Hardness and modulus of elasticity of atomic layer deposited Al2O3-ZrO2 nanolaminates and mixtures

This work was funded by the European Regional Development Fund project TK134 “Emerging orders in quantum and nanomaterials”, Estonian Research Agency project PRG4 “Emerging novel phases in strongly frustrated quantum magnets”.Atomic layer deposition was used to produce 90–105 nm thick alumina-zirconia mixtures and nanolaminate structures on soda-lime glass substrate. The resultant chemical and structural compositions of the thin films were characterized. Hardness and modulus of elasticity were determined by instrumented nanoindentation. The hardness of mixtures and nanolaminates were in the range of 11–15 GPa and moduli in the range of 140–180 GPa ZrO2 with 3.7 mol.-% Al2O3 crystallized in pure tetragonal phase and measured hardness reached about 15 GPa on glass substrate at indentation displacement of about 13 nm. Similar mechanical properties were measured in most thin films, except pure ZrO2, demonstrating insensitivity of mechanical properties to deposition receipt.ERDF TK134; Estonian Research Agency PRG4; Institute of Solid State Physics, University of Latvia as the Center of Excellence has received funding from the European Union’s Horizon 2020 Framework Programme H2020-WIDESPREAD-01-2016-2017-TeamingPhase2 under grant agreement No. 739508, project CAMART

Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer deposition

Nanolaminates of ZrO2 and HfO2 were grown by atomic layer deposition, using metal halides and water as precursors, on silicon and fused quartz substrates at 300 degrees C. The crystalline phase composition, optical refraction, and mechanical performance of the multilayers were influenced by the relative contents of the constituent metal oxides. The crystal growth in as-deposited HfO2 dominantly led to the monoclinic phase, whereas ZrO2 was partially crystallized as its metastable and hard tetragonal polymorph. The hardness and elasticity of the nanolaminate structures could be modified by varying the amounts of either oxide contributing to the crystallographic order formed in the solid films. The refractive indexes depended on the nanolaminate structure.Peer reviewe

Behavior of nanocomposite consisting of manganese ferrite particles and atomic layer deposited bismuth oxide chloride film

Nanocomposites of manganese ferrite and bismuth oxide chloride were synthesized. The composites consisted of 10 nm thick nanocrystalline bismuth oxide chloride thin film grown by atomic layer deposition on spinel MnFe2O4 nanoparticles prepared by wet chemical synthesis. The composite layers exhibited nonlinear polarization behavior in both magnetic and electric fields at room temperature. The magnetic coercive force, HC, was 30 – 40 Oe at room temperature. The width of electrical charge – voltage hysteresis loop reached 3.6 MV/cm.Peer reviewe

RRAM Memories with ALD High-K Dielectrics: Electrical Characterization and Analytical Modeling

Resistive switching phenomena with adequate repetitiveness on Ta2O5-TiO2-Ta2O5 and TiO2-Ta2O5-TiO2 stacks are reported. In particular, 5–nm-thick TiO2 films embedding a monolayer of Ta2O5 show the best behavior in terms of bipolar cycles loop width, with separate low and high resistive states up to two orders of magnitude. Tantalum oxide layer increases the defect density in titania that becomes less leaky, and thus, resistive switching effects appear. Small signal ac parameters measured at low and medium frequencies, namely capacitance and conductance, also show hysteretic behavior during a whole bipolar switching cycle. This means that the memory state can be read at 0 V, without any power consumption. High-frequency measurements provide information about dipole relaxation frequency values in the dielectric bulk, and this can be connected with resistive switching behavior. Finally, a double tunneling barrier model fits I-V curves at the low-resistance state even at the bias range where reset occurs and a sharp fall takes place

Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films

Atomic layer deposition method was employed to deposit thin films consisting of ZrO2 and HfO2. Zirconia films were doped with hafnia and vice versa, and also nanolaminates were formed. All depositions were carried out at 300 degrees C. Most films were crystalline in their as-deposited state. Zirconia exhibited the metastable cubic and tetragonal phases by a large majority, whereas hafnia was mostly in its stable monoclinic phase. Magnetic and electrical properties of the films were assessed. Un-doped zirconia was ferromagnetic and this property diminished with increasing the amount of hafnia in a film. All films exhibited ferroelectric-like behavior and the polarization curves also changed with respect to the film composition. (C) The Author(s) 2018. Published by ECS.Peer reviewe

Memory maps : Reading RRAM devices without power consumption

Producción CientíficaA comparative study of MIM-RRAM structures with different insulator materials is presented. Admittance memory mapping was carried out at 0 V dc bias, revealing two clearly separated states, both in terms of conductance and susceptance. The memory in the ON state can be modeled by means of a two parameter (resistance and inductance) equivalent circuit. The parameter extraction provides memory maps for the resistance and the inductance as well. The transition shapes between the ON and OFF state are different for each structure due to specific physical mechanisms.Ministerio de Economía, Industria y Competitividad - Fondo Europeo de Desarrollo Regional (grant TEC2014-52152-C3-3-R)Fondo Europeo de Desarrollo Regional (project TK134)Estonian Research Agency (grants IUT2-24 and PRG4

Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

Five-layer crystalline thin film structures were formed, consisting of ZrO2 and Co3O4 alternately grown on Si(100) substrates by atomic layer deposition at 300 degrees C using ZrCl4 and Co(acac)(3) as the metal precursors and ozone as the oxygen precursor. The performance of the laminate films was dependent on the relative content of constituent oxide layers. The magnetization in these films was nonlinear, saturative, and with very weak coercive fields. Electrical measurements revealed the formation of significant polarization versus external field loops and implied some tendency toward memristive behavior. (C) The Author(s) 2018. Published by ECS.Peer reviewe

Identifying iron-bearing nanoparticle precursor for thermal transformation into the highly active hematite photo-fenton catalyst

Funding: This reseach was funded by the European Regional Development Fund within the Activity 1.1.1.2 “Post-doctoral Research Aid” of the Specific Aid Objective 1.1.1 “To increase the research and innovative capacity of scientific institutions of Latvia and the ability to attract external financing, investing in human resources and infrastructure” of the Operational Programme “Growth and Employment” (No. 1.1.1.2/VIAA/1/16/157).The hematite photo-Fenton catalysis has attracted increasing attention because it offers strong oxidation of organic pollutants under visible light at neutral pH. In the present work, aqueous synthesis of hematite photo-Fenton catalysts with high activity is demonstrated. We compare photo-Fenton activity for hematite obtained by hydrolyzation at 60◦C or by a thermally induced transformation from iron-bearing nanoparticles, such as amorphous iron oxyhydroxide or goethite. A link between their structure and visible light photo-Fenton reactivity is established. The highest activity was observed for hematite obtained from goethite nanowires due to oblong platelet-like structure, high surface area and the presence of nanopores.European Regional Development Fund 1.1.1.2/VIAA/1/16/157; Institute of Solid State Physics, University of Latvia as the Center of Excellence has received funding from the European Union’s Horizon 2020 Framework Programme H2020-WIDESPREAD-01-2016-2017-TeamingPhase2 under grant agreement No. 739508, project CAMART

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

Mixed films of a high-permittivity oxide, Er2O3, and a magnetic material, Fe2O3, were grown by atomic layer deposition on silicon and titanium nitride at 375 degrees C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were formed. Growth into three-dimensional trenched structures was demonstrated. A structure deposited using tens to hundreds subsequent cycles for both constituent metal oxide layers promoted both charge polarization and saturative magnetization compared to those in the more homogeneously mixed films.Peer reviewe

Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone

Producción CientíficaAtomic layer deposition method was used to grow thin films consisting of ZrO2 and MnOx layers. All depositions were carried out at 300 ºC. Some deposition characteristics of the manganese(III)acetylacetonate and ozone process were investigated, such as crystallinity and the dependence of growth rate on the deposition temperature. All films were partly crystalline in their as-deposited state. Zirconium oxide contained cubic and tetragonal phases of ZrO2, while the manganese oxide was shown to consist of cubic Mn2O3 and tetragonal Mn3O4 phases. All the films exhibited nonlinear saturative magnetization with hysteresis, as well as resistive switching characteristics.Fondo Europeo de Desarrollo Regional (projects TK134 and TK141)Ministerio de Economía, Industria y Competitividad (project TEC2017-84321-C4-2-R)Estonian Research Agency (projects PRG4 and PRG753