Product assurance technology for procuring reliable, radiation-hard, custom LSI/VLSI electronics

Advanced measurement methods using microelectronic test chips are described. These chips are intended to be used in acquiring the data needed to qualify Application Specific Integrated Circuits (ASIC's) for space use. Efforts were focused on developing the technology for obtaining custom IC's from CMOS/bulk silicon foundries. A series of test chips were developed: a parametric test strip, a fault chip, a set of reliability chips, and the CRRES (Combined Release and Radiation Effects Satellite) chip, a test circuit for monitoring space radiation effects. The technical accomplishments of the effort include: (1) development of a fault chip that contains a set of test structures used to evaluate the density of various process-induced defects; (2) development of new test structures and testing techniques for measuring gate-oxide capacitance, gate-overlap capacitance, and propagation delay; (3) development of a set of reliability chips that are used to evaluate failure mechanisms in CMOS/bulk: interconnect and contact electromigration and time-dependent dielectric breakdown; (4) development of MOSFET parameter extraction procedures for evaluating subthreshold characteristics; (5) evaluation of test chips and test strips on the second CRRES wafer run; (6) two dedicated fabrication runs for the CRRES chip flight parts; and (7) publication of two papers: one on the split-cross bridge resistor and another on asymmetrical SRAM (static random access memory) cells for single-event upset analysis

Exploiting Application Behaviors for Resilient Static Random Access Memory Arrays in the Near-Threshold Computing Regime

Near-Threshold Computing embodies an intriguing choice for mobile processors due to the promise of superior energy efficiency, extending the battery life of these devices while reducing the peak power draw. However, process, voltage, and temperature variations cause a significantly high failure rate of Level One cache cells in the near-threshold regime a stark contrast to designs in the super-threshold regime, where fault sites are rare. This thesis work shows that faulty cells in the near-threshold regime are highly clustered in certain regions of the cache. In addition, popular mobile benchmarks are studied to investigate the impact of run-time workloads on timing faults manifestation. A technique to mitigate the run-time faults is proposed. This scheme maps frequently used data to healthy cache regions by exploiting the application cache behaviors. The results show up to 78% gain in performance over two other state-of-the-art techniques

DEEP SUBMICRON CMOS VLSI CIRCUIT RELIABILITY MODELING, SIMULATION AND DESIGN

CMOS VLSI circuit reliability modeling and simulation have attracted intense research interest in the last two decades, and as a result almost all IC Design For Reliability (DFR) tools now try to incrementally simulate device wearout mechanisms in iterative ways. These DFR tools are capable of accurately characterizing the device wearout process and predicting its impact on circuit performance. Nevertheless, excessive simulation time and tedious parameter testing process often limit popularity of these tools in product design and fabrication. This work develops a new SPICE reliability simulation method that shifts the focus of reliability analysis from device wearout to circuit functionality. A set of accelerated lifetime models and failure equivalent circuit models are proposed for the most common MOSFET intrinsic wearout mechanisms, including Hot Carrier Injection (HCI), Time Dependent Dielectric Breakdown (TDDB), and Negative Bias Temperature Instability (NBTI). The accelerated lifetime models help to identify the most degraded transistors in a circuit in terms of the device's terminal voltage and current waveforms. Then corresponding failure equivalent circuit models are incorporated into the circuit to substitute these identified transistors. Finally, SPICE simulation is performed again to check circuit functionality and analyze the impact of device wearout on circuit operation. Device wearout effects are lumped into a very limited number of failure equivalent circuit model parameters, and circuit performance degradation and functionality are determined by the magnitude of these parameters. In this new method, it is unnecessary to perform a large number of small-step SPICE simulation iterations. Therefore, simulation time is obviously shortened in comparison to other tools. In addition, a reduced set of failure equivalent circuit model parameters, rather than a large number of device SPICE model parameters, need to be accurately characterized at each interim wearout process. Thus device testing and parameter extraction work are also significantly simplified. These advantages will allow circuit designers to perform quick and efficient circuit reliability analyses and to develop practical guidelines for reliable electronic designs

Unreliable Silicon: Circuit through System-Level Techniques for Mitigating the Adverse Effects of Process Variation, Device Degradation and Environmental Conditions.

Designing and manufacturing integrated circuits in advanced, highly-scaled processing technologies that meet stringent specification sets is an increasingly unreliable proposition. Dimensional processing variations, time and stress dependent device degradation and potentially varying environmental conditions exacerbate deviations in performance, power and even functionality of integrated circuits. This work explores a system-level adaptive design philosophy intended to mitigate the power and performance impact of unreliable silicon devices and presents enabling circuits for SRAM variation mitigation and in-situ measurement of device degradation in 130nm and 45nm processing technologies. An adaptation of RAZOR-based DVS designed for on-chip memory power reduction and reliability lifetime improvement enables the elimination of 250 mV of voltage margin in a 1.8V design, with up to 500 mV of reduction when allowing 5% of memory operations to use multiple cycles. A novel PID-controlled dynamic reliability management (DRM) system is presented, allowing user-specified circuit lifetime to be dynamically managed via dynamic voltage and frequency scaling. Peak performance improvement of 20-35% is achievable in typical processing systems by allowing brief periods of elevated voltage operation through the real-time DRM system, while minimizing voltage during non-critical periods of operation to maximize circuit lifetime. A probabilistic analysis of oxide breakdown using the percolation model indicates the need for 1000-2000 integrated in-situ sensors to achieve oxide lifetime prediction error at or under 10%. The conclusions from the oxide analysis are used to guide the design of a series of novel on-chip reliability monitoring circuits for use in a real-time DRM system. A 130nm in-situ oxide breakdown measurement sensor presented is the first published design of an oxide-breakdown oriented circuit and is compatible with standard-cell style automatic “place and route” design styles used in the majority of application specific integrated circuit designs. Measured results show increases in gate oxide leakage of 14-35% after accelerated stress testing. A second generation design of the on-chip oxide degradation sensor is presented that reduces stress mode power consumption by 111,785X over the initial design while providing an ideal 1:1 mapping of gate leakage to output frequency in extracted simulations.Ph.D.Electrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/60701/1/ekarl_1.pd

Cmos Rf Cituits Sic] Variability And Reliability Resilient Design, Modeling, And Simulation

The work presents a novel voltage biasing design that helps the CMOS RF circuits resilient to variability and reliability. The biasing scheme provides resilience through the threshold voltage (VT) adjustment, and at the mean time it does not degrade the PA performance. Analytical equations are established for sensitivity of the resilient biasing under various scenarios. Power Amplifier (PA) and Low Noise Amplifier (LNA) are investigated case by case through modeling and experiment. PTM 65nm technology is adopted in modeling the transistors within these RF blocks. A traditional class-AB PA with resilient design is compared the same PA without such design in PTM 65nm technology. Analytical equations are established for sensitivity of the resilient biasing under various scenarios. A traditional class-AB PA with resilient design is compared the same PA without such design in PTM 65nm technology. The results show that the biasing design helps improve the robustness of the PA in terms of linear gain, P1dB, Psat, and power added efficiency (PAE). Except for post-fabrication calibration capability, the design reduces the majority performance sensitivity of PA by 50% when subjected to threshold voltage (VT) shift and 25% to electron mobility (μn) degradation. The impact of degradation mismatches is also investigated. It is observed that the accelerated aging of MOS transistor in the biasing circuit will further reduce the sensitivity of PA. In the study of LNA, a 24 GHz narrow band cascade LNA with adaptive biasing scheme under various aging rate is compared to LNA without such biasing scheme. The modeling and simulation results show that the adaptive substrate biasing reduces the sensitivity of noise figure and minimum noise figure subject to process variation and iii device aging such as threshold voltage shift and electron mobility degradation. Simulation of different aging rate also shows that the sensitivity of LNA is further reduced with the accelerated aging of the biasing circuit. Thus, for majority RF transceiver circuits, the adaptive body biasing scheme provides overall performance resilience to the device reliability induced degradation. Also the tuning ability designed in RF PA and LNA provides the circuit post-process calibration capability

Design, Modeling and Analysis of Non-classical Field Effect Transistors

Transistor scaling following per Moore\u27s Law slows down its pace when entering into nanometer regime where short channel effects (SCEs), including threshold voltage fluctuation, increased leakage current and mobility degradation, become pronounced in the traditional planar silicon MOSFET. In addition, as the demand of diversified functionalities rises, conventional silicon technologies cannot satisfy all non-digital applications requirements because of restrictions that stem from the fundamental material properties. Therefore, novel device materials and structures are desirable to fuel further evolution of semiconductor technologies. In this dissertation, I have proposed innovative device structures and addressed design considerations of those non-classical field effect transistors for digital, analog/RF and power applications with projected benefits. Considering device process difficulties and the dramatic fabrication cost, application-oriented device design and optimization are performed through device physics analysis and TCAD modeling methodology to develop design guidelines utilizing transistor\u27s improved characteristics toward application-specific circuit performance enhancement. Results support proposed device design methodologies that will allow development of novel transistors capable of overcoming limitation of planar nanoscale MOSFETs. In this work, both silicon and III-V compound devices are designed, optimized and characterized for digital and non-digital applications through calibrated 2-D and 3-D TCAD simulation. For digital functionalities, silicon and InGaAs MOSFETs have been investigated. Optimized 3-D silicon-on-insulator (SOI) and body-on-insulator (BOI) FinFETs are simulated to demonstrate their impact on the performance of volatile memory SRAM module with consideration of self-heating effects. Comprehensive simulation results suggest that the current drivability degradation due to increased device temperature is modest for both devices and corresponding digital circuits. However, SOI FinFET is recommended for the design of low voltage operation digital modules because of its faster AC response and better SCEs management than the BOI structure. The FinFET concept is also applied to the non-volatile memory cell at 22 nm technology node for low voltage operation with suppressed SCEs. In addition to the silicon technology, our TCAD estimation based on upper projections show that the InGaAs FinFET, with superior mobility and improved interface conditions, achieve tremendous drive current boost and aggressively suppressed SCEs and thereby a strong contender for low-power high-performance applications over the silicon counterpart. For non-digital functionalities, multi-fin FETs and GaN HEMT have been studied. Mixed-mode simulations along with developed optimization guidelines establish the realistic application potential of underlap design of silicon multi-Fin FETs for analog/RF operation. The device with underlap design shows compromised current drivability but improve analog intrinsic gain and high frequency performance. To investigate the potential of the novel N-polar GaN material, for the first time, I have provided calibrated TCAD modeling of E-mode N-polar GaN single-channel HEMT. In this work, I have also proposed a novel E-mode dual-channel hybrid MIS-HEMT showing greatly enhanced current carrying capability. The impact of GaN layer scaling has been investigated through extensive TCAD simulations and demonstrated techniques for device optimization

Digital Timing Control in SRAMs for Yield Enhancement and Graceful Aging Degradation

Embedded SRAMs can occupy the majority of the chip area in SOCs. The increase in process variation and aging degradation due to technology scaling can severely compromise the integrity of SRAM memory cells, hence resulting in cell failures. Enough cell failures in a memory can lead to it being rejected during initial testing, and hence decrease the manufacturing yield. Or, as a result of long-term applied stress, lead to in-field system failures. Certain types of cell failures can be mitigated through improved timing control. Post-fabrication programmable timing can allow for after-the-fact calibration of timing signals on a per die basis. This allows for a SRAM's timing signals to be generated based on the characteristics specific to the individual chip, thus allowing for an increase in yield and reduction in in-field system failures. In this thesis, a delay line based SRAM timing block with digitally programmable timing signals has been implemented in a 180 nm CMOS technology. Various timing-related cell failure mechanisms including: 1). Operational Read Failures, 2). Cell Stability Failures, and 3). Power Envelope Failures are investigated. Additionally, the major contributing factors for process variation and device aging degradation are discussed in the context of SRAMs. Simulations show that programmable timing can be used to reduce cell failure rates by over 50%

Design and Analysis of Robust Low Voltage Static Random Access Memories.

Static Random Access Memory (SRAM) is an indispensable part of most modern VLSI designs and dominates silicon area in many applications. In scaled technologies, maintaining high SRAM yield becomes more challenging since they are particularly vulnerable to process variations due to 1) the minimum sized devices used in SRAM bitcells and 2) the large array sizes. At the same time, low power design is a key focus throughout the semiconductor industry. Since low voltage operation is one of the most effective ways to reduce power consumption due to its quadratic relationship to energy savings, lowering the minimum operating voltage (Vmin) of SRAM has gained significant interest. This thesis presents four different approaches to design and analyze robust low voltage SRAM: SRAM analysis method improvement, SRAM bitcell development, SRAM peripheral optimization, and advance device selection. We first describe a novel yield estimation method for bit-interleaved voltage-scaled 8-T SRAMs. Instead of the traditional trade-off between write and read, the trade-off between write and half select disturb is analyzed. In addition, this analysis proposes a method to find an appropriate Write Word-Line (WWL) pulse width to maximize yield. Second, low leakage 10-T SRAM with speed compensation scheme is proposed. During sleep mode of a sensor application, SRAM retaining data cannot be shut down so it is important to minimize leakage in SRAM. This work adopts several leakage reduction techniques while compensating performance. Third, adaptive write architecture for low voltage 8-T SRAMs is proposed. By adaptively modulating WWL width and voltage level, it is possible to achieve low power consumption while maintaining high yield without excessive performance degradation. Finally, low power circuit design based on heterojunction tunneling transistors (HETTs) is discussed. HETTs have a steep subthreshold swing beneficial for low voltage operation. Device modeling and design of logic and SRAM are proposed.Ph.D.Electrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/91569/1/daeyeonk_1.pd

Design of Resistive Synaptic Devices and Array Architectures for Neuromorphic Computing

abstract: Over the past few decades, the silicon complementary-metal-oxide-semiconductor (CMOS) technology has been greatly scaled down to achieve higher performance, density and lower power consumption. As the device dimension is approaching its fundamental physical limit, there is an increasing demand for exploration of emerging devices with distinct operating principles from conventional CMOS. In recent years, many efforts have been devoted in the research of next-generation emerging non-volatile memory (eNVM) technologies, such as resistive random access memory (RRAM) and phase change memory (PCM), to replace conventional digital memories (e.g. SRAM) for implementation of synapses in large-scale neuromorphic computing systems. Essentially being compact and “analog”, these eNVM devices in a crossbar array can compute vector-matrix multiplication in parallel, significantly speeding up the machine/deep learning algorithms. However, non-ideal eNVM device and array properties may hamper the learning accuracy. To quantify their impact, the sparse coding algorithm was used as a starting point, where the strategies to remedy the accuracy loss were proposed, and the circuit-level design trade-offs were also analyzed. At architecture level, the parallel “pseudo-crossbar” array to prevent the write disturbance issue was presented. The peripheral circuits to support various parallel array architectures were also designed. One key component is the read circuit that employs the principle of integrate-and-fire neuron model to convert the analog column current to digital output. However, the read circuit is not area-efficient, which was proposed to be replaced with a compact two-terminal oscillation neuron device that exhibits metal-insulator-transition phenomenon. To facilitate the design exploration, a circuit-level macro simulator “NeuroSim” was developed in C++ to estimate the area, latency, energy and leakage power of various neuromorphic architectures. NeuroSim provides a wide variety of design options at the circuit/device level. NeuroSim can be used alone or as a supporting module to provide circuit-level performance estimation in neural network algorithms. A 2-layer multilayer perceptron (MLP) simulator with integration of NeuroSim was demonstrated to evaluate both the learning accuracy and circuit-level performance metrics for the online learning and offline classification, as well as to study the impact of eNVM reliability issues such as data retention and write endurance on the learning performance.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201