Correlation between CF2-and C2F4-concentrations in pulsed capacitively coupled CF4/H2 rf plasma

The CF2 and C2F4 absolute concentrations were measured in pulsed low pressure CF4/H2 rf plasmas (13.56 MHz, CCP) by means of Infra-Red Tuneable Diode Laser Absorption Spectroscopy. For measurement of CF2 radicals the P2(21) line at 1096.3433 cm-1 was chosen with its calculated line strength of 4.09·10-20 cm/molecule. In case of C2F4 there is no detailed spectroscopic data available. Therefore, the C2F4 gas was produced by thermal decomposition of polytetrafluoroethylene for spectroscopic analysis. An absorption structure of several overlapping C2F4 lines was found around 1337.11 cm-1 and manually fitted. In pulsed plasma the time dependencies of the CF2 and C2F4 concentration correlated with each other. In plasma off-phase, the recombination of two CF2 radicals forming C2F4 was found to be dominant in CF2 kinetics, but of minor importance in C2F4 production

Surface charge measurements on different dielectrics in diffuse and filamentary barrier discharges

Previously, we reported on the measurement of surface charges during the operation of barrier discharges (BDs) using the electro-optic Pockels effect of a bismuth silicon oxide (BSO) crystal. With the present work, the next milestone is achieved by making this powerful method accessible to various dielectrics which are typically used in BD configurations. The dynamics and spatial distribution of positive and negative surface charges were determined on optically transparent borosilicate glass, mono-crystalline alumina and magnesia, respectively, covering the BSO crystal. By variation of the nitrogen admixture to helium and the pressure between 500 mbar and 1 bar, both the diffuse glow-like BD and the self-stabilized discharge filaments were operated inside of a gas gap of 3 mm. The characteristics of the discharge and, especially, the influence of the different dielectrics on its development were studied by surface charge diagnostics, electrical measurements and ICCD camera imaging. Regarding the glow-like BD, the breakdown voltage changes significantly by variation of the cathodic dielectric, due to the different effective secondary electron emission (SEE) coefficients. These material-specific SEE yields were estimated using Townsend's criterion in combination with analytical calculations of the effective ionization coefficient in helium with air impurities. Moreover, the importance of the surface charge memory effect for the self-stabilization of discharge filaments was quantified by the recalculated spatio-temporal behavior of the gap voltage

Self-stabilized discharge filament in plane-parallel barrier discharge configuration: formation, breakdown mechanism, and memory effects

Single self-stabilized discharge filaments were investigated in the plane-parallel electrode configuration. The barrier discharge was operated inside a gap of 3 mm shielded by glass plates to both electrodes, using helium-nitrogen mixtures and a square-wave feeding voltage at a frequency of 2 kHz. The combined application of electrical measurements, ICCD camera imaging, optical emission spectroscopy and surface charge diagnostics via the electro-optic Pockels effect allowed the correlation of the discharge development in the volume and on the dielectric surfaces. The formation criteria and existence regimes were found by systematic variation of the nitrogen admixture to helium, the total pressure and the feeding voltage amplitude. Single self-stabilized discharge filaments can be operated over a wide parameter range, foremost, by significant reduction of the voltage amplitude after the operation in the microdischarge regime. Here, the outstanding importance of the surface charge memory effect on the long-term stability was pointed out by the recalculated spatio-temporally resolved gap voltage. The optical emission revealed discharge characteristics that are partially reminiscent of both the glow-like barrier discharge and the microdischarge regime, such as a Townsend pre-phase, a fast cathode-directed ionization front during the breakdown and radially propagating surface discharges during the afterglow

Near-surface generation of negative ions in low-pressure discharges

Formation processes of negative ions in low-pressure plasmas are not yet fully understood: as a rule experiments reveal higher negative ion density than predicted by the models. In this work we report near-surface generation of negative ions. This hitherto neglected formation mechanism appears to be important in low-pressure discharges and can have large impacts on the bulk plasma chemistry. We monitor energy-resolved positive and negative ion fluxes arriving at the electrodes in an oxygen parallel-plate radio-frequency ~rf, 13.56 MHz! and dc glow plasmas by means of a quadrupole mass spectrometer. Negative ions formed in the plasma volume are observed by extracting them through an orifice in the anode of a dc glow discharge. Unexpectedly, we record large negative ion signals at the cathode of a dc discharge and at the grounded electrode of an rf discharge. These ions are formed in the plasma sheath, in collision processes involving high-energy species. We propose an efficient mechanism of negative ion generation due to ion pair formation in the sheath

Near-surface generation of negative ions in low-pressure discharges

Formation processes of negative ions in low-pressure plasmas are not yet fully understood: as a rule experiments reveal higher negative ion density than predicted by the models. In this work we report near-surface generation of negative ions. This hitherto neglected formation mechanism appears to be important in low-pressure discharges and can have large impacts on the bulk plasma chemistry. We monitor energy-resolved positive and negative ion fluxes arriving at the electrodes in an oxygen parallel-plate radio-frequency ~rf, 13.56 MHz! and dc glow plasmas by means of a quadrupole mass spectrometer. Negative ions formed in the plasma volume are observed by extracting them through an orifice in the anode of a dc glow discharge. Unexpectedly, we record large negative ion signals at the cathode of a dc discharge and at the grounded electrode of an rf discharge. These ions are formed in the plasma sheath, in collision processes involving high-energy species. We propose an efficient mechanism of negative ion generation due to ion pair formation in the sheath

Ionization by bulk heating of electrons in capacitive radio frequency atmospheric pressure microplasmas

Electron heating and ionization dynamics in capacitively coupled radio frequency (RF) atmospheric pressure microplasmas operated in helium are investigated by Particle in Cell simulations and semi-analytical modeling. A strong heating of electrons and ionization in the plasma bulk due to high bulk electric fields are observed at distinct times within the RF period. Based on the model the electric field is identified to be a drift field caused by a low electrical conductivity due to the high electron-neutral collision frequency at atmospheric pressure. Thus, the ionization is mainly caused by ohmic heating in this "Omega-mode". The phase of strongest bulk electric field and ionization is affected by the driving voltage amplitude. At high amplitudes, the plasma density is high, so that the sheath impedance is comparable to the bulk resistance. Thus, voltage and current are about 45{\deg} out of phase and maximum ionization is observed during sheath expansion with local maxima at the sheath edges. At low driving voltages, the plasma density is low and the discharge becomes more resistive resulting in a smaller phase shift of about 4{\deg}. Thus, maximum ionization occurs later within the RF period with a maximum in the discharge center. Significant analogies to electronegative low pressure macroscopic discharges operated in the Drift-Ambipolar mode are found, where similar mechanisms induced by a high electronegativity instead of a high collision frequency have been identified

Evaluation of osseointegration of titanium alloyed implants modified by plasma polymerization

By means of plasma polymerization, positively charged, nanometre-thin coatings can be applied to implant surfaces. The aim of the present study was to quantify the adhesion of human bone cells in vitro and to evaluate the bone ongrowth in vivo, on titanium surfaces modified by plasma polymer coatings. Different implant surface configurations were examined: titanium alloy (Ti6Al4V) coated with plasma-polymerized allylamine (PPAAm) and plasma-polymerized ethylenediamine (PPEDA) versus uncoated. Shear stress on human osteoblast-like MG-63 cells was investigated in vitro using a spinning disc device. Furthermore, bone-to-implant contact (BIC) was evaluated in vivo. Custom-made conical titanium implants were inserted at the medial tibia of female Sprague-Dawley rats. After a follow-up of six weeks, the BIC was determined by means of histomorphometry. The quantification of cell adhesion showed a significantly higher shear stress for MG-63 cells on PPAAm and PPEDA compared to uncoated Ti6Al4V. Uncoated titanium alloyed implants showed the lowest BIC (40.4%). Implants with PPAAm coating revealed a clear but not significant increase of the BIC (58.5%) and implants with PPEDA a significantly increased BIC (63.7%). In conclusion, plasma polymer coatings demonstrate enhanced cell adhesion and bone ongrowth compared to uncoated titanium surfaces