Soldering interconnects through self-propagating reaction process

This thesis presents a research into the solder interconnects made through the reactive bonding process based on the self-propagating reaction. A numerical study of soldering conditions in the heat affected zone (HAZ) during bonding was initially carried out in order to understand the self-propagating reactive bonding and the related influencing factors. This was subsequently followed by an extensive experimental work to evaluate the feasibility and reliability of the reactive bonding process to enable the optimisation of processing parameters, which had provided a detailed understanding in terms of interfacial characteristics and bonding strengths. In addition, by focusing on the microstructure of the bonds resulted from the self-propagating reactions, the interfacial reactions and microstructural evolution of the bonded structures and effects of high-temperature aging were studied in details and discussed accordingly. To study the soldering conditions, a 3D time-dependent model is established to describe the temperature and stress field induced during self-propagating reactions. The transient temperature and stress distribution at the critical locations are identified. This thus allows the prediction of the melting status of solder alloys and the stress concentration points (weak points) in the bond under certain soldering conditions, e.g. ambient temperature, pressure, dimension and type of solder materials. Experimentally, the characterisation of interconnects bonded using various materials under different technical conditions is carried out. This ultimately assists the understanding of the feasibility, reliability and failure modes of reactive bonding technique, as well as the criteria and optimisation to form robust joints. The formation of phases such as intermetallic compounds (IMCs) and mechanism of interfacial reactions during reactive bonding and subsequent aging are elaborated. The composition, dimension, distribution of phases have been examined through cross-sectional observations. The underlying temperature and stress profile determining the diffusion, crystallization and growth of phases are defined by numerical predictions. XXI Through the comparative analysis of the experimental and numerical results, the unique phases developed in the self-propagating joints are attributed to the solid-liquid-convective diffusion, directional solidification and non-equilibrium crystallization. The recrystallization and growth of phases during aging are revealed to be resulted from the solid-state diffusion and equilibration induced by the high-temperature heating. In conclusion, the interfacial reactions and microstructural evolution of interconnect developed through self-propagating reactive bonding are studied and correlated with the related influencing factors that has been obtained from these predictions and experiments. The results and findings enable the extensive uses of self-propagating reactive bonding technology for new design and assembly capable of various applications in electronic packaging. It also greatly contributes to the fundamentals of the crystallization and soldering mechanism of materials under the non-equilibrium conditions

In situ imaging of microstructure formation in electronic interconnections

The development of microstructure during melting, reactive wetting and solidification of solder pastes on Cu-plated printed circuit boards has been studied by synchrotron radiography. Using Sn-3.0Ag-0.5Cu/Cu and Sn-0.7Cu/Cu as examples, we show that the interfacial Cu6Sn5 layer is present within 0.05 s of wetting, and explore the kinetics of flux void formation at the interface between the liquid and the Cu6Sn5 layer. Quantification of the nucleation locations and anisotropic growth kinetics of primary Cu6Sn5 crystals reveals a competition between the nucleation of Cu6Sn5 in the liquid versus growth of Cu6Sn5 from the existing Cu6Sn5 layer. Direct imaging confirms that the β-Sn nucleates at/near the Cu6Sn5 layer in Sn-3.0Ag-0.5Cu/Cu joints

MICROSTRUCTURAL CHARACTERIZATION AND THERMAL CYCLING RELIABILITY OF SOLDERS UNDER ISOTHERMAL AGING AND ELECTRICAL CURRENT

Solder joints on printed circuit boards provide electrical and mechanical connections between electronic devices and metallized patterns on boards. These solder joints are often the cause of failure in electronic packages. Solders age under storage and operational life conditions, which can include temperature, mechanical loads, and electrical current. Aging occurring at a constant temperature is called isothermal aging. Isothermal aging leads to coarsening of the bulk microstructure and increased interfacial intermetallic compounds at the solder-pad interface. The coarsening of the solder bulk degrades the creep properties of solders, whereas the voiding and brittleness of interfacial intermetallic compounds leads to mechanical weakness of the solder joint. Industry guidelines on solder interconnect reliability test methods recommend preconditioning the solder assemblies by isothermal aging before conducting reliability tests. The guidelines assume that isothermal aging simulates a "reasonable use period," but do not relate the isothermal aging levels with specific use conditions. Studies on the effect of isothermal aging on the thermal cycling reliability of tin-lead and tin-silver-copper solders are limited in scope, and results have been contradictory. The effect of electrical current on solder joints has been has mostly focused on current densities above 104A/cm2 with high ambient temperature (≥100oC), where electromigration, thermomigration, and Joule heating are the dominant failure mechanisms. The effect of current density below 104A/cm2 on temperature cycling fatigue of solders has not been established. This research provides the relation between isothermal aging and the thermal cycling reliability of select Sn-based solders. The Sn-based solders with 3%, 1%, and 0% silver content that have replaced tin-lead are studied and compared against tin-lead solder. The activation energy and growth exponents of the Arrhenius model for the intermetallic growth in the solders are provided. An aging metric to quantify the aging of solder joints, in terms of phase size in the solder bulk and interfacial intermetallic compound thickness at the solder-pad interface, is established. Based on the findings of thermal cycling tests on aged solder assemblies, recommendations are made for isothermal aging of solders before thermal cycling tests. Additionally, the effect of active electrical current at 103 A/cm2 on thermal cycling reliability is reported

Technology, science, and environtmental impact of a novel Cu-Ag core-shell solderless interconnect system

Tin-based solder is ubiquitous in microelectronics manufacturing and plays a critical role in electronic packaging and attachment. While manufacturers of consumer electronics have made the transition to the use of lead-free solder, there are still a variety of reliability issues associated with these lead-free alternatives, particularly for high performance, high reliability applications. Because of these performance short-comings, researchers are still searching for a material, an alloy, or a unique alternative that can meet the thermal, mechanical, and electrical requirements for conventional reflow solder applications. In an effort to produce a more reliable alternative, Kim et al. proposed the low-temperature (200°C) sintering of copper-silver core-shell particles as a viable solderless interconnect technology. This technology is based on the silver atoms from the shell diffusing by surface diffusion to form sintered necks between copper particles, and therefore dewetting most of the copper surfaces. This study presents a 3-fold, in-depth evaluation of this Cu-Ag core-shell lead-free solderless interconnect technology focusing on solder paste development and prototyping, silver thin film stress relaxation and dewetting kinetics, and the environmental impacts associated with this new technology. ^ First, an evaluation of the starting particle consistency and sintered compact mechanical properties determined that a specific core-shell particle geometry (1µm average core diameter and 10nm shell thickness) outperformed other combinations, exhibiting the highest modulus and yield strengths in sintered compacts, of 620 MPa and 40-60 MPa respectively. In particular, yield strengths for sintered compacts are similar to those reported for Sn-3.5Ag-0.75Cu (a commonly used lead-free solder) for the same strain rate. Following particle evaluations, the development of a functioning flux formulation was a key factor in the creation of a viable drop-in replacement. The processing of the final flux/particle paste combination was optimized at a commercial test facility for printing on test boards containing a wide variety of pad shapes, sizes, and pitches and thus, validated the ability of the Cu-Ag core-shell paste to be a drop-in replacement for traditional solder paste using conventional manufacturing techniques. ^ The second study addresses the fundamental mechanisms behind interconnect formation. An assessment of the kinetics and microstructure evolution during silver thin film dewetting and defect formation provides essential materials science knowledge to understand and control the functionality of the Cu-Ag core-shell system. From an interrupted annealing study used to quantify dewetting kinetics, a range of surface diffusion coefficients were calculated from the experimental results, assuming that surface diffusion controlled dewetting. The two order of magnitude range in calculated diffusion coefficient demonstrates that the diffusion-limited kinetic models traditionally used to quantify hillock and hole growth kinetics during thin film relaxation and dewetting do not apply to the dewetting of Ag films. The presence of interface-limited kinetics was then validated through the non-uniform growth of individual hillocks over time. ^ Lastly, an environmental assessment compares the impacts associated with the manufacturing and materials for the Cu-Ag core-shell particle system and SAC 305, the most commonly used lead-free solder alloy that contains 96.5% tin, 3% silver, and 0.5% copper. By comparing the impacts on global warming, acidification, eutrophication, ozone depletion, ecotoxicity, smog, carcinogenics, non-carcinogenics, and respiratory effects associated with each technology, the environmental advantages and disadvantages of each system are clearly communicated. By utilizing this information and the versatility of the core-shell system, possible methods for reducing impacts of the Cu-Ag core-shell system are addressed in order to reduce its environmental footprint. ^ This multidimensional assessment provides a comprehensive validation in terms of technology, science, and environmental impacts of the Cu-Ag core-shell interconnect technology as a viable drop-in replacement for lead-based and lead-free solders for microelectronic manufacturing

Microstructural and mechanical characteristics of micro-scale intermetallic compounds interconnections

Following the continually increasing demand for high-density interconnection and multilayer packaging for chips, solder bump size has decreased significantly over the years, this has led to some challenges in the reliability of interconnects. This thesis presents research into the resulting effects of miniaturization on the interconnection with Sn-solder, especially focusing on the full intermetallics (IMCs) micro-joints which appear in the 3D IC stacking packaging. Thereby, systematic studies have been conducted to study the microstructural evolution and reliability issues of Cu-Sn and Cu-Sn-Ni IMCs micro-joints. (1) Phenomenon of IMCs planar growth: The planar IMCs interlayer was asymmetric and composed of (Cu,Ni)6Sn5 mainly in Ni/Sn (2.5~5 µm)/Cu interconnect. Meanwhile, it was symmetric two-layer structure in Cu/Sn (2.5~5 µm)/Cu interconnect with the Cu3Sn fine grains underneath Cu6Sn5 cobblestone-shape-like grains for each IMCs layer. Besides, it is worth noticing that the appearance of Cu-rich whiskers (the mixture of Cu/Cu2O/SnOx/Cu6Sn5) could potentially lead to short-circuit in the cases of ultra-fine (<10 µm pitch) interconnects for the miniaturization of electronics devices. (2) Microstructural evolution process of Cu-Sn IMCs micro-joint: The simultaneous solidification of IMCs interlayer supressed the scalloped growth of Cu6Sn5 grains in Cu/Sn (2.5 µm)/Cu interconnect during the transient liquid phase (TLP) soldering process. The growth factor of Cu3Sn was in the range of 0.29~0.48 in Cu-Cu6Sn5 diffusion couple at 240~290 °C, which was impacted significantly by the type of substrates. And the subsequent homogenization process of Cu3Sn grains was found to be consistent with the description of flux-driven ripening (FDR) theory. Moreover, Kirkendall voids appeared only in the Cu3Sn layer adjacent to Cu-plated substrate, and this porous Cu3Sn micro-joint was mechanically robust during the shear test. (3) Microstructural evolution of Cu-Sn-Ni IMCs micro-joint: There was obvious inter-reaction between the interfacial reactions in Ni/Sn (1.5 µm)/Cu interconnect. The growth factor of (Cu,Ni)3Sn on Cu side was about 0.36 at 240 °C, and the reaction product on Ni side was changed from Ni3Sn4 into (Cu,Ni)6Sn5 with the increase of soldering temperature. In particular, the segregation of Ni atoms occurred along with phase transformation at 290 °C and thereby stabilized the (Cu,Ni)6Sn5 phase for the high Ni content of 20 at.%. (4) Micro-mechanical characteristics of Cu-Sn-Ni IMCs micro-joint: The Young s modulus and hardness of Cu-Sn-Ni IMCs were measured by nanoindentation test, such as 160.6±3.1 GPa/ 7.34±0.14 GPa for (Cu,Ni)6Sn5 and 183.7±4.0 GPa/ 7.38±0.46 GPa for (Cu,Ni)3Sn, respectively. Besides, in-situ nano-compression tests have been conducted on IMCs micro-cantilevers, the fracture strength turns out to be 2.46 GPa. And also, the ultimate tensile stress was calculated to be 2.3±0.7 GPa from in-situ micro-bending tests, which is not sensitive with the microstructural change of IMCs after dwelling at 290 °C

Multiscale microstructures and microstructural effects on the reliability of microbumps in three-dimensional integration

The dimensions of microbumps in three-dimensional integration reach microscopic scales and thus necessitate a study of the multiscale microstructures in microbumps. Here, we present simulated mesoscale and atomic-scale microstructures of microbumps using phase field and phase field crystal models. Coupled microstructure, mechanical stress, and electromigration modeling was performed to highlight the microstructural effects on the reliability of microbumps. The results suggest that the size and geometry of microbumps can influence both the mesoscale and atomic-scale microstructural formation during solidification. An external stress imposed on the microbump can cause ordered phase growth along the boundaries of the microbump. Mesoscale microstructures formed in the microbumps from solidification, solid state phase separation, and coarsening processes suggest that the microstructures in smaller microbumps are more heterogeneous. Due to the differences in microstructures, the von Mises stress distributions in microbumps of different sizes and geometries vary. In addition, a combined effect resulting from the connectivity of the phase morphology and the amount of interface present in the mesoscale microstructure can influence the electromigration reliability of microbumps

Multiscale microstructures and microstructural effects on the reliability of microbumps in three-dimensional integration

The dimensions of microbumps in three-dimensional integration reach microscopic scales and thus necessitate a study of the multiscale microstructures in microbumps. Here, we present simulated mesoscale and atomic-scale microstructures of microbumps using phase field and phase field crystal models. Coupled microstructure, mechanical stress, and electromigration modeling was performed to highlight the microstructural effects on the reliability of microbumps. The results suggest that the size and geometry of microbumps can influence both the mesoscale and atomic-scale microstructural formation during solidification. An external stress imposed on the microbump can cause ordered phase growth along the boundaries of the microbump. Mesoscale microstructures formed in the microbumps from solidification, solid state phase separation, and coarsening processes suggest that the microstructures in smaller microbumps are more heterogeneous. Due to the differences in microstructures, the von Mises stress distributions in microbumps of different sizes and geometries vary. In addition, a combined effect resulting from the connectivity of the phase morphology and the amount of interface present in the mesoscale microstructure can influence the electromigration reliability of microbumps