Hot-carrier reliability assessment in CMOS digital integrated circuits

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998.Includes bibliographical references.by Wenjie Jiang.Ph.D

Characterization of hot-carrier reliability in analog sub-circuit design

Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996.Includes bibliographical references (leaves 52-54).by Huy X.P. Le.M.Eng

DEEP SUBMICRON CMOS VLSI CIRCUIT RELIABILITY MODELING, SIMULATION AND DESIGN

CMOS VLSI circuit reliability modeling and simulation have attracted intense research interest in the last two decades, and as a result almost all IC Design For Reliability (DFR) tools now try to incrementally simulate device wearout mechanisms in iterative ways. These DFR tools are capable of accurately characterizing the device wearout process and predicting its impact on circuit performance. Nevertheless, excessive simulation time and tedious parameter testing process often limit popularity of these tools in product design and fabrication. This work develops a new SPICE reliability simulation method that shifts the focus of reliability analysis from device wearout to circuit functionality. A set of accelerated lifetime models and failure equivalent circuit models are proposed for the most common MOSFET intrinsic wearout mechanisms, including Hot Carrier Injection (HCI), Time Dependent Dielectric Breakdown (TDDB), and Negative Bias Temperature Instability (NBTI). The accelerated lifetime models help to identify the most degraded transistors in a circuit in terms of the device's terminal voltage and current waveforms. Then corresponding failure equivalent circuit models are incorporated into the circuit to substitute these identified transistors. Finally, SPICE simulation is performed again to check circuit functionality and analyze the impact of device wearout on circuit operation. Device wearout effects are lumped into a very limited number of failure equivalent circuit model parameters, and circuit performance degradation and functionality are determined by the magnitude of these parameters. In this new method, it is unnecessary to perform a large number of small-step SPICE simulation iterations. Therefore, simulation time is obviously shortened in comparison to other tools. In addition, a reduced set of failure equivalent circuit model parameters, rather than a large number of device SPICE model parameters, need to be accurately characterized at each interim wearout process. Thus device testing and parameter extraction work are also significantly simplified. These advantages will allow circuit designers to perform quick and efficient circuit reliability analyses and to develop practical guidelines for reliable electronic designs

NEGATIVE BIAS TEMPERATURE INSTABILITY STUDIES FOR ANALOG SOC CIRCUITS

Negative Bias Temperature Instability (NBTI) is one of the recent reliability issues in sub threshold CMOS circuits. NBTI effect on analog circuits, which require matched device pairs and mismatches, will cause circuit failure. This work is to assess the NBTI effect considering the voltage and the temperature variations. It also provides a working knowledge of NBTI awareness to the circuit design community for reliable design of the SOC analog circuit. There have been numerous studies to date on the NBTI effect to analog circuits. However, other researchers did not study the implication of NBTI stress on analog circuits utilizing bandgap reference circuit. The reliability performance of all matched pair circuits, particularly the bandgap reference, is at the mercy of aging differential. Reliability simulation is mandatory to obtain realistic risk evaluation for circuit design reliability qualification. It is applicable to all circuit aging problems covering both analog and digital. Failure rate varies as a function of voltage and temperature. It is shown that PMOS is the reliabilitysusceptible device and NBTI is the most vital failure mechanism for analog circuit in sub-micrometer CMOS technology. This study provides a complete reliability simulation analysis of the on-die Thermal Sensor and the Digital Analog Converter (DAC) circuits and analyzes the effect of NBTI using reliability simulation tool. In order to check out the robustness of the NBTI-induced SOC circuit design, a bum-in experiment was conducted on the DAC circuits. The NBTI degradation observed in the reliability simulation analysis has given a clue that under a severe stress condition, a massive voltage threshold mismatch of beyond the 2mV limit was recorded. Bum-in experimental result on DAC proves the reliability sensitivity of NBTI to the DAC circuitry

Diseño de circuitos analógicos y de señal mixta con consideraciones de diseño físico y variabilidad

Advances in microelectronic technology has been based on an increasing capacity to integrate transistors, moving this industry to the nanoelectronics realm in recent years. Moore’s Law [1] has predicted (and somehow governed) the growth of the capacity to integrate transistors in a single IC. Nevertheless, while this capacity has grown steadily, the increasing number of design tasks that are involved in the creation of the integrated circuit and their complexity has led to a phenomenon known as the ``design gap´´. This is the difference between what can theoretically be integrated and what can practically be designed. Since the early 2000s, the International Technology Roadmap of Semiconductors (ITRS) reports, published by the Semiconductor Industry Association (SIA), alert about the necessity to limit the growth of the design cost by increasing the productivity of the designer to continue the semiconductor industry’s growth. Design automation arises as a key element to close this ”design gap”. In this sense, electronic design automation (EDA) tools have reached a level of maturity for digital circuits that is far behind the EDA tools that are made for analog circuit design automation. While digital circuits rely, in general, on two stable operation states (which brings inherent robustness against numerous imperfections and interferences, leading to few design constraints like area, speed or power consumption), analog signal processing, on the other hand, demands compliance with lots of constraints (e.g., matching, noise, robustness, ...). The triumph of digital CMOS circuits, thanks to their mentioned robustness, has, ultimately, facilitated the way that circuits can be processed by algorithms, abstraction levels and description languages, as well as how the design information traverse the hierarchical levels of a digital system. The field of analog design automation faces many more difficulties due to the many sources of perturbation, such as the well-know process variability, and the difficulty in treating these systematically, like digital tools can do. In this Thesis, different design flows are proposed, focusing on new design methodologies for analog circuits, thus, trying to close the ”gap” between digital and analog EDA tools. In this chapter, the most important sources for perturbations and their impact on the analog design process are discussed in Section 1.2. The traditional analog design flow is discussed in 1.3. Emerging design methodologies that try to reduce the ”design gap” are presented in Section 1.4 where the key concept of Pareto-Optimal Front (POF) is explained. This concept, brought from the field of economics, models the analog circuit performances into a set of solutions that show the optimal trade-offs among conflicting circuit performances (e.g. DC-gain and unity-gain frequency). Finally, the goals of this thesis are presented in Section 1.5

Modeling And Simulation Of Long Term Degradation And Lifetime Of Deep-submicron Mos Device And Circuit

Long-term hot-carrier induced degradation of MOS devices has become more severe as the device size continues to scale down to submicron range. In our work, a simple yet effective method has been developed to provide the degradation laws with a better predictability. The method can be easily augmented into any of the existing degradation laws without requiring additional algorithm. With more accurate extrapolation method, we present a direct and accurate approach to modeling empirically the 0.18-ìm MOS reliability, which can predict the MOS lifetime as a function of drain voltage and channel length. With the further study on physical mechanism of MOS device degradation, experimental results indicated that the widely used power-law model for lifetime estimation is inaccurate for deep submicron devices. A better lifetime prediction method is proposed for the deep-submicron devices. We also develop a Spice-like reliability model for advanced radio frequency RF MOS devices and implement our reliability model into SpectreRF circuit simulator via Verilog-A HDL (Hardware Description Language). This RF reliability model can be conveniently used to simulate RF circuit performance degradatio