Temperature dependent refractive index of silicon and germanium

Silicon and germanium are perhaps the two most well-understood semiconductor materials in the context of solid state device technologies and more recently micromachining and nanotechnology. Meanwhile, these two materials are also important in the field of infrared lens design. Optical instruments designed for the wavelength range where these two materials are transmissive achieve best performance when cooled to cryogenic temperatures to enhance signal from the scene over instrument background radiation. In order to enable high quality lens designs using silicon and germanium at cryogenic temperatures, we have measured the absolute refractive index of multiple prisms of these two materials using the Cryogenic, High-Accuracy Refraction Measuring System (CHARMS) at NASA Goddard Space Flight Center, as a function of both wavelength and temperature. For silicon, we report absolute refractive index and thermo-optic coefficient (dn/dT) at temperatures ranging from 20 to 300 K at wavelengths from 1.1 to 5.6 microns, while for germanium, we cover temperatures ranging from 20 to 300 K and wavelengths from 1.9 to 5.5 microns. We compare our measurements with others in the literature and provide temperature-dependent Sellmeier coefficients based on our data to allow accurate interpolation of index to other wavelengths and temperatures. Citing the wide variety of values for the refractive indices of these two materials found in the literature, we reiterate the importance of measuring the refractive index of a sample from the same batch of raw material from which final optical components are cut when absolute accuracy greater than +/-5 x 10^-3 is desired.Comment: 10 pages, 8 figures, to be published in the Proc. of SPIE 6273 (Orlando

The Wide Field Imaging Interferometry Testbed

We are developing a Wide-Field Imaging Interferometry Testbed (WIIT) in support of design studies for NASA's future space interferometry missions, in particular the SPIRIT and SPECS far-infrared/submillimeter interferometers. WIIT operates at optical wavelengths and uses Michelson beam combination to achieve both wide-field imaging and high-resolution spectroscopy. It will be used chiefly to test the feasibility of using a large-format detector array at the image plane of the sky to obtain wide-field interferometry images through mosaicing techniques. In this setup each detector pixel records interferograms corresponding to averaging a particular pointing range on the sky as the optical path length is scanned and as the baseline separation and orientation is varied. The final image is constructed through spatial and spectral Fourier transforms of the recorded interferograms for each pixel, followed by a mosaic/joint-deconvolution procedure of all the pixels. In this manner the image within the pointing range of each detector pixel is further resolved to an angular resolution corresponding to the maximum baseline separation for fringe measurements. We present the motivation for building the testbed, show the optical, mechanical, control, and data system design, and describe the image processing requirements and algorithms. WIIT is presently under construction at NASA's Goddard Space Flight Center.Comment: 7 pages, 3 figures, IEEE Aerospace Conference 200

Automation, Operation, and Data Analysis in the Cryogenic, High Accuracy, Refraction Measuring System (CHARMS)

The Cryogenic High Accuracy Refraction Measuring System (CHARMS) at NASA's Goddard Space Flight Center has been enhanced in a number of ways in the last year to allow the system to accurately collect refracted beam deviation readings automatically over a range of temperatures from 15 K to well beyond room temperature with high sampling density in both wavelength and temperature. The engineering details which make this possible are presented. The methods by which the most accurate angular measurements are made and the corresponding data reduction methods used to reduce thousands of observed angles to a handful of refractive index values are also discussed

Temperature-dependent Absolute Refractive Index Measurements of Synthetic Fused Silica

Using the Cryogenic, High-Accuracy Refraction Measuring System (CHARMS) at NASA's Goddard Space Flight Center, we have measured the absolute refractive index of five specimens taken from a very large boule of Corning 7980 fused silica from temperatures ranging from 30 to 310 K at wavelengths from 0.4 to 2.6 microns with an absolute uncertainty of plus or minus 1 x 10 (exp -5). Statistical variations in derived values of the thermo-optic coefficient (dn/dT) are at the plus or minus 2 x 10 (exp -8)/K level. Graphical and tabulated data for absolute refractive index, dispersion, and thermo-optic coefficient are presented for selected wavelengths and temperatures along with estimates of uncertainty in index. Coefficients for temperature-dependent Sellmeier fits of measured refractive index are also presented to allow accurate interpolation of index to other wavelengths and temperatures. We compare our results to those from an independent investigation (which used an interferometric technique for measuring index changes as a function of temperature) whose samples were prepared from the same slugs of material from which our prisms were prepared in support of the Kepler mission. We also compare our results with sparse cryogenic index data from measurements of this material from the literature

Temperature-dependent Refractive Index of CaF2 and Infrasil 301

In order to enable high quality lens designs using calcium fluoride (CaF2) and Heraeus Infrasil 301 (Infrasil) for cryogenic operating temperatures, we have measured the absolute refractive index of these two materials as a function of both wavelength and temperature using the Cryogenic, High-Accuracy Refraction Measuring System (CHARMS) at NASA's Goddard Space Flight Center. For CaF2, we report absolute refractive index and thermo-optic coefficient (dn/dT) at temperatures ranging from 25 to 300 K at wavelengths from 0.4 to 5.6 pm, while for Infrasil, we cover temperatures ranging from 35 to 300 K and wavelengths from 0.4 to 3.6 pm. For CaF2, we compare our index measurements to measurements of other investigators. For Infrasil, we compare our measurements to the mate~al manufacturer's data at room temperature and to cryogenic measurements for fused silica from previous investigations including one of our own. Finally, we provide temperature-dependent Sellmeier coefficients based on our measured data to allow accurate interpolation of index to other wavelengths and temperatures

Cryogenic Temperature-dependent Refractive Index Measurements of N-BK7, BaLKN3, and SF15 for NOTES PDI

In order to enable high quality lens designs using N-BK7, BaLKN3, and SF15 at cryogenic temperatures, we have measured the absolute refractive index of prisms of these three materials using the Cryogenic, High-Accuracy Refraction Measuring System (CHARMS) at NASA's Goddard Space Flight Center, as a function of both wavelength and temperature. For N-BK7, we report absolute refractive index and thermo-optic coefficient (dn/dT) at temperatures ranging from 50 to 300 K at wavelengths from 0.45 to 2.7 micrometers; for BaLKN3 we cover temperatures ranging from 40 to 300 K and wavelengths from 0.4 to 2.6 micrometers; for SF15 we cover temperatures ranging from 50 to 300 K and wavelengths from 0.45 to 2.6 micrometers. We compare our measurements with others in the literature and provide temperature-dependent Sellmeier coefficients based on our data to allow accurate interpolation of index to other wavelengths and temperatures. While we generally find good agreement (plus or minus 2 x 10(exp -4) for N-BK7, less than 1 x 10(exp -4) for the other materials) at room temperature between our measured values and those provided by the vendor, there is some variation between the datasheets provided with the prisms we measured and the catalog values published by the vendor. This underlines the importance of measuring the absolute refractive index of the material when precise knowledge of the refractive index is required

Optical Technologies for UV Remote Sensing Instruments

Over the last decade significant advances in technology have made possible development of instruments with substantially improved efficiency in the UV spectral region. In the area of optical coatings and materials, the importance of recent developments in chemical vapor deposited (CVD) silicon carbide (SiC) mirrors, SiC films, and multilayer coatings in the context of ultraviolet instrumentation design are discussed. For example, the development of chemically vapor deposited (CVD) silicon carbide (SiC) mirrors, with high ultraviolet (UV) reflectance and low scatter surfaces, provides the opportunity to extend higher spectral/spatial resolution capability into the 50-nm region. Optical coatings for normal incidence diffraction gratings are particularly important for the evolution of efficient extreme ultraviolet (EUV) spectrographs. SiC films are important for optimizing the spectrograph performance in the 90 nm spectral region. The performance evaluation of the flight optical components for the Solar Ultraviolet Measurements of Emitted Radiation (SUMER) instrument, a spectroscopic instrument to fly aboard the Solar and Heliospheric Observatory (SOHO) mission, designed to study dynamic processes, temperatures, and densities in the plasma of the upper atmosphere of the Sun in the wavelength range from 50 nm to 160 nm, is discussed. The optical components were evaluated for imaging and scatter in the UV. The performance evaluation of SOHO/CDS (Coronal Diagnostic Spectrometer) flight gratings tested for spectral resolution and scatter in the DGEF is reviewed and preliminary results on resolution and scatter testing of Space Telescope Imaging Spectrograph (STIS) technology development diffraction gratings are presented