3D Global Router: a Study to Optimize Congestion, Wirelength and Via for Circuit Layout

The increasing size of integrated circuits and aggressive shrinking process feature size for IC manufacturing process poses signicant challenges on traditional physical design problems. Various design rules signicantly complicate the physical design problems and large problem size abides nothing but extremely e cient techniques. Leading physical design tools have to be powerful enough to handle complex design demands and be nimble enough to waste no runtime. This thesis studies the challenges faced by global routing problem, one of the traditional physical design problems that needs to be pushed to its new limit. This work proposes three e ective tools to tackle congestion, wire and via optimization in global routing process, from three di erent aspects. The number of vias generated during the global routing stage is a critical factor for the yield of integrated circuits. However, most global routers only approach the problem by charging a cost for vias in the maze routing cost function. The first work of this thesis, FastRoute 4.0 presents a global router that addresses the via number optimization problem throughout the entire global routing ow. It introduces the via aware Steiner tree generation, 3-bend routing and layer assignment with careful ordering to reduce via count. The integration of these three techniques with existing academic global routers achieves signicant reduction in via count without any sacrice in runtime. Despite of the recent development for popular rip-up and reroute framework, the congestion elimination process remains arbitrary and requires signicant tuning. Global routing has congestion elimination as the first and foremost priority and congestion issue becomes increasingly severe due to timing requirements, design for manufacturability. The second work of this thesis, an auction algorithm based pre-processing framework (APF) for global routing focuses on how to eliminate congestion e ectively. In order to achieve more consistent congestion elimination, the framework uses auction based detour techniques to alleviate the impacts of greedy sequential manner of maze routing, which remains as a major drawback in the most popular global routing framework. In the framework, APF first identies the most congested global routing locations by an interval over ow lower bound technique. Then APF uses auction based detour algorithm to compute which nets to detour and where to detour. The framework can be applied to any global routers and would help them to achieve signicant improvement in both solution quality and runtime. The third work in this thesis combines the advantage of the two framework used to minimize via usage in global routing: 3D routers with good solution quality and e cient 2D routers with layer assignment process. It results in a new multi-level 3D global router called MGR (multi-level global router) that combines the advantage of both kinds. MGR resorts to an e cient multi-level framework to reroute nets in the congested region on the 3D grid graph. Routing on the coarsened grid graph speeds up the global router while 3D routing introduces less vias. The powerful multi-level rerouting framework wraps three innovative routing techniques together: an adaptive resource reservation technique in coarsening process, a new 3-terminal maze routing algorithm and a network flow based solution propagation method in uncoarsening process. As a result, MGR can achieve the solution quality close to 3D routers with comparable runtime of 2D routers

Shortest Paths and Steiner Trees in VLSI Routing

Routing is one of the major steps in very-large-scale integration (VLSI) design. Its task is to find disjoint wire connections between sets of points on a chip, subject to numerous constraints. This problem is solved in a two-stage approach, which consists of so-called global and detailed routing steps. For each set of metal components to be connected, global routing reduces the search space by computing corridors in which detailed routing sequentially determines the desired connections as shortest paths. In this thesis, we present new theoretical results on Steiner trees and shortest paths, the two main mathematical concepts in routing. In the practical part, we give computational results of BonnRoute, a VLSI routing tool developed at the Research Institute for Discrete Mathematics at the University of Bonn. Interconnect signal delays are becoming increasingly important in modern chip designs. Therefore, the length of paths or direct delay measures should be taken into account when constructing rectilinear Steiner trees. We consider the problem of finding a rectilinear Steiner minimum tree (RSMT) that --- as a secondary objective --- minimizes a signal delay related objective. Given a source we derive some structural properties of RSMTs for which the weighted sum of path lengths from the source to the other terminals is minimized. Also, we present an exact algorithm for constructing RSMTs with weighted sum of path lengths as secondary objective, and a heuristic for various secondary objectives. Computational results for industrial designs are presented. We further consider the problem of finding a shortest rectilinear Steiner tree in the plane in the presence of rectilinear obstacles. The Steiner tree is allowed to run over obstacles; however, if it intersects an obstacle, then no connected component of the induced subtree must be longer than a given fixed length. This kind of length restriction is motivated by its application in VLSI routing where a large Steiner tree requires the insertion of repeaters which must not be placed on top of obstacles. We show that there are optimal length-restricted Steiner trees with a special structure. In particular, we prove that a certain graph (called augmented Hanan grid) always contains an optimal solution. Based on this structural result, we give an approximation scheme for the special case that all obstacles are of rectangular shape or are represented by at most a constant number of edges. Turning to the shortest paths problem, we present a new generic framework for Dijkstra's algorithm for finding shortest paths in digraphs with non-negative integral edge lengths. Instead of labeling individual vertices, we label subgraphs which partition the given graph. Much better running times can be achieved if the number of involved subgraphs is small compared to the order of the original graph and the shortest path problems restricted to these subgraphs is computationally easy. As an application we consider the VLSI routing problem, where we need to find millions of shortest paths in partial grid graphs with billions of vertices. Here, the algorithm can be applied twice, once in a coarse abstraction (where the labeled subgraphs are rectangles), and once in a detailed model (where the labeled subgraphs are intervals). Using the result of the first algorithm to speed up the second one via goal-oriented techniques leads to considerably reduced running time. We illustrate this with the routing program BonnRoute on leading-edge industrial chips. Finally, we present computational results of BonnRoute obtained on real-world VLSI chips. BonnRoute fulfills all requirements of modern VLSI routing and has been used by IBM and its customers over many years to produce more than one thousand different chips. To demonstrate the strength of BonnRoute as a state-of-the-art industrial routing tool, we show that it performs excellently on all traditional quality measures such as wire length and number of vias, but also on further criteria of equal importance in the every-day work of the designer

Design for Manufacturability in Advanced Lithography Technologies

As the technology nodes keep shrinking following Moore\u27s law, lithography becomes increasingly critical to the fabrication of integrated circuits. The 193nm ArF immersion lithography (193i) has been a common technique for manufacturing integrated circuits. However, the 193i with single exposure has finally reached its printability limit at the 28nm technology node. To keep the pace of Moore\u27s law, design for manufacturability (DFM) is demonstrated to be effective and cost-efficient. The concept of DFM is to modify the design of integrated circuits in order to make them more manufacturable. Tremendous efforts have been made for DFM in advanced lithography technologies. In general, the progress can be summarized in four directions. (1) Advanced lithography process by novel patterning techniques and next-generation lithography; (2) High performance lithography simulation approach in mask synthesis; (3) Physical design (PD) methodology with lithography manufacturability awareness; (4) Robust design flow integrating emerging PD challenges. Accordingly, we propose our research topics in those directions. (1) Throughput optimization for self-aligned double patterning (SADP) and e-beam lithography based manufacturing of 1D layout; (2) Design of efficient rasterization algorithm for mask patterns in inverse lithography technology (ILT); (3) SADP-aware detailed routing; (4) SADP-aware detailed routing with consideration of double via insertion and via manufacturability; (5) Pin accessibility driven detailed placement refinement. In our first research work, we investigate throughput optimization of 1D layout manufacturing. SADP is a mature lithography technique to print 1D gridded layout for advanced technologies. However, in 16nm technology node, trim mask pattern in SADP lithography process may not be printable using 193i along within a single exposure. A viable solution is to complement SADP with e-beam lithography. To order to increase the throughput of 1D layout manufacturing, we consider the problem of e-beam shot minimization subject to bounded line-end extension constraints. Two different approaches of utilizing the trim mask and e-beam to print a 1D layout are considered. The first approach is trimming by end cutting, in which trim mask and e-beam are used to chop up parallel lines at required locations by small fixed rectangles. The second approach is trimming by gap removal, in which trim mask and e-beam are used to rid of all unnecessary portions. We propose elegant integer linear program formulations for both approaches. Experimental results show that both integer linear program formulations can be solved efficiently and have a major speedup compared with previous related work. Furthermore, the pros and cons of the two approaches for manufacturing 1D layout are discussed. In our second research work, we focus on a critical problem of lithography simulation in the design of ILT mask. To reduce the complexity of modern lithography simulation, a widely used approach is to first rasterize the ILT mask before it is inputted to the simulation tool. Accordingly, we propose a high performance rasterization algorithm. The algorithm is based on a pre-computed look-up table. Every pixel in the rasterized image is firstly identified its category: exception or non-exception. Then convolution for every pixel can be performed by a single or multiple look-up table queries depending on its category. In addition, the proposed algorithm has shift invariant property and can be applied for all-angle mask patterns in ILT. Experimental results demonstrate that our approach can speedup conventional rasterization process by almost 500x while maintaining small variations in critical dimension. In our third research work, we concentrate on SADP-aware detailed routing. SADP is a promising manufacturing option for sub-22nm technology nodes due to its good overlay control. To ensure layout is manufacturable by SADP, it is necessary to consider it during layout configuration, e.g., detailed routing stage. However, SADP process is not intuitive in terms of mask design, and considering it during detailed routing stage is even more challenging. We investigate both of two popular types of SADP: spacer-is-dielectric and spacer-is-metal. Different from previous works, we apply the color pre-assignment idea and propose an elegant graph model which captures both routing and SADP manufacturing cost. They greatly simplify the problem to maintain SADP design rules during detailed routing. A negotiated congestion based rip-up and reroute scheme is applied to achieve good routability while maintaining SADP design rules. Our approach can be extended to consider other multiple patterning lithography during detailed routing, e.g., self-aligned quadruple patterning targeted at sub-10nm technology nodes. Compared with state-of-the-art academic SADP-aware detailed routers, we offer routing solution with better quality of result. In our fourth research work, we extend our SADP-aware detailed routing to consider other manufacturing issues. Both SADP and triple patterning lithography (TPL) are potential layout manufacturing techniques in 10nm technology node. While metal layers can be printed by SADP, via layer manufacturing requires TPL. Previous works on SADP-aware detailed routing do not automatically guarantee via layer are manufacturable by TPL. We extend our SADP-aware detailed routing to consider TPL manufacturability of via layer. Double via insertion is an effective method to improve yield and reliability in integrated circuits manufacturing. We also consider it in our SADP-aware detailed routing to further improve insertion rate. A problem of TPL-aware double via insertion in the post routing stage is proposed. It is solved by both integer linear programming and high-performance heuristic. Experimental results demonstrate that our SADP-aware detailed routing can ensure via layer are TPL manufacturable and improve double via insertion rate. In our last research work, we target at the enhancement of pin access. The significant increased number of routing design rules in advanced technologies has made pin access an emerging difficultly in detailed routing. Resolving pin access in detailed routing may be too late due to the fix pin locations. Thus, we consider pin access in earlier design stage, i.e., detailed placement stage, when perturbation of cell placement is allowed. A cost function is proposed to model pin access for each pin-to-pin connection in detailed routing. A two-phase detailed placement refinement is performed to improve pin access, and refinement techniques are limited to cell flipping, same-row adjacent cell swap and cell shifting. The problem is solved by dynamic programming and linear programming. Experimental results demonstrate that the proposed detailed placement refinement improve pin access and reduce the number of unroutable nets in detailed routing significantly

Standard cell optimization and physical design in advanced technology nodes

Integrated circuits (ICs) are at the heart of modern electronics, which rely heavily on the state-of-the-art semiconductor manufacturing technology. The key to pushing forward semiconductor technology is IC feature-size miniaturization. However, this brings ever-increasing design complexities and manufacturing challenges to the $340 billion semiconductor industry. The manufacturing of two-dimensional layout on high-density metal layers depends on complex design-for-manufacturing techniques and sophisticated empirical optimizations, which introduces huge amounts of turnaround time and yield loss in advanced technology nodes. Our study reveals that unidirectional layout design can significantly reduce the manufacturing complexities and improve the yield, which is becoming increasingly adopted in semiconductor industry [61, 89]. The lithography printing of unidirectional layout can be tightly controlled using advanced patterning techniques, such as self-aligned double and quadruple patterning. Despite the manufacturing benefits, unidirectional layout leads to more restrictive solution space and brings significant impacts on the IC design automation ow for routing closure. Notably, unidirectional routing limits the standard cell pin accessibility, which further exacerbates the resource competitions during routing. Moreover, for post-routing optimization, traditional redundant-via insertion has become obsolete under unidirectional routing style, which makes the yield enhancement task extremely challenging. Regardless of complex multiple patterning and design-for-manufacturing approaches, mask optimization through resolution enhancement techniques remains as the key strategy to improve the yield of the semiconductor manufacturing processes. Among them, Sub-Resolution Assist Feature (SRAF) generation is a very important method to improve lithographic process windows. Model-based SRAF generation has been widely used to achieve high accuracy but it is time-consuming and hard to obtain consistent SRAFs. This dissertation proposes novel CAD algorithms and methodologies for standard cell optimization and physical design in advanced technology nodes, which ultimately reduces the design cycle and manufacturing cost of IC design. First, a standard cell pin access optimization engine is proposed to evaluate the pin accessibility of a given standard cell library. We further propose novel pin access planning techniques and concurrent pin access optimizations to efficiently resolve the routing resource competitions, which generates much better routing solutions than state-of-the-art, manufacturing-friendly routers. To systematically improve the manufacturing yield in the post-routing stage, a global optimization engine has been introduced for redundant local-loop insertion considering advanced manufacturing constraints. Finally, we propose the first machine learning-based framework for fast yet consistent SRAF generation with the high quality of results.Electrical and Computer Engineerin

Improved Physical Design for Manufacturing Awareness and Advanced VLSI

Increasing challenges arise with each new semiconductor technology node, especially in advanced nodes, where the industry tries to extract every ounce of benefit as it approaches the limits of physics, through manufacturing-aware design technology co-optimization and design-based equivalent scaling. The increasing complexity of design and process technologies, and ever-more complex design rules, also become hurdles for academic researchers, separating academic researchers from the most up-to-date technical issues.This thesis presents innovative methodologies and optimizations to address the above challenges. There are three directions in this thesis: (i) manufacturing-aware design technology co-optimization; (ii) advanced node design-based equivalent scaling; and (iii) an open source academic detailed routing flow.To realize manufacturing-aware design technology co-optimization, this thesis presents two works: (i) a multi-row detailed placement optimization for neighbor diffusion effect mitigation between neighboring standard cells; and (ii) a post-routing optimization to generate 2D block mask layout for dummy segment removal in self-aligned multiple patterning.To achieve advanced node design-based equivalent scaling, this thesis presents two improved physical design methodologies: (i) a post-placement flop tray generation approach for clock power reduction; and (ii) a detailed placement approach to exploit inter-row M1 routing for congestion and wirelength reduction.To address the increasing gap between academia and industry, this thesis presents two works toward an open source academic detailed routing flow: (i) a complete, robust, scalable and design ruleaware dynamic programming-based pin access analysis framework; and (ii) TritonRoute – the open source detailed router that is capable of delivering DRC-clean detailed routing solutions in advanced nodes.This thesis concludes with a summary of its contributions and open directions for future research

High-Performance Placement and Routing for the Nanometer Scale.

Modern semiconductor manufacturing facilitates single-chip electronic systems that only five years ago required ten to twenty chips. Naturally, design complexity has grown within this period. In contrast to this growth, it is becoming common in the industry to limit design team size which places a heavier burden on design automation tools. Our work identifies new objectives, constraints and concerns in the physical design of systems-on-chip, and develops new computational techniques to address them. In addition to faster and more relevant design optimizations, we demonstrate that traditional design flows based on ``separation of concerns'' produce unnecessarily suboptimal layouts. We develop new integrated optimizations that streamline traditional chains of loosely-linked design tools. In particular, we bridge the gap between mixed-size placement and routing by updating the objective of global and detail placement to a more accurate estimate of routed wirelength. To this we add sophisticated whitespace allocation, and the combination provides increased routability, faster routing, shorter routed wirelength, and the best via counts of published techniques. To further improve post-routing design metrics, we present new global routing techniques based on Discrete Lagrange Multipliers (DLM) which produce the best routed wirelength results on recent benchmarks. Our work culminates in the integration of our routing techniques within an incremental placement flow to improve detailed routing solutions, shrink die sizes and reduce total chip cost. Not only do our techniques improve the quality and cost of designs, but also simplify design automation software implementation in many cases. Ultimately, we reduce the time needed for design closure through improved tool fidelity and the use of our incremental techniques for placement and routing.Ph.D.Computer Science & EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/64639/1/royj_1.pd

Analog layout design automation: ILP-based analog routers

The shrinking design window and high parasitic sensitivity in the advanced technology have imposed special challenges on the analog and radio frequency (RF) integrated circuit design. In this thesis, we propose a new methodology to address such a deficiency based on integer linear programming (ILP) but without compromising the capability of handling any special constraints for the analog routing problems. Distinct from the conventional methods, our algorithm utilizes adaptive resolutions for various routing regions. For a more congested region, a routing grid with higher resolution is employed, whereas a lower-resolution grid is adopted to a less crowded routing region. Moreover, we strengthen its speciality in handling interconnect width control so as to route the electrical nets based on analog constraints while considering proper interconnect width to address the acute interconnect parasitics, mismatch minimization, and electromigration effects simultaneously. In addition, to tackle the performance degradation due to layout dependent effects (LDEs) and take advantage of optical proximity correction (OPC) for resolution enhancement of subwavelength lithography, in this thesis we have also proposed an innovative LDE-aware analog layout migration scheme, which is equipped with our special routing methodology. The LDE constraints are first identified with aid of a special sensitivity analysis and then satisfied during the layout migration process. Afterwards the electrical nets are routed by an extended OPC-inclusive ILP-based analog router to improve the final layout image fidelity while the routability and analog constraints are respected in the meantime. The experimental results demonstrate the effectiveness and efficiency of our proposed methods in terms of both circuit performance and image quality compared to the previous works

Design, Extraction, and Optimization Tool Flows and Methodologies for Homogeneous and Heterogeneous Multi-Chip 2.5D Systems

Chip and packaging industries are making significant progress in 2.5D design as a result of increasing popularity of their application. In advanced high-density 2.5D packages, package redistribution layers become similar to chip Back-End-of-Line routing layers, and the gap between them scales down with pin density improvement. Chiplet-package interactions become significant and severely affect system performance and reliability. Moreover, 2.5D integration offers opportunities to apply novel design techniques. The traditional die-by-die design approach neither carefully considers these interactions nor fully exploits the cross-boundary design opportunities. This thesis presents chiplet-package cross-boundary design, extraction, analysis, and optimization tool flows and methodologies for high-density 2.5D packaging technologies. A holistic flow is presented that can capture all parasitics from chiplets and the package and improve system performance through iterative optimizations. Several design techniques are demonstrated for agile development and quick turn-around time. To validate the flow in silicon, a chip was taped out and studied in TSMC 65nm technology. As the holistic flow cannot handle heterogeneous technologies, in-context flows are presented. Three different flavors of the in-context flow are presented, which offer trade-offs between scalability and accuracy in heterogeneous 2.5D system designs. Inductance is an inseparable part of a package design. A holistic flow is presented that takes package inductance into account in timing analysis and optimization steps. Custom CAD tools are developed to make these flows compatible with the industry standard tools and the foundry model. To prove the effectiveness of the flows several design cases of an ARM Cortex-M0 are implemented for comparitive study

Silicon Photonics Integrated Circuits for Flexible Optical Systems

This dissertation deals with the design and the characterization of novel reconfigurable silicon-on-insulator (SOI) devices to filter and route optical signals on-chip. Design is carried out through circuit simulations based on basic circuit elements (Building Blocks, BBs) in order to prove the feasibility of an approach allowing to move the design of Photonic Integrated Circuits (PICs) toward the system level. CMOS compatibility and large integration scale make SOI one of the most promising material to realize PICs. The concepts of generic foundry and BB based circuit simulations for the design are emerging as a solution to reduce the costs and increase the circuit complexity. To validate the BB based approach, the development of some of the most important BBs is performed first. A novel tunable coupler is also presented and it is demonstrated to be a valuable alternative to the known solutions. Two novel multi-element PICs are then analysed: a narrow linewidth single mode resonator and a passband filter with widely tunable bandwidth. Extensive circuit simulations are carried out to determine their performance, taking into account fabrication tolerances. The first PIC is based on two Grating Assisted Couplers in a ring resonator (RR) configuration. It is shown that a trade-off between performance, resonance bandwidth and device footprint has to be performed. The device could be employed to realize reconfigurable add-drop de/multiplexers. Sensitivity with respect to fabrication tolerances and spurious effects is however observed. The second PIC is based on an unbalanced Mach-Zehnder interferometer loaded with two RRs. Overall good performance and robustness to fabrication tolerances and nonlinear effects have confirmed its applicability for the realization of flexible optical systems. Simulated and measured devices behaviour is shown to be in agreement thus demonstrating the viability of a BB based approach to the design of complex PICs