Nanowire Volatile RAM as an Alternative to SRAM

Maintaining benefits of CMOS technology scaling is becoming challenging due to increased manufacturing complexities and unwanted passive power dissipations. This is particularly challenging in SRAM, where manufacturing precision and leakage power control are critical issues. To alleviate some of these challenges a novel non-volatile memory alternative to SRAM was proposed called nanowire volatile RAM (NWRAM). Due to NWRAMs regular grid based layout and innovative circuit style, manufacturing complexity is reduced and at the same time considerable benefits are attained in terms of performance and leakage power reduction. In this paper, we elaborate more on NWRAM circuit aspects and manufacturability, and quantify benefits at 16nm technology node through simulation against state-of-the-art 6T-SRAM and gridded 8T-SRAM designs. Our results show the 10T-NWRAM to be 2x faster and 35x better in terms of leakage when compared to high performance gridded 8T-SRAM design

Reconfigurable negative bit line collapsed supply write-assist for 9T-ST static random access memory cell

This paper presents a reconfigurable negative bit line collapsed supply (RNBLCS) write driver circuit for the 9T Schmitt trigger-based static random-access memory (SRAM) cell (9T-ST), significantly improving write performance for real-time memory applications. In deep sub-micron technology, increasing device parameter deviations significantly reduce SRAM cells' write-ability. The proposed RNBLCS write-assist driver for 9T-ST SRAM cell has 0.84×, 0.48×, 0.27× optimized write access delay and 1.05×, 1.08×, 1.19× improvement in write static noise margin (WSNM), 1.05×, 1.13×, and 1.39× improvement in write margin (WM), 0.96×, 0.89× and 0.72× minimum write trip-point (WTP) from transient-negative bit line (Tran-NBL), capacitive charge sharing (CCS), and conventional write circuits respectively. The proposed RNBLCS is functionally verified using a synopsys custom compiler with a 16 nm BSIM4 model card for bulk complementary metal-oxide semiconductor (CMOS)

-Memory Computing Based Reliable and High Speed Schmitt trigger 10T SRAM cell design

Static random access memories (SRAM) are useful building blocks in various applications, including cache memories, integrated data storage systems, and microprocessors. The von Neumann bottleneck difficulties are solved by in-memory computing. It eliminates unnecessary frequent data transfer between memory and processing units simultaneously. In this research, the replica-based 10T SRAM design for in-memory computing (IMC) is designed by adapting the word line control scheme in 14nm CMOS technology. In order to achieve high reading and writing capability, the Schmitt trigger inverter was used for energy-saving and stable use. To speed up the writing process of the design, a single transistor is inserted between the cross-coupled inverters. In addition, to increase the node capacity, the voltage boosting circuitry is emphasized. The adaptive word line control scheme was utilized by integrating the replica column based circuit. The Replica approach regulates signal flow through the core by using a dummy column and a dummy row in RAM. To demonstrate the viability of the suggested design, the simulated outcomes are contrasted with those of existing designs. The various performance metrics examined are Read Static Noise Margin (RSNM), Write (WSNM), Hold (HSNM), Read Access Delay (RAD), Write Access Delay (WAD), Read performance and Write performance the varying supply voltage is evaluated

Design of a Low Power SRAM Cell by Tanner Tool 45 NM

The absorption of power & SRAM’s speed are major concern which followed several designs in accordance to the minimal absorption of power. The main concern of this document is on decadence of power while operation of Write is executed in 6-T CMOS SRAM also while operation of read as well. In this paper, an extra transistor is invaded in cell of SRAMs which will be regulate total capacitance while execution of read & write operations & also optimize the capacitance so eventually leads to bring down decadence in power. In this document we mainly focus on decadence of power during short circuits also the fluctuating decadence of power which can also be termed as power which is dynamic. The tool of Tanner is deployed to evaluate the circuitry, the schema of cell of SRAM is formulated on S Edit & simulation of net list is furnished by making use of T Spice & also assessment of waveforms is done by W Edit. The characterization of circuitry is done by making use of technology of 45 nm which furnish a voltage of 1.2V. The outcomes are put in contrast to traditional 6T SRAM & 7T SRAM which also characterizes the same in this document. Also we implement a cell with less power that is comprised of an additional transistor & also the gate of that transistor will regulate the operations of write & read of information when we implement function of write operation, that additional transistor will execute function of write & additional transistor will shorten the section in ground & Vdd & save the power

A fully integrated SRAM-based CMOS arbitrary waveform generator for analog signal processing

This dissertation focuses on design and implementation of a fully-integrated SRAM-based arbitrary waveform generator for analog signal processing applications in a CMOS technology. The dissertation consists of two parts: Firstly, a fully-integrated arbitrary waveform generator for a multi-resolution spectrum sensing of a cognitive radio applications, and an analog matched-filter for a radar application and secondly, low-power techniques for an arbitrary waveform generator. The fully-integrated low-power AWG is implemented and measured in a 0.18-¥ìm CMOS technology. Theoretical analysis is performed, and the perspective implementation issues are mentioned comparing the measurement results. Moreover, the low-power techniques of SRAM are addressed for the analog signal processing: Self-deactivated data-transition bit scheme, diode-connected low-swing signaling scheme with a short-current reduction buffer, and charge-recycling with a push-pull level converter for power reduction of asynchronous design. Especially, the robust latch-type sense amplifier using an adaptive-latch resistance and fully-gated ground 10T-SRAM bitcell in a 45-nm SOI technology would be used as a technique to overcome the challenges in the upcoming deep-submicron technologies.Ph.D.Committee Chair: Kim, Jongman; Committee Member: Kang, Sung Ha; Committee Member: Lee, Chang-Ho; Committee Member: Mukhopadhyay, Saibal; Committee Member: Tentzeris, Emmanouil

Ultra-low Power FinFET SRAM Cell with improved stability suitable for low power applications

In this paper, a new 11T SRAM cell using FinFET technology has been proposed, the basic component of the cell is the 6T SRAM cell with 4 NMOS access transistors to improve the stability and also makes it a dual port memory cell. The proposed cell uses a header scheme in which one extra PMOS transistor is used which is biased at different voltages to improve the read and write stability thus, helps in reducing the leakage power and active power. The cell shows improvement in RSNM (Read Static Noise Margin) with LP8T by 2.39x at sub-threshold voltage 2.68x with D6T SRAM cell, 5.5x with TG8T. The WSNM (Write Static Noise Margin) and HM (Hold Margin) of the SRAM cell at 0.9V is 306mV and 384mV. At sub-threshold operation also it shows improvement. The Leakage power reduced by 0.125x with LP8T, 0.022x with D6T SRAM cell, TG8T and SE8T. Also, impact of process variation on cell stability is discussed

Supply Voltage Dependence of Heavy Ion Induced SEEs on 65nm CMOS Bulk SRAMs

The power consumption of Static Random Access Memory (SRAM) has become an important issue for modern integrated circuit design, considering the fact that they occupy large area and consume significant portion of power consumption in modern nanometer chips. SRAM operating in low power supply voltages has become an effective approach in reducing power consumption. Therefore, it is essential to experimentally characterize the single event effects (SEE) of hardened and unhardened SRAM cells to determine their appropriate applications, especially when a low supply voltage is preferred. In this thesis, a SRAM test chip was designed and fabricated with four cell arrays sharing the same peripheral circuits, including two types of unhardened cells (standard 6T and sub-threshold 10T) and two types of hardened cells (Quatro and DICE). The systems for functional and radiation tests were built up with power supply voltages that ranged from near threshold 0.4 V to normal supply 1 V. The test chip was irradiated with alpha particles and heavy ions with various linear energy transfers (LETs) at different core supply voltages, ranging from 1 V to 0.4 V. Experimental results of the alpha test and heavy ion test were consistent with the results of the simulation. The cross sections of 6T and 10T cells present much more significant sensitivities than Quatro and DICE cells for all tested supply voltages and LET. The 10T cell demonstrates a more optimal radiation performance than the 6T cell when LET is small (0.44 MeV·cm2/mg), yet no significant advantage is evident when LET is larger than this. In regards to the Quatro and DICE cells, one does not consistently show superior performance over the other in terms of soft error rates (SERs). Multi-bit upsets (MBUs) occupy a larger portion of total SEUs in DICE cell when relatively larger LET and smaller supply voltage are applied. It explains the loss in radiation tolerance competition with Quatro cell when LET is bigger than 9.1 MeV·cm2/mg and supply voltage is smaller than 0.6 V. In addition, the analysis of test results also demonstrated that the error amount distributions follow a Poisson distribution very well for each type of cell array

Single Event Effect Hardening Designs in 65nm CMOS Bulk Technology

Radiation from terrestrial and space environments is a great danger to integrated circuits (ICs). A single particle from a radiation environment strikes semiconductor materials resulting in voltage and current perturbation, where errors are induced. This phenomenon is termed a Single Event Effect (SEE). With the shrinking of transistor size, charge sharing between adjacent devices leads to less effectiveness of current radiation hardening methods. Improving fault-tolerance of storage cells and logic gates in advanced technologies becomes urgent and important. A new Single Event Upset (SEU) tolerant latch is proposed based on a previous hardened Quatro design. Soft error analysis tools are used and results show that the critical charge of the proposed design is approximately 2 times higher than that of the reference design with negligible penalty in area, delay, and power consumption. A test chip containing the proposed flip-flop chains was designed and exposed to alpha particles as well as heavy ions. Radiation experimental results indicate that the soft error rates of the proposed design are greatly reduced when Linear Energy Transfer (LET) is lower than 4, which makes it a suitable candidate for ground-level high reliability applications. To improve radiation tolerance of combinational circuits, two combinational logic gates are proposed. One is a layout-based hardening Cascode Voltage Switch Logic (CVSL) and the other is a fault-tolerant differential dynamic logic. Results from a SEE simulation tool indicate that the proposed CVSL has a higher critical charge, less cross section, and shorter Single Event Transient (SET) pulses when compared with reference designs. Simulation results also reveal that the proposed differential dynamic logic significantly reduces the SEU rate compared to traditional dynamic logic, and has a higher critical charge and shorter SET pulses than reference hardened design

A Novel variation-tolerant 9T SRAM design for nanoscale CMOS

As the feature sizes decrease, understanding manufacturing variations becomes essential to effectively design robust circuits. Manufacturing variations occur when process parameters deviate from their ideal or expected values, resulting in variations in device characteristics. Variations in the device characteristics cause the circuit to deviate from its expected behavior resulting in circuit instability, performance degradation, and yield loss. Both from an economic and performance standpoint, the yield and performance of Static Random Access Memories (SRAMs) are of great importance to the modern System-on-Chip designs. SRAM bitcells typically employ well-matched, minimum-sized transistors which make them highly sensitive to process variations. To overcome these challenges, researchers have proposed different topologies for SRAMs with 8T and 10T SRAM designs. These designs improve the cell stability but suffer from bitline-leakage noise, placing constraints on the number of cells shared by each bitline. These designs also have substantial area overhead when compared to the traditional 6T design. In this work, the published SRAM designs are characterized using commercial CMOS 65 nm models and are compared based on critical SRAM parameters like read stability, write stability, bitline leakage and the impact of process variations. Furthermore, a single-ended 9T SRAM design is proposed that enhances data stability and simultaneously addresses the bitline leakage problem. The proposed design also satisfies the yield criterion to achieve 90% yield for a 1Mb SRAM array in the presence of process variations