of graphene have sparked tremendous interests toward two-dimensional (2D) materials with honeycomb structure. We report here the successful fabrication of 2D iron tungstate (FeWO_<i>x</i>) layers with honeycomb geometry on a Pt(111) surface, using the solid-state reaction of (WO₃)₃ clusters with a FeO(111) monolayer on Pt(111). The formation process and the atomic structure of two commensurate FeWO_<i>x</i> phases, with (2 × 2) and (6 × 6) periodicities, have been characterized experimentally by combination of scanning tunneling microscopy (STM), low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), and temperature-programmed desorption (TPD) and understood theoretically by density functional theory (DFT) modeling. The thermodynamically most stable (2 × 2) phase has a formal FeWO₃ stoichiometry and corresponds to a buckled Fe²⁺/W⁴⁺ layer arranged in a honeycomb lattice, terminated by oxygen atoms in Fe–W bridging positions. This 2D FeWO₃ layer has a novel structure and stoichiometry and has no analogues to known bulk iron tungstate phases. It is theoretically predicted to exhibit a ferromagnetic electronic ground state with a Curie temperature of 95 K, as opposed to the antiferromagnetic behavior of bulk FeWO₄ materials

A Two Dimensional Zigzag Silica Polymorph on a Metal Support

We present a new polymorph of the two-dimensional (2D) silica film with a characteristic ‘zigzag’ line structure and a rectangular unit cell which forms on a Ru(0001) metal substrate. This new silica polymorph may allow for important insights into growth modes and transformations of 2D silica films as a model system for the study of glass transitions. Based on scanning tunneling microscopy, low energy electron diffraction, infrared reflection absorption spectroscopy, and X-ray photoelectron spectroscopy measurements on the one hand, and density functional theory calculations on the other, a structural model for the ‘zigzag’ polymorph is proposed. In comparison to established monolayer and bilayer silica, this ‘zigzag’ structure system has intermediate characteristics in terms of coupling to the substrate and stoichiometry. The silica ‘zigzag’ phase is transformed upon reoxidation at higher annealing temperature into a SiO₂ silica bilayer film which is chemically decoupled from the substrate