KAM Theorem for Gevrey Hamiltonians

We consider Gevrey perturbations $H$ of a completely integrable Gevrey Hamiltonian $H_0$. Given a Cantor set $\Omega_\kappa$ defined by a Diophantine condition, we find a family of KAM invariant tori of $H$ with frequencies $\omega\in \Omega_\kappa$ which is Gevrey smooth in a Whitney sense. Moreover, we obtain a symplectic Gevrey normal form of the Hamiltonian in a neighborhood of the union $\Lambda$ of the invariant tori. This leads to effective stability of the quasiperiodic motion near $\Lambda$

Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursors

Because of its high conductivity and intrinsic stability, poly(3,4-ethylenedioxythiophene (PEDOT) has gained great attention both in academic research and industry over the years. In this study, we used the oxidative molecular layer deposition (oMLD) technique to deposit PEDOT from 3,4-ethylenedioxythiophene (EDOT) and a new inorganic oxidizing agent, rhenium pentachloride (ReCl5). We extensively characterized the properties of the films by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDS), Raman, and conductivity measurements. The oMLD of polymers is based on the sequential adsorption of the monomer and its oxidation-induced polymerization. However, oMLD has been scarcely used because of the challenge of finding a suitable combination of volatile, reactive, and stable organic monomers applicable at high temperatures. ReCl5 showed promising properties in oMLD because it has high thermal stability and high oxidizing ability for EDOT. PEDOT films were deposited at temperatures of 125-200 degrees C. EDS and XPS measurements showed that the as-deposited films contained residues of rhenium and chlorine, which could be removed by rinsing the films with deionized water. The polymer films were transparent in the visible region and showed relatively high electrical conductivities within the 2-2000 S cm(-1) range.Peer reviewe

Types of geochemical associations in the Borov Dol - Shopur area interpretation of the data of primary and secondary haloes

The paper presents statistical calculations of the results of geochemical investigations of the primary and secondary dispersion haloes carried out on an area of some 40 km^2 in the Borov Dol - Shopur region (the Buchim ore district). Sampling was carried out on 500 x 200 spacing by research workers from IMGRE Moscow and the Buchim mine. The results obtained were first interpreted by the Geoscan method and the cluster analysis method (discussed in this paper), as well as the factor analysis of Kaiser method. Based on complex statistical calculations, correlation dependencies and classification of individual elements according to variogramas, factor distributions and dendograms, the types and geochemical associations distinguished are grouped us tollows: 1. Based on cluster analysis the following were distinguished: a) according to primary dispersion haloes (Pb, Zn, Sn). [(Ga, Ag) Vb]. (Ni, Co, Cr), [(Ti, Zr, Y) Nb]; b) according to secondary dispersion haloes [(Ni, Cr, Co) Mn]; [(Ti, V) Sc]; [(Vb, Nb) Ag]; (W, Ga); (Cu, Y) Mo; (Pb, Zn, Sn); 2. Based on data of factor analysis the following were distinguished: a) according to primary haloes [(Zr, Y. B, Ti) Nb]; (Sr); (Pb, Zn, Sn); (Ga, Ag, Vb); (B, Mn, Ni) Co, Cr b) according to secondary haloes: [(Ni, Cr. Co) Mn]; [(Vb, W, Nb) Ag, Ga)J; [(Ti, V) Sc)]; (Pb, Zn, Sn); (Cu, Y, Mo). Particular mention should be made of the (Pb, Zn, Sn) geochemical association which is clearly defined in both groups as well as (Cu, Y, Mo) as n characteristic association for the secondary dispersion haloes

A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(ii) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine

In this work, we developed a new ALD process for nickel metal from dichlorobis(triethylphosphine)nickel(ii) (NiCl2(PEt3)(2)) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine ((Me3Ge)(2)DHP). A series of phosphine adducts of nickel and cobalt halides were synthesized and characterized for their volatility and thermal stability. Also (Me3Ge)(2)DHP is a novel reducing agent in ALD. Smooth nickel films were deposited on different substrate materials at 110 degrees C, which is the lowest deposition temperature for Ni metal found in the literature. The growth rate is 0.2 angstrom per cycle when the film is not continuous and decreases to 0.1 angstrom per cycle after the film becomes pinhole-free. Besides a small amount (7 at%) of carbidic carbon, the films have only small amounts of impurities. Most notably, the chlorine content is below 0.2 at%, indicating efficient reduction. Furthermore, we think that (Me3Ge)(2)DHP can open new avenues for the ALD of other metals at low temperatures.Peer reviewe