DDT-fate in tropical and temperate regions

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Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors

Tungsten nitride (WNx) is a hard refractory material with low electrical resistance that can be deposited using multiple methods. This study focuses on the microstructrual development of low pressure chemical vapor deposition grown WNx coatings. Also, the growth kinetics is studied and discussed in terms of the resulting microstructures. Samples of WNx were deposited using WF6, NH3, and Ar at 592-887 K in a hot-wall reactor with variable gas mixture compositions (NH3:WF6 = 0.5-25). The coatings were nitrogen-rich (x similar to 1.65) and oxygen-free as determined by time-of-flight-elastic recoil detection analysis. X-ray diffraction showed that the coatings transformed from being amorphous to crystallizing as beta-W2N at 641-690 K. The morphologies changed with deposition temperature. Being very fine grained and nodular at deposition temperatures 740 K and below, increasing the deposition temperature to 789 K while employing a NH3:WF6 molar ratio of 1, large disc-shaped protrusions were formed. When increasing the NH3:WF6 molar ratio to 25, striped facets became increasingly dominant. Investigating the latter by transmission electron microscopy, a microstructure of smaller ridges formed by twinning, oriented as in the out-of-plane direction, was revealed across the facet surfaces. Transmission Kikuchi diffraction confirmed that was the texture of these coatings. The partial reaction order of WF6 and NH3 at 740 K was determined to be close to 1/6 and 1/2, respectively. The apparent activation energy ranged from 82 to 12 kJ/mol corresponding to deposition temperatures from 592 to 887 K

Fullerene mixtures enhance the thermal stability of a non-crystalline polymer solar cell blend

Printing of polymer: fullerene solar cells at high speed requires annealing at temperatures up to 140 degrees C. However, bulk-heterojunction blends that comprise a non-crystalline donor polymer often suffer from insufficient thermal stability and hence rapidly coarsen upon annealing above the glass transition temperature of the blend. In addition, micrometer-sized fullerene crystals grow, which are detrimental for the solar cell performance. In this manuscript, we present a strategy to limit fullerene crystallization, which is based on the use of fullerene mixtures of the two most common derivatives, PC61BM and PC71BM, as the acceptor material. Blends of this fullerene mixture and a non-crystalline thiophene-quinoxaline copolymer display considerably enhanced thermal stability and largely retain their photovoltaic performance upon annealing at elevated temperatures as high as 170 degrees C

A fullerene alloy based photovoltaic blend with a glass transition temperature above 200 degrees C

Organic solar cells with a high degree of thermal stability require bulk-heterojunction blends that feature a high glass transition, which must occur considerably above the temperatures encountered during device fabrication and operation. Here, we demonstrate for the first time a polymer : fullerene blend with a glass transition temperature above 200 degrees C, which we determine by plasmonic nanospectroscopy. We achieve this strong tendency for glass formation through the use of an alloy of neat, unsubstituted C-60 and C-70, which we combine with the fluorothieno-benzodithiophene copolymer PTB7. A stable photovoltaic performance of PTB7 : C60 : C70 ternary blends is preserved despite annealing the active layer at up to 180 degrees C, which coincides with the onset of the glass transition. Rapid deterioration of the power conversion efficiency from initially above 5% only occurs upon exceeding the glass transition temperature of 224 degrees C of the ternary blend.Funding Agencies|Swedish Research Council; Swedish Foundation for Strategic Research [RMA11-0037, RMA15-0052]; Swedish Energy Agency</p