Design for Manufacturability in Advanced Lithography Technologies

As the technology nodes keep shrinking following Moore\u27s law, lithography becomes increasingly critical to the fabrication of integrated circuits. The 193nm ArF immersion lithography (193i) has been a common technique for manufacturing integrated circuits. However, the 193i with single exposure has finally reached its printability limit at the 28nm technology node. To keep the pace of Moore\u27s law, design for manufacturability (DFM) is demonstrated to be effective and cost-efficient. The concept of DFM is to modify the design of integrated circuits in order to make them more manufacturable. Tremendous efforts have been made for DFM in advanced lithography technologies. In general, the progress can be summarized in four directions. (1) Advanced lithography process by novel patterning techniques and next-generation lithography; (2) High performance lithography simulation approach in mask synthesis; (3) Physical design (PD) methodology with lithography manufacturability awareness; (4) Robust design flow integrating emerging PD challenges. Accordingly, we propose our research topics in those directions. (1) Throughput optimization for self-aligned double patterning (SADP) and e-beam lithography based manufacturing of 1D layout; (2) Design of efficient rasterization algorithm for mask patterns in inverse lithography technology (ILT); (3) SADP-aware detailed routing; (4) SADP-aware detailed routing with consideration of double via insertion and via manufacturability; (5) Pin accessibility driven detailed placement refinement. In our first research work, we investigate throughput optimization of 1D layout manufacturing. SADP is a mature lithography technique to print 1D gridded layout for advanced technologies. However, in 16nm technology node, trim mask pattern in SADP lithography process may not be printable using 193i along within a single exposure. A viable solution is to complement SADP with e-beam lithography. To order to increase the throughput of 1D layout manufacturing, we consider the problem of e-beam shot minimization subject to bounded line-end extension constraints. Two different approaches of utilizing the trim mask and e-beam to print a 1D layout are considered. The first approach is trimming by end cutting, in which trim mask and e-beam are used to chop up parallel lines at required locations by small fixed rectangles. The second approach is trimming by gap removal, in which trim mask and e-beam are used to rid of all unnecessary portions. We propose elegant integer linear program formulations for both approaches. Experimental results show that both integer linear program formulations can be solved efficiently and have a major speedup compared with previous related work. Furthermore, the pros and cons of the two approaches for manufacturing 1D layout are discussed. In our second research work, we focus on a critical problem of lithography simulation in the design of ILT mask. To reduce the complexity of modern lithography simulation, a widely used approach is to first rasterize the ILT mask before it is inputted to the simulation tool. Accordingly, we propose a high performance rasterization algorithm. The algorithm is based on a pre-computed look-up table. Every pixel in the rasterized image is firstly identified its category: exception or non-exception. Then convolution for every pixel can be performed by a single or multiple look-up table queries depending on its category. In addition, the proposed algorithm has shift invariant property and can be applied for all-angle mask patterns in ILT. Experimental results demonstrate that our approach can speedup conventional rasterization process by almost 500x while maintaining small variations in critical dimension. In our third research work, we concentrate on SADP-aware detailed routing. SADP is a promising manufacturing option for sub-22nm technology nodes due to its good overlay control. To ensure layout is manufacturable by SADP, it is necessary to consider it during layout configuration, e.g., detailed routing stage. However, SADP process is not intuitive in terms of mask design, and considering it during detailed routing stage is even more challenging. We investigate both of two popular types of SADP: spacer-is-dielectric and spacer-is-metal. Different from previous works, we apply the color pre-assignment idea and propose an elegant graph model which captures both routing and SADP manufacturing cost. They greatly simplify the problem to maintain SADP design rules during detailed routing. A negotiated congestion based rip-up and reroute scheme is applied to achieve good routability while maintaining SADP design rules. Our approach can be extended to consider other multiple patterning lithography during detailed routing, e.g., self-aligned quadruple patterning targeted at sub-10nm technology nodes. Compared with state-of-the-art academic SADP-aware detailed routers, we offer routing solution with better quality of result. In our fourth research work, we extend our SADP-aware detailed routing to consider other manufacturing issues. Both SADP and triple patterning lithography (TPL) are potential layout manufacturing techniques in 10nm technology node. While metal layers can be printed by SADP, via layer manufacturing requires TPL. Previous works on SADP-aware detailed routing do not automatically guarantee via layer are manufacturable by TPL. We extend our SADP-aware detailed routing to consider TPL manufacturability of via layer. Double via insertion is an effective method to improve yield and reliability in integrated circuits manufacturing. We also consider it in our SADP-aware detailed routing to further improve insertion rate. A problem of TPL-aware double via insertion in the post routing stage is proposed. It is solved by both integer linear programming and high-performance heuristic. Experimental results demonstrate that our SADP-aware detailed routing can ensure via layer are TPL manufacturable and improve double via insertion rate. In our last research work, we target at the enhancement of pin access. The significant increased number of routing design rules in advanced technologies has made pin access an emerging difficultly in detailed routing. Resolving pin access in detailed routing may be too late due to the fix pin locations. Thus, we consider pin access in earlier design stage, i.e., detailed placement stage, when perturbation of cell placement is allowed. A cost function is proposed to model pin access for each pin-to-pin connection in detailed routing. A two-phase detailed placement refinement is performed to improve pin access, and refinement techniques are limited to cell flipping, same-row adjacent cell swap and cell shifting. The problem is solved by dynamic programming and linear programming. Experimental results demonstrate that the proposed detailed placement refinement improve pin access and reduce the number of unroutable nets in detailed routing significantly

Algorithmic techniques for nanometer VLSI design and manufacturing closure

As Very Large Scale Integration (VLSI) technology moves to the nanoscale regime, design and manufacturing closure becomes very difficult to achieve due to increasing chip and power density. Imperfections due to process, voltage and temperature variations aggravate the problem. Uncertainty in electrical characteristic of individual device and wire may cause significant performance deviations or even functional failures. These impose tremendous challenges to the continuation of Moore's law as well as the growth of semiconductor industry. Efforts are needed in both deterministic design stage and variation-aware design stage. This research proposes various innovative algorithms to address both stages for obtaining a design with high frequency, low power and high robustness. For deterministic optimizations, new buffer insertion and gate sizing techniques are proposed. For variation-aware optimizations, new lithography-driven and post-silicon tuning-driven design techniques are proposed. For buffer insertion, a new slew buffering formulation is presented and is proved to be NP-hard. Despite this, a highly efficient algorithm which runs > 90x faster than the best alternatives is proposed. The algorithm is also extended to handle continuous buffer locations and blockages. For gate sizing, a new algorithm is proposed to handle discrete gate library in contrast to unrealistic continuous gate library assumed by most existing algorithms. Our approach is a continuous solution guided dynamic programming approach, which integrates the high solution quality of dynamic programming with the short runtime of rounding continuous solution. For lithography-driven optimization, the problem of cell placement considering manufacturability is studied. Three algorithms are proposed to handle cell flipping and relocation. They are based on dynamic programming and graph theoretic approaches, and can provide different tradeoff between variation reduction and wire- length increase. For post-silicon tuning-driven optimization, the problem of unified adaptivity optimization on logical and clock signal tuning is studied, which enables us to significantly save resources. The new algorithm is based on a novel linear programming formulation which is solved by an advanced robust linear programming technique. The continuous solution is then discretized using binary search accelerated dynamic programming, batch based optimization, and Latin Hypercube sampling based fast simulation

Manufacturability Aware Design.

The aim of this work is to provide solutions that optimize the tradeoffs among design, manufacturability, and cost of ownership posed by technology scaling and sub-wavelength lithography. These solutions may take the form of robust circuit designs, cost-effective resolution technologies, accurate modeling considering process variations, and design rules assessment. We first establish a framework for assessing the impact of process variation on circuit performance, product value and return on investment on alternative processes. Key features include comprehensive modeling and different handling on die-to-die and within-die variation, accurate models of correlations of variation, realistic and quantified projection to future process nodes, and performance sensitivity analysis to improved control of individual device parameter and variation sources. Then we describe a novel minimum cost of correction methodology which determines the level of correction of each layout feature such that the prescribed parametric yield is attained with minimum RET (Resolution Enhancement Technology) cost. This timing driven OPC (Optical Proximity Correction) insertion flow uses a mathematical programming based slack budgeting algorithm to determine OPC level for all polysilicon gate geometries. Designs adopting this methodology show up to 20% MEBES (Manufacturing Electron Beam Exposure System) data volume reduction and 39% OPC runtime improvement. When the systematic correction residual errors become unavoidable, we analyze their impact on a state-of-art microprocessor's speedpath skew. A platform is created for diagnosing and improving OPC quality on gates with specific functionality such as critical gates or matching transistors. Significant changes in full-chip timing analysis indicate the necessity of a post-OPC performance verification design flow. Finally, we quantify the performance, manufacturability and mask cost impact of globally applying several common restrictive design rules. Novel approaches such as locally adapting FDRs (flexible design rules) based on image parameters range, and DRC Plus (preferred design rule enforcement with 2D pattern matching) are also described.Ph.D.Electrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/57676/2/jiey_1.pd

Algorithmic techniques for physical design : macro placement and under-the-cell routing

With the increase of chip component density and new manufacturability constraints imposed by modern technology nodes, the role of algorithms for electronic design automation is key to the successful implementation of integrated circuits. Two of the critical steps in the physical design flows are macro placement and ensuring all design rules are honored after timing closure. This thesis proposes contributions to help in these stages, easing time-consuming manual steps and helping physical design engineers to obtain better layouts in reduced turnaround time. The first contribution is under-the-cell routing, a proposal to systematically connect standard cell components via lateral pins in the lower metal layers. The aim is to reduce congestion in the upper metal layers caused by extra metal and vias, decreasing the number of design rule violations. To allow cells to connect by abutment, a standard cell library is enriched with instances containing lateral pins in a pre-selected sharing track. Algorithms are proposed to maximize the numbers of connections via lateral connection by mapping placed cell instances to layouts with lateral pins, and proposing local placement modifications to increase the opportunities for such connections. Experimental results show a significant decrease in the number of pins, vias, and in number of design rule violations, with negligible impact on wirelength and timing. The second contribution, done in collaboration with eSilicon (a leading ASIC design company), is the creation of HiDaP, a macro placement tool for modern industrial designs. The proposed approach follows a multilevel scheme to floorplan hierarchical blocks, composed of macros and standard cells. By exploiting RTL information available in the netlist, the dataflow affinity between these blocks is modeled and minimized to find a macro placement with good wirelength and timing properties. The approach is further extended to allow additional engineer input, such as preferred macro locations, and also spectral and force methods to guide the floorplanning search. Experimental results show that the layouts generated by HiDaP outperforms those obtained by a state-of-the-art EDA physical design software, with similar wirelength and better timing when compared to manually designed tape-out ready macro placements. Layouts obtained by HiDaP have successfully been brought to near timing closure with one to two rounds of small modifications by physical design engineers. HiDaP has been fully integrated in the design flows of the company and its development remains an ongoing effort.A causa de l'increment de la densitat de components en els xip i les noves restriccions de disseny imposades pels últims nodes de fabricació, el rol de l'algorísmia en l'automatització del disseny electrònic ha esdevingut clau per poder implementar circuits integrats. Dos dels passos crucials en el procés de disseny físic és el placement de macros i assegurar la correcció de les regles de disseny un cop les restriccions de timing del circuit són satisfetes. Aquesta tesi proposa contribucions per ajudar en aquests dos reptes, facilitant laboriosos passos manuals en el procés i ajudant als enginyers de disseny físic a obtenir millors resultats en menys temps. La primera contribució és el routing "under-the-cell", una proposta per connectar cel·les estàndard usant pins laterals en les capes de metall inferior de manera sistemàtica. L'objectiu és reduir la congestió en les capes de metall superior causades per l'ús de metall i vies, i així disminuir el nombre de violacions de regles de disseny. Per permetre la connexió lateral de cel·les, estenem una llibreria de cel·les estàndard amb dissenys que incorporen connexions laterals. També proposem modificacions locals al placement per permetre explotar aquest tipus de connexions més sovint. Els resultats experimentals mostren una reducció significativa en el nombre de pins, vies i nombre de violacions de regles de disseny, amb un impacte negligible en wirelength i timing. La segona contribució, desenvolupada en col·laboració amb eSilicon (una empresa capdavantera en disseny ASIC), és el desenvolupament de HiDaP, una eina de macro placement per a dissenys industrials actuals. La proposta segueix un procés multinivell per fer el floorplan de blocks jeràrquics, formats per macros i cel·les estàndard. Mitjançant la informació RTL disponible en la netlist, l'afinitat de dataflow entre els mòduls es modela i minimitza per trobar macro placements amb bones propietats de wirelength i timing. La proposta també incorpora la possibilitat de rebre input addicional de l'enginyer, com ara suggeriments de les posicions de les macros. Finalment, també usa mètodes espectrals i de forçes per guiar la cerca de floorplans. Els resultats experimentals mostren que els dissenys generats amb HiDaP són millors que els obtinguts per eines comercials capdavanteres de EDA. Els resultats també mostren que els dissenys presentats poden obtenir un wirelength similar i millor timing que macro placements obtinguts manualment, usats per fabricació. Alguns dissenys obtinguts per HiDaP s'han dut fins a timing-closure en una o dues rondes de modificacions incrementals per part d'enginyers de disseny físic. L'eina s'ha integrat en el procés de disseny de eSilicon i el seu desenvolupament continua més enllà de les aportacions a aquesta tesi.Postprint (published version

Algorithmic techniques for physical design : macro placement and under-the-cell routing

With the increase of chip component density and new manufacturability constraints imposed by modern technology nodes, the role of algorithms for electronic design automation is key to the successful implementation of integrated circuits. Two of the critical steps in the physical design flows are macro placement and ensuring all design rules are honored after timing closure. This thesis proposes contributions to help in these stages, easing time-consuming manual steps and helping physical design engineers to obtain better layouts in reduced turnaround time. The first contribution is under-the-cell routing, a proposal to systematically connect standard cell components via lateral pins in the lower metal layers. The aim is to reduce congestion in the upper metal layers caused by extra metal and vias, decreasing the number of design rule violations. To allow cells to connect by abutment, a standard cell library is enriched with instances containing lateral pins in a pre-selected sharing track. Algorithms are proposed to maximize the numbers of connections via lateral connection by mapping placed cell instances to layouts with lateral pins, and proposing local placement modifications to increase the opportunities for such connections. Experimental results show a significant decrease in the number of pins, vias, and in number of design rule violations, with negligible impact on wirelength and timing. The second contribution, done in collaboration with eSilicon (a leading ASIC design company), is the creation of HiDaP, a macro placement tool for modern industrial designs. The proposed approach follows a multilevel scheme to floorplan hierarchical blocks, composed of macros and standard cells. By exploiting RTL information available in the netlist, the dataflow affinity between these blocks is modeled and minimized to find a macro placement with good wirelength and timing properties. The approach is further extended to allow additional engineer input, such as preferred macro locations, and also spectral and force methods to guide the floorplanning search. Experimental results show that the layouts generated by HiDaP outperforms those obtained by a state-of-the-art EDA physical design software, with similar wirelength and better timing when compared to manually designed tape-out ready macro placements. Layouts obtained by HiDaP have successfully been brought to near timing closure with one to two rounds of small modifications by physical design engineers. HiDaP has been fully integrated in the design flows of the company and its development remains an ongoing effort.A causa de l'increment de la densitat de components en els xip i les noves restriccions de disseny imposades pels últims nodes de fabricació, el rol de l'algorísmia en l'automatització del disseny electrònic ha esdevingut clau per poder implementar circuits integrats. Dos dels passos crucials en el procés de disseny físic és el placement de macros i assegurar la correcció de les regles de disseny un cop les restriccions de timing del circuit són satisfetes. Aquesta tesi proposa contribucions per ajudar en aquests dos reptes, facilitant laboriosos passos manuals en el procés i ajudant als enginyers de disseny físic a obtenir millors resultats en menys temps. La primera contribució és el routing "under-the-cell", una proposta per connectar cel·les estàndard usant pins laterals en les capes de metall inferior de manera sistemàtica. L'objectiu és reduir la congestió en les capes de metall superior causades per l'ús de metall i vies, i així disminuir el nombre de violacions de regles de disseny. Per permetre la connexió lateral de cel·les, estenem una llibreria de cel·les estàndard amb dissenys que incorporen connexions laterals. També proposem modificacions locals al placement per permetre explotar aquest tipus de connexions més sovint. Els resultats experimentals mostren una reducció significativa en el nombre de pins, vies i nombre de violacions de regles de disseny, amb un impacte negligible en wirelength i timing. La segona contribució, desenvolupada en col·laboració amb eSilicon (una empresa capdavantera en disseny ASIC), és el desenvolupament de HiDaP, una eina de macro placement per a dissenys industrials actuals. La proposta segueix un procés multinivell per fer el floorplan de blocks jeràrquics, formats per macros i cel·les estàndard. Mitjançant la informació RTL disponible en la netlist, l'afinitat de dataflow entre els mòduls es modela i minimitza per trobar macro placements amb bones propietats de wirelength i timing. La proposta també incorpora la possibilitat de rebre input addicional de l'enginyer, com ara suggeriments de les posicions de les macros. Finalment, també usa mètodes espectrals i de forçes per guiar la cerca de floorplans. Els resultats experimentals mostren que els dissenys generats amb HiDaP són millors que els obtinguts per eines comercials capdavanteres de EDA. Els resultats també mostren que els dissenys presentats poden obtenir un wirelength similar i millor timing que macro placements obtinguts manualment, usats per fabricació. Alguns dissenys obtinguts per HiDaP s'han dut fins a timing-closure en una o dues rondes de modificacions incrementals per part d'enginyers de disseny físic. L'eina s'ha integrat en el procés de disseny de eSilicon i el seu desenvolupament continua més enllà de les aportacions a aquesta tesi

Layout regularity metric as a fast indicator of process variations

Integrated circuits design faces increasing challenge as we scale down due to the increase of the effect of sensitivity to process variations. Systematic variations induced by different steps in the lithography process affect both parametric and functional yields of the designs. These variations are known, themselves, to be affected by layout topologies. Design for Manufacturability (DFM) aims at defining techniques that mitigate variations and improve yield. Layout regularity is one of the trending techniques suggested by DFM to mitigate process variations effect. There are several solutions to create regular designs, like restricted design rules and regular fabrics. These regular solutions raised the need for a regularity metric. Metrics in literature are insufficient for different reasons; either because they are qualitative or computationally intensive. Furthermore, there is no study relating either lithography or electrical variations to layout regularity. In this work, layout regularity is studied in details and a new geometrical-based layout regularity metric is derived. This metric is verified against lithographic simulations and shows good correlation. Calculation of the metric takes only few minutes on 1mm x 1mm design, which is considered fast compared to the time taken by simulations. This makes it a good candidate for pre-processing the layout data and selecting certain areas of interest for lithographic simulations for faster throughput. The layout regularity metric is also compared against a model that measures electrical variations due to systematic lithographic variations. The validity of using the regularity metric to flag circuits that have high variability using the developed electrical variations model is shown. The regularity metric results compared to the electrical variability model results show matching percentage that can reach 80%, which means that this metric can be used as a fast indicator of designs more susceptible to lithography and hence electrical variations

Layout Decomposition for Quadruple Patterning Lithography and Beyond

For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we propose a generic and robust layout decomposition framework for QPL, which can be further extended to handle any general K-patterning lithography (K$>$4). Our framework is based on the semidefinite programming (SDP) formulation with novel coloring encoding. Meanwhile, we propose fast yet effective coloring assignment and achieve significant speedup. To our best knowledge, this is the first work on the general multiple patterning lithography layout decomposition.Comment: DAC'201

Analog layout design automation: ILP-based analog routers

The shrinking design window and high parasitic sensitivity in the advanced technology have imposed special challenges on the analog and radio frequency (RF) integrated circuit design. In this thesis, we propose a new methodology to address such a deficiency based on integer linear programming (ILP) but without compromising the capability of handling any special constraints for the analog routing problems. Distinct from the conventional methods, our algorithm utilizes adaptive resolutions for various routing regions. For a more congested region, a routing grid with higher resolution is employed, whereas a lower-resolution grid is adopted to a less crowded routing region. Moreover, we strengthen its speciality in handling interconnect width control so as to route the electrical nets based on analog constraints while considering proper interconnect width to address the acute interconnect parasitics, mismatch minimization, and electromigration effects simultaneously. In addition, to tackle the performance degradation due to layout dependent effects (LDEs) and take advantage of optical proximity correction (OPC) for resolution enhancement of subwavelength lithography, in this thesis we have also proposed an innovative LDE-aware analog layout migration scheme, which is equipped with our special routing methodology. The LDE constraints are first identified with aid of a special sensitivity analysis and then satisfied during the layout migration process. Afterwards the electrical nets are routed by an extended OPC-inclusive ILP-based analog router to improve the final layout image fidelity while the routability and analog constraints are respected in the meantime. The experimental results demonstrate the effectiveness and efficiency of our proposed methods in terms of both circuit performance and image quality compared to the previous works