48 research outputs found
Réalisation de structures optiques verticales en verres de chalcogénure pour des applications dans le proche et moyen infrarouge
National audienceDes structures verticales que sont des miroirs de Bragg et des microcavités ont été élaborées en verres de chalcogénure. Une étude préliminaire a permis d'étudier l'indice de réfraction des différentes couches de verres massifs de chalcogénure ainsi que la vitesse de formation de ces couches déposées par PLD. L'objectif de ce travail est de réaliser des microcavités actives en dopant la couche séparatrice par des ions Erbium émettant à 1,53 et à 4,65 ”m
Iatrogenic post-intubation tracheal rupture treated conservatively without intubation: a case report
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Interest of broadband optical monitoring for thin film filter manufacturing
Broadband optical monitoring for thin-film filter manufacturing is more and more developed thanks to better performances of spectrometers with array detectors. We compare this optical monitoring with turning point monitoring and quartz monitoring of different designs. The sensitivity to thickness errors and to refractive index errors is evaluated. We show that real time determination of deposited thickness is a valuable criterion. We also present our experimental setup of transmittance and reflectance broad-band optical monitoring. The use of a 400â1000 nm range combined with a signal-to-noise ratio of2500 in transmittance and 1000 in reflectance permits us to expect the manufacturing of high-performance non-quarter-wave designs. A first manufacturing of an 18-layer non-quarter-wave high-pass filter i
Light trimming of a narrow bandpass filter based on a photosensitive chalcogenide spacer.
International audienceWe present an experimental study of the photosensitive properties of a narrow bandpass filter based on a Ge(15)Sb(20)S(65) spacer fabricated by electron beam deposition. For a single layer, near the optical bandgap of this chalcogenide material, the efficiency of the photo-bleaching increases as the central wavelength of the light source for exposure decreases. The maximum relative photo-induced change of the optical thickness reaches about 1%. By using controlled light exposure around 480 nm of a photosensitive narrow bandpass filter centered at 1550 nm, we obtained a spatially localized shift of its peak wavelength up to 5.4 nm. This property is used to perform, for the first time at our knowledge, the post trimming of a narrow bandpass filter with a light beam. A 5 x 5 mm(2) ultra uniform area in which the relative spatial variation of its peak wavelength remains below 0.004% is demonstrated