31 research outputs found

    Quantum information storage for over 180 s using donor spins in a 28Si "semiconductor vacuum".

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    A quantum computer requires systems that are isolated from their environment, but can be integrated into devices, and whose states can be measured with high accuracy. Nuclear spins in solids promise long coherence lifetimes, but they are difficult to initialize into known states and to detect with high sensitivity. We show how the distinctive optical properties of enriched (28)Si enable the use of hyperfine-resolved optical transitions, as previously applied to great effect for isolated atoms and ions in vacuum. Together with efficient Auger photoionization, these resolved hyperfine transitions permit rapid nuclear hyperpolarization and electrical spin-readout. We combine these techniques to detect nuclear magnetic resonance from dilute (31)P in the purest available sample of (28)Si, at concentrations inaccessible to conventional measurements, measuring a solid-state coherence time of over 180 seconds

    Composition ffnhomogeneity and structural defects in czochralsi grown GexSi1-x solid solution crystals

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    The relationship between the plastic strain and the inhomogeneity of germanium distribution in single crystals of GexSi1 (-x) (x = 4-9 at %) solid solutions grown using the Czochralski method has been studied. It is established that plastic straining develops via the nucleation of dislocations at their sources occurring in the Ge segregation bands, while the inhomogeneous profile of Ge distribution across the growth direction is caused by thermoelastic stresses.X114sciescopu

    X-ray studies of Si1-xGex single crystals

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    Structural imperfections were studied in Si1 - xGex (1 - 9 at. % Ge) solid-solution single crystals grown using the Czochralski method. The studies were performed using x-ray diffraction topography with laboratory and synchrotron radiation sources, x-ray diffractometry, and synchrotron radiation phase radiography. In all crystals studied, irrespective of the Ge concentration, impurity bands (growth bands) were observed. An increase in the Ge concentration in the range 7 - 9 at. % was shown to bring about the nucleation and motion of dislocations on a few slip systems and the formation of slip bands. Local block structures were observed in the places where slip bands intersected. The most likely reason for the formation of slip bands is the inhomogeneous distribution of Ge atoms over the ingot diameter and along the growth axis. Therefore, the structure of Si1 - xGex solid-solution single crystals can be improved by making them more uniform in composition. (c) 2005 Pleiades Publishing, Inc.X115sciescopu

    Investigation of dislocations in Czochralski grown Si1-xGex single crystals

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    Dislocations in p-type Si1-xGex single crystals (2-8 at% Ge) grown with the Czochralski technique are investigated by synchrotron white beam topography in transmission geometry. As the Ge concentration increases, the dislocation structure evolves from individual dislocations to slip bands and sub-grain boundaries, and the dislocation density increases from < 10(2) cm(-2) to 10(5)-10(6) cm(-2) at 8 at%. We discuss the effect of dislocations on the electrical characteristics such as resistivity rho(v), Hall hole mobility mu p, carrier lifetime tau(e) and I-V characteristics. Here tau(e) and I-V characteristics are measured from the diodes fabricated by bonding the p-Si1-xGex to n-Si wafers. I-V characteristics are not deteriorated in spite of a five times decrease in tau(e) with the Ge concentration.X1133sciescopu

    White X-ray beam topography and radiography of Si1-xGex crystals bonded to silicon

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    The defect structure of Si1-xGex. wafers with 4% of germanium and their interfaces with Si wafers were studied using white radiation topography and phase-sensitive radiography. The heterostructures were manufactured by direct bonding of Si1-xGex. and Si crystalline wafers made of bulk crystals that were grown by the Czochralski technique. In Si1-xGex. crystals, the segregations of Ge act as dislocation nucleation sites. In Si1-xGex/Si bonded structures, the segregation of Ge as well as the accumulation of dislocations induce elastic strain and plastic deformation during high-temperature bonding annealing. With the topography-radiography combination, we are able not only to detect microcracks, indicating nonbonded areas, by radiography, but also to reveal dislocations and long-range strain fields by topography at the same time. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.X114sciescopu
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