Review on suitable eDRAM configurations for next nano-metric electronics era

We summarize most of our studies focused on the main reliability issues that can threat the gain-cells eDRAM behavior when it is simulated at the nano-metric device range has been collected in this review. So, to outperform their memory cell counterparts, we explored different technological proposals and operational regimes where it can be located. The best memory cell performance is observed for the 3T1D-eDRAM cell when it is based on FinFET devices. Both device variability and SEU appear as key reliability issues for memory cells at sub-22nm technology node.Peer ReviewedPostprint (author's final draft

Cache memory design in the FinFET era

The major problem in the future technology scaling is the variations in process parameters that are interpreted as imperfections in the development process. Moreover, devices are more sensitive to the environmental changes of temperature and supply volt- age as well as to ageing. All these influences are manifested in the integrated circuits as increased power consumption, reduced maximal operating frequency and increased number of failures. These effects have been partially overcome with the introduction of the FinFET technology which have solved the problem of variability caused by Random Dopant Fluctuations. However, in the next ten years channel length is projected to shrink to 10nm where the variability source generated by Line Edge Roughness will dominate, and its effects on the threshold voltage variations will become critical. The embedded memories with their cells as the basic building unit are the most prone to these effects due to their the smallest dimensions. Because of that, memories should be designed with particular care in order to make possible further technology scaling. This thesis explores upcoming 10nm FinFETs and the existing issues in the cache memory design with this technology. More- over, it tries to present some original and novel techniques on the different level of design abstraction for mitigating the effects of process and environmental variability. At first original method for simulating variability of Tri-Gate Fin- FETs is presented using conventional HSPICE simulation environment and BSIM-CMG model cards. When that is accomplished, thorough characterisation of traditional SRAM cell circuits (6T and 8T) is performed. Possibility of using Independent Gate FinFETs for increasing cell stability has been explored, also. Gain Cells appeared in the recent past as an attractive alternative for in the cache memory design. This thesis partially explores this idea by presenting and performing detailed circuit analysis of the dynamic 3T gain cell for 10nm FinFETs. At the top of this work, thesis shows one micro-architecture optimisation of high-speed cache when it is implemented by 3T gain cells. We show how the cache coherency states can be used in order to reduce refresh energy of the memory as well as reduce memory ageing.El principal problema de l'escalat la tecnologia són les variacions en els paràmetres de disseny (imperfeccions) durant procés de fabricació. D'altra banda, els dispositius també són més sensibles als canvis ambientals de temperatura, la tensió d'alimentació, així com l'envelliment. Totes aquestes influències es manifesten en els circuits integrats com l'augment de consum d'energia, la reducció de la freqüència d'operació màxima i l'augment del nombre de xips descartats. Aquests efectes s'han superat parcialment amb la introducció de la tecnologia FinFET que ha resolt el problema de la variabilitat causada per les fluctuacions de dopants aleatòries. No obstant això, en els propers deu anys, l'ample del canal es preveu que es reduirà a 10nm, on la font de la variabilitat generada per les rugositats de les línies de material dominarà, i els seu efecte en les variacions de voltatge llindar augmentarà. Les memòries encastades amb les seves cel·les com la unitat bàsica de construcció són les més propenses a sofrir aquests efectes a causa de les seves dimensions més petites. A causa d'això, cal dissenyar les memòries amb una especial cura per tal de fer possible l'escalat de la tecnologia. Aquesta tesi explora la tecnologia de FinFETs de 10nm i els problemes existents en el disseny de memòries amb aquesta tecnologia. A més a més, presentem noves tècniques originals sobre diferents nivells d'abstracció del disseny per a la mitigació dels efectes les variacions tan de procés com ambientals. En primer lloc, presentem un mètode original per a la simulació de la variabilitat de Tri-Gate FinFETs usant entorn de simulació HSPICE convencional i models de tecnologia BSIMCMG. Després, es realitza la caracterització completa dels circuits de cel·les SRAM tradicionals (6T i 8T) conjuntament amb l'ús de Gate-independent FinFETs per augmentar l'estabilitat de la cèl·lula

Cryogenic Memory Technologies

The surging interest in quantum computing, space electronics, and superconducting circuits has led to new developments in cryogenic data storage technology. Quantum computers promise to far extend our processing capabilities and may allow solving currently intractable computational challenges. Even with the advent of the quantum computing era, ultra-fast and energy-efficient classical computing systems are still in high demand. One of the classical platforms that can achieve this dream combination is superconducting single flux quantum (SFQ) electronics. A major roadblock towards implementing scalable quantum computers and practical SFQ circuits is the lack of suitable and compatible cryogenic memory that can operate at 4 Kelvin (or lower) temperature. Cryogenic memory is also critically important in space-based applications. A multitude of device technologies have already been explored to find suitable candidates for cryogenic data storage. Here, we review the existing and emerging variants of cryogenic memory technologies. To ensure an organized discussion, we categorize the family of cryogenic memory platforms into three types: superconducting, non-superconducting, and hybrid. We scrutinize the challenges associated with these technologies and discuss their future prospects.Comment: 21 pages, 6 figures, 1 tabl

Towards Efficient In-memory Computing Hardware for Quantized Neural Networks: State-of-the-art, Open Challenges and Perspectives

The amount of data processed in the cloud, the development of Internet-of-Things (IoT) applications, and growing data privacy concerns force the transition from cloud-based to edge-based processing. Limited energy and computational resources on edge push the transition from traditional von Neumann architectures to In-memory Computing (IMC), especially for machine learning and neural network applications. Network compression techniques are applied to implement a neural network on limited hardware resources. Quantization is one of the most efficient network compression techniques allowing to reduce the memory footprint, latency, and energy consumption. This paper provides a comprehensive review of IMC-based Quantized Neural Networks (QNN) and links software-based quantization approaches to IMC hardware implementation. Moreover, open challenges, QNN design requirements, recommendations, and perspectives along with an IMC-based QNN hardware roadmap are provided

Design and Develop Efficient Arbitration Technique to Handle the Multiple Refresh Requests in Multi-Processor SoC

Emerging memory technologies, such as Gain Cell-embedded Dynamic Random Access Memory (GC-eDRAM), play an essential part in the process of improving the overall performance of current multi-processor systems. GC-eDRAM, on the other hand, has its own set of distinct issues, particularly with regard to refresh operations. The number of cores and threads in contemporary processors continues to expand, which in turn leads to an increase in the number of concurrent refresh requests. This might cause contention, which in turn can lead to a possible performance decrease. In this article, we present an efficient arbitration method that was developed in order to precisely address the issues that are associated with numerous requests for a refresh in GC-eDRAM. This method takes use of the inherent parallelism of GC-eDRAM modules to make it possible to execute simultaneous refresh operations. As a result, contention is effectively reduced, and the overall performance of the system is improved. We provide a new arbitration method that prioritizes the pending refresh requests according to their level of urgency and optimizes the allocation of GC-eDRAM resources in order to guarantee that refresh operations are carried out in an effective manner. Our method modifies the arbitration priority in a dynamic manner according to the characteristics of the active workload. These characteristics include the request arrival rate, memory access patterns, and data location, among other considerations

Electrostatic Analysis of Gate All Around (GAA) Nanowire over FinFET

abstract: CMOS Technology has been scaled down to 7 nm with FinFET replacing planar MOSFET devices. Due to short channel effects, the FinFET structure was developed to provide better electrostatic control on subthreshold leakage and saturation current over planar MOSFETs while having the desired current drive. The FinFET structure has an undoped or fully depleted fin, which supports immunity from random dopant fluctuations (RDF – a phenomenon which causes a reduction in the threshold voltage and is prominent at sub 50 nm tech nodes due to lesser dopant atoms) and thus causes threshold voltage (Vth) roll-off by reducing the Vth. However, as the advanced CMOS technologies are shrinking down to a 5 nm technology node, subthreshold leakage and drain-induced-barrier-lowering (DIBL) are driving the introduction of new metal-oxide-semiconductor field-effect transistor (MOSFET) structures to improve performance. GAA field effect transistors are shown to be the potential candidates for these advanced nodes. In nanowire devices, due to the presence of the gate on all sides of the channel, DIBL should be lower compared to the FinFETs. A 3-D technology computer aided design (TCAD) device simulation is done to compare the performance of FinFET and GAA nanowire structures with vertically stacked horizontal nanowires. Subthreshold slope, DIBL & saturation current are measured and compared between these devices. The FinFET’s device performance has been matched with the ASAP7 compact model with the impact of tensile and compressive strain on NMOS & PMOS respectively. Metal work function is adjusted for the desired current drive. The nanowires have shown better electrostatic performance over FinFETs with excellent improvement in DIBL and subthreshold slope. This proves that horizontal nanowires can be the potential candidate for 5 nm technology node. A GAA nanowire structure for 5 nm tech node is characterized with a gate length of 15 nm. The structure is scaled down from 7 nm node to 5 nm by using a scaling factor of 0.7.Dissertation/ThesisMasters Thesis Electrical Engineering 201

Radiation Hardened by Design Methodologies for Soft-Error Mitigated Digital Architectures

abstract: Digital architectures for data encryption, processing, clock synthesis, data transfer, etc. are susceptible to radiation induced soft errors due to charge collection in complementary metal oxide semiconductor (CMOS) integrated circuits (ICs). Radiation hardening by design (RHBD) techniques such as double modular redundancy (DMR) and triple modular redundancy (TMR) are used for error detection and correction respectively in such architectures. Multiple node charge collection (MNCC) causes domain crossing errors (DCE) which can render the redundancy ineffectual. This dissertation describes techniques to ensure DCE mitigation with statistical confidence for various designs. Both sequential and combinatorial logic are separated using these custom and computer aided design (CAD) methodologies. Radiation vulnerability and design overhead are studied on VLSI sub-systems including an advanced encryption standard (AES) which is DCE mitigated using module level coarse separation on a 90-nm process with 99.999% DCE mitigation. A radiation hardened microprocessor (HERMES2) is implemented in both 90-nm and 55-nm technologies with an interleaved separation methodology with 99.99% DCE mitigation while achieving 4.9% increased cell density, 28.5 % reduced routing and 5.6% reduced power dissipation over the module fences implementation. A DMR register-file (RF) is implemented in 55 nm process and used in the HERMES2 microprocessor. The RF array custom design and the decoders APR designed are explored with a focus on design cycle time. Quality of results (QOR) is studied from power, performance, area and reliability (PPAR) perspective to ascertain the improvement over other design techniques. A radiation hardened all-digital multiplying pulsed digital delay line (DDL) is designed for double data rate (DDR2/3) applications for data eye centering during high speed off-chip data transfer. The effect of noise, radiation particle strikes and statistical variation on the designed DDL are studied in detail. The design achieves the best in class 22.4 ps peak-to-peak jitter, 100-850 MHz range at 14 pJ/cycle energy consumption. Vulnerability of the non-hardened design is characterized and portions of the redundant DDL are separated in custom and auto-place and route (APR). Thus, a range of designs for mission critical applications are implemented using methodologies proposed in this work and their potential PPAR benefits explored in detail.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

Technology Implications for Large Last-Level Caches

Large last-level cache (L3C) is efficient for bridging the performance and power gap between processor and memory. Several memory technologies, including SRAM, STT-RAM (MRAM), and embedded DRAM (eDRAM), have been used or considered as the technology to implement L3Cs. However, each of them has inherent weaknesses: SRAM is relatively low density and dissipates high leakage; STT-RAM has long write latency and requires high write energy; eDRAM requires refresh. As future processors are expected to have larger last-level caches, the objective of this dissertation is to study the tradeoffs associated with using each of these technologies to implement L3Cs. In order to make useful comparisons between L3Cs built with SRAM, STT-RAM, and eDRAM, we consider and implement several levels of details. First, to obtain unbiased cache performance and power properties (i.e., read/write access latency, read/write access energy, leakage power, refresh power, area), we prototype caches based on realistic memory and device models. Second, we present simplistic analytical models that enable us to quickly examine different memory technologies under various scenarios. Third, we review power-optimization techniques for each of the technologies, and propose using a low-cost dead-line prediction scheme for eDRAM-based L3Cs to eliminate unnecessary refreshes. Finally, the highlight of this dissertation is the comparison and analysis of low-leakage SRAM, low write-energy STT-RAM, and refresh-optimized eDRAM. We report system performance, last-level cache energy breakdown, and memory hierarchy energy breakdown, using an augmented full-system simulator with the execution of a range of workloads and input sets. From the insights gained through simulation results, STT-RAM has the highest potential to save energy in future L3C designs. For contemporary processors, SRAM-based L3C results in the fastest system performance, whereas eDRAM consumes the lowest energy

Caractérisation, mécanismes et applications mémoire des transistors avancés sur SOI

Ce travail présente les principaux résultats obtenus avec une large gamme de dispositifs SOI avancés, candidats très prometteurs pour les futurs générations de transistors MOSFETs. Leurs propriétés électriques ont été analysées par des mesures systématiques, agrémentées par des modèles analytiques et/ou des simulations numériques. Nous avons également proposé une utilisation originale de dispositifs FinFETs fabriqués sur ONO enterré en fonctionnalisant le ONO à des fins d'application mémoire non volatile, volatile et unifiées. Après une introduction sur l'état de l'art des dispositifs avancés en technologie SOI, le deuxième chapitre a été consacré à la caractérisation détaillée des propriétés de dispositifs SOI planaires ultra- mince (épaisseur en dessous de 7 nm) et multi-grille. Nous avons montré l excellent contrôle électrostatique par la grille dans les transistors très courts ainsi que des effets intéressants de transport et de couplage. Une approche similaire a été utilisée pour étudier et comparer des dispositifs FinFETs à double grille et triple grille. Nous avons démontré que la configuration FinFET double grille améliore le couplage avec la grille arrière, phénomène important pour des applications à tension de seuil multiple. Nous avons proposé des modèles originaux expliquant l'effet de couplage 3D et le comportement de la mobilité dans des TFTs nanocristallin ZnO. Nos résultats ont souligné les similitudes et les différences entre les transistors SOI et à base de ZnO. Des mesures à basse température et de nouvelles méthodes d'extraction ont permis d'établir que la mobilité dans le ZnO et la qualité de l'interface ZnO/SiO2 sont remarquables. Cet état de fait ouvre des perspectives intéressantes pour l'utilisation de ce type de matériaux aux applications innovantes de l'électronique flexible. Dans le troisième chapitre, nous nous sommes concentrés sur le comportement de la mobilité dans les dispositifs SOI planaires et FinFET en effectuant des mesures de magnétorésistance à basse température. Nous avons mis en évidence expérimentalement un comportement de mobilité inhabituel (multi-branche) obtenu lorsque deux ou plusieurs canaux coexistent et interagissent. Un autre résultat original concerne l existence et l interprétation de la magnétorésistance géométrique dans les FinFETs.L'utilisation de FinFETs fabriqués sur ONO enterré en tant que mémoire non volatile flash a été proposée dans le quatrième chapitre. Deux mécanismes d'injection de charge ont été étudiés systématiquement. En plus de la démonstration de la pertinence de ce type mémoire en termes de performances (rétention, marge de détection), nous avons mis en évidence un comportement inattendu : l amélioration de la marge de détection pour des dispositifs à canaux courts. Notre concept innovant de FinFlash sur ONO enterré présente plusieurs avantages: (i) opération double-bit et (ii) séparation de la grille de stockage et de l'interface de lecture augmentant la fiabilité et autorisant une miniaturisation plus poussée que des Finflash conventionnels avec grille ONO.Dans le dernier chapitre, nous avons exploré le concept de mémoire unifiée, en combinant les opérations non volatiles et 1T-DRAM par le biais des FinFETs sur ONO enterré. Comme escompté pour les mémoires dites unifiées, le courant transitoire en mode 1T-DRAM dépend des charges non volatiles stockées dans le ONO. D'autre part, nous avons montré que les charges piégées dans le nitrure ne sont pas perturbées par les opérations de programmation et lecture de la 1T-DRAM. Les performances de cette mémoire unifiée multi-bits sont prometteuses et pourront être considérablement améliorées par optimisation technologique de ce dispositif.The evolution of electronic systems and portable devices requires innovation in both circuit design and transistor architecture. During last fifty years, the main issue in MOS transistor has been the gate length scaling down. The reduction of power consumption together with the co-integration of different functions is a more recent avenue. In bulk-Si planar technology, device shrinking seems to arrive at the end due to the multiplication of parasitic effects. The relay has been taken by novel SOI-like device architectures. In this perspective, this manuscript presents the main achievements of our work obtained with a variety of advanced fully depleted SOI MOSFETs, which are very promising candidates for next generation MOSFETs. Their electrical properties have been analyzed by systematic measurements and clarified by analytical models and/or simulations. Ultimately, appropriate applications have been proposed based on their beneficial features.In the first chapter, we briefly addressed the short-channel effects and the diverse technologies to improve device performance. The second chapter was dedicated to the detailed characterization and interesting properties of SOI devices. We have demonstrated excellent gate control and high performance in ultra-thin FD SOI MOSFET. The SCEs are efficiently suppressed by decreasing the body thickness below 7 nm. We have investigated the transport and electrostatic properties as well as the coupling mechanisms. The strong impact of body thickness and temperature range has been outlined. A similar approach was used to investigate and compare vertical double-gate and triple-gate FinFETs. DG FinFETs show enhanced coupling to back-gate bias which is applicable and suitable for dynamic threshold voltage tuning. We have proposed original models explaining the 3D coupling effect in FinFETs and the mobility behavior in ZnO TFTs. Our results pointed on the similarities and differences in SOI and ZnO transistors. According to our low-temperature measurements and new promoted extraction methods, the mobility in ZnO and the quality of ZnO/SiO2 interface are respectable, enabling innovating applications in flexible, transparent and power electronics. In the third chapter, we focused on the mobility behavior in planar SOI and FinFET devices by performing low-temperature magnetoresistance measurements. Unusual mobility curve with multi-branch aspect were obtained when two or more channels coexist and interplay. Another original result in the existence of the geometrical magnetoresistance in triple-gate and even double-gate FinFETs.The operation of a flash memory in FinFETs with ONO buried layer was explored in the forth chapter. Two charge injection mechanisms were proposed and systematically investigated. We have discussed the role of device geometry and temperature. Our novel ONO FinFlash concept has several distinct advantages: double-bit operation, separation of storage medium and reading interface, reliability and scalability. In the final chapter, we explored the avenue of unified memory, by combining nonvolatile and 1T-DRAM operations in a single transistor. The key result is that the transient current, relevant for 1T-DRAM operation, depends on the nonvolatile charges stored in the nitride buried layer. On the other hand, the trapped charges are not disturbed by the 1T-DRAM operation. Our experimental data offers the proof-of-concept for such advanced memory. The performance of the unified/multi-bit memory is already decent but will greatly improve in the coming years by processing dedicated devices.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF