CERCETĂRI XRD ȘI XPS ALE STRATURILOR DE AlN, AlGaN, GaN DEPUSE PE SILICIU PRIN METODA HVPE

Prin metoda reacțiilor chimice de transport HVPE (Hydride Vapor Phase Epitaxy) in sistemul (H2-NH3-HCl-Al-Ga-Si) au fost sintetizate straturi subțiri de AlN, AlGaN, GaN pe substraturi de siliciu, Si(111). Morfologia suprafeței, precum și a secțiunilor transversale ale structurilor a fost cercetată prin metoda SEM (Scanning Electron Microscopy) de rezoluție înaltă. Compoziția în secțiune transversală a structurilor a fost studiată prin metoda XRD (X-Ray Diffraction method), iar de suprafață – prin metoda XPS (X-Ray Photoelectronic Spectroscopy). Afară de aluminiu, galiu și azot în straturi au fost depistate oxigen și carbon. S-a stabilit că concentrația oxigenului pe suprafața straturilor de GaN, depuse la temperaturi relativ mai joase, este mai mică. Se presupune că concentrația ridicată a oxigenului în straturi are loc în urma descompunerii cuarțului, din care este confecționat reactorul, la temperaturi ridicate. S-a constatat că încorporarea galiului în straturile de AlGaN este diminuată de fluxul precursorilor aluminiului. Prin aceasta se demonstrează că viteza reacțiilor chimice ale precursorilor azotului cu ale aluminiului este semnificativ mai mare decât cu ale galiului, ultimele fiind înlăturate din zona de depunere de fluxul gazului de transport.XRD AND XPS INVESTIGATIONS OF THE AlN, AlGaN, GaN LAYERS DEPOSITED ON SILICON BY THE HVPE METHODUsing the HVPE (Hydride Vapor Phase Epitaxy) transport method, in system (H2-NH3-HCl-Al-Ga-Si), thin layers of AlN, AlGaN, GaN on silicon substrates were synthesized. Surface morphology as well as transverse sections of structures was investigated by the high resolution SEM (Scanning Electron Microscopy) method. The cross-sectional composition of the structures was studied by the X-Ray Diffraction Method (XRD) and Surface X-Ray (X-Ray Photoelectronic Spectroscopy). Outside of aluminum, gallium and nitrogen in the layers were detected oxygen and carbon. It has been established that the concentration of oxygen on the surface of the GaN layers deposited at relatively lower temperatures is lower. It is assumed that the high concentration of oxygen in the layers takes place after the decomposition of the quartz, from which the reactor is made, at high temperatures. It has been found that the incorporation of gallium into the AlGaN layers is diminished by the flux of aluminum precursors. This demonstrates that the rate of chemical reactions of the nitrogen precursors with the aluminum is significantly higher than with the latter being removed from the deposition area by the transport gas stream.</p

CELULE FOTOVOLTAICE CU HETEROJONCȚIUNEA n+CdS-po-p+InP: APLICĂRI TEHNOLOGICE, METODE ŞI REZULTATE ALE CERCETĂRILOR

Au fost obținute celule fotovoltaice (CF) cu heterojoncțiunea nCdS-pInP și strat intermediar epitaxial poInP, fiind cercetate proprietățile lor electrice și fotoelectrice. Grosimile straturilor pInP și al celui frontal nCdS au variat respectiv în intervalul 2,7...6,2 – 0,9...3,6 µm în dependență de durata de depunere. S-a constatat că parametrii fotoelectrici au valorile maximale pentru grosimile de 4,5...5 µm pentru stratul poInP și de 0,9 µm pentru stratul nCdS, eficiența maxi­mală a CF cu structura n+CdS-po-p+InP fiind de 14,6% (100 mW×cm-2).PHOTOVOLTAIC CELLS WITH n+CdS-po-p+InP HETEROJUNCTION:  TEHNOLOGICAL APPLICATIONS, METHODS AND RESEARCH RESULTSPhotovoltaic cells (PVC) with nCdS-pInP heterojunction and an intermediate poInP epitaxial layer were obtained and their electrical and photoelectric properties were investigated. The thicknesses of the pInP layer and of the nCdS frontal layer varied in the range of 2.7 to 6.2 μm and 0.9 to 3.6 μm respectively, depending on the deposition time. It was found that photoelectric parameters have maximum values when the thickness of poInP layer is of 4.5 ... 5 μm and for nCdS layer is of 0.9 μm, the maximum efficiency of PCV with the structure n+CdS-po-p+InP was of 14.6% (100 mW×cm-2).</p

ZINC OXIDE THIN FILMS PREPARED BY SPRAY PYROLYSIS TECHNIQUIE IN ARGON FLOW

ZnO thin layers were grown from zinc acetate dissolved in methanol-acetic acid-water solution with the molarity of 0.2M by using the pulverization method in an argon flow at the temperatures of 250-450°C. The temperature dependence of electrical and optical properties of the obtained layers were studied. The optical transmittance at the wavelengths of (300 -1000) nm has the values of 80-85%. The resistivity of ZnO thin layers grown at 450°C decreases from 33W•cm to       0,028 W•cm after annealing in hydrogen at 450°C during an hour. The radiative recombination is related to the electron transitions to the deep levels and band to band transitions at the charge carriers transitions with the LO type phonons.</p

INFLUIENŢA TRATĂRII TERMICE ÎN AZOT SAU ÎN VID ASUPRA PROPRIETĂŢILOR STRATURILOR DE GaN CRESCUTE PE Si(111) PRIN METODA HVPE

A fost studiată influenţa tratării termice la temperaturi ridicate în azot sau în vid asupra proprietăţilor stra­turilor de GaN depuse pe siliciu prin metoda reacţiilor chimice de transport în sistemul (H2-NH3-HCl-Ga-Al), (HVPE). În spec­trele de fotoluminescenţă (FL), la 300 K, ale straturilor netratate se evidenţiază două fâşii de recombinare radiantă, cu maximele la 370 şi 555 nm. La tratarea în azot intensitatea fâşiei 370 nm creşte, iar la tratarea în vid – descreşte. Inten­sitatea benzii galbene (555 nm), la tratare în ambele medii, scade neesenţial. Se demonstrează că parametrii electrici ai straturilor pot fi, de asemenea, modificaţi prin metoda tratării termice în azot sau în vid, precum şi prin durata de tratare. The influence of high temperature annealing in nitrogen or vacuum on properties of GaN layers deposited on Si(111) by HVPE mehodThe influence of high temperature annealing in nitrogen and vacuum of GaN layers deposited by chemical reactions transport (HVPE) in (H2-NH3-HCl-Ga-Al) system on their properties was studied. In the photo­luminescence (PL) spectra at 300 K of the untreated layers two recombination radiation bands with the plats at 370 nm and 555 nm were revealed. At the layers heat treatment the intensity of the radiation band at 370 nm increases when at the intensity of the yellow band (555 nm) decreases not significantly at the treatment in the both ambiances. It was shown that the electrical parameters could as well be controlled by using heat treatment in nitrogen and vacuum and this depends on the annealing duration. </p

CELULE FOTOVOLTAICE CU HETEROJONCŢIUNEA nCdS-pInP

Au fost studiate proprietăţile electrice şi fotoelectrice ale heterojoncţiunilor nCdS-pInP cu şi fără strat epitaxial inter-mediar poInP. S-a stabilit că la polarizări directe în mecanismul de transport al curentului predomină procesele de recom-binare în regiunea de sarcină spaţială. La polarizări inverse predomină procesele de tunelare. Prezenţa stratului epitaxial poInP depus repetat măreşte ISC până la 28,2 mA·cm-2, UCD până la 0,780 V, iar eficienţa conversiei energiei până la 15% la 300 K şi iluminare 100 mW/cm2. Fotosensibilitatea CF nCdS-poInP-pInP corespunde intervalului λ=550...950 nm cu un maximum plat localizat în intervalul λ=700...850 nm.HETEROJONCTION nCdS–pInP FOTOVOLTAIC CELLSElectrical and photoelectrical properties of nCdS-pInP hetero-junctions with and without intermediate poInP epitaxial layer were studied. It was established that the current flow mechanism at direct biases is determined mainly by the recombi-nation processes in the space charge region of the junction. At the reverse biases the tunneling processes are predominant. The presence of poInP layer leads to the photo-electrical parameters enhancing of hetero-junction: short circuit current increases up to 28,2 mA·cm -2, open circuit voltage up to 0,780V and the efficiency of solar energy conversion up to 15 % (at 300 K and illumination of 100mw/cm2). The photo-sensitivity of nCdS- poInP -pInP is in the wavelength region of λ= 550-950nm with a maximum localized to λ=700-850nm.</p

CERCETAREA CAPACITĂȚII ȘI CONDUCTIBILITĂȚII ELECTRICE ALE JONCȚIUNILOR DIN P-INP

Au fost studiate caracteristicile capacitate-tensiune-conductabilitate-frecvenţă ale homo­joncţi­uni­lor n+-p°-p+InP cu şi fără strat frontal n+CdS obţinute cu aplicarea tehnologiilor din faza gazoasă în sistemul In-PCl3-H2 şi în volum cvasiînchis. S-a stabilit că distribuirea impurităţilor în regiunea sarcinii de baraj în astfel de joncţiuni este cu gradient liniar, iar la frecvenţele de 7…10 MHz impendanţa structurii este determinată de rezistenţa inductivă. Concentraţia stărilor super­ficiale pentru structurile n+-p°-p+InP cu strat frontal de n+CdS este cu un ordin mai mică decât fără acest strat, ceea ce va spori eficienţa CF obţinute în baza lor.CAPACITANCE AND ELECTRICAL CONDUCTIVITY STUDIES OF P-INP JUNCTIONSThe capacitance –voltage-conductivity-frequency dependencies of n+-po-p+InP with and without n+CdS frontal  layer, obtained  by using of gaseous phase epitaxial technology in a In-PCl3-H2 system and deposition in a quasi-closed volume, were studied. It was established that the impurity distribution in the space charge region of such junctions is of a linear gradient, and at the frequencies of 7…10 MHz the structure impedance is determined by the inductance resistance. The surface state concentration in n+-po-p+InP structures with the n+CdS frontal  layer is by an order of magnitude lower than in the same structures without it, which can enhance the efficiency of solar cells based on them.</p

Hierarchical Aerographite 3D flexible networks hybridized by InP micro/nanostructures for strain sensor applications

Abstract In the present work, we report on development of three-dimensional flexible architectures consisting of an extremely porous three-dimensional Aerographite (AG) backbone decorated by InP micro/nanocrystallites grown by a single step hydride vapor phase epitaxy process. The systematic investigation of the hybrid materials by scanning electron microscopy demonstrates a rather uniform spatial distribution of InP crystallites without agglomeration on the surface of Aerographite microtubular structures. X-ray diffraction, transmission electron microscopy and Raman scattering analysis demonstrate that InP crystallites grown on bare Aerographite are of zincblende structure, while a preliminary functionalization of the Aerographite backbone with Au nanodots promotes the formation of crystalline In2O3 nanowires as well as gold-indium oxide core-shell nanostructures. The electromechanical properties of the hybrid AG-InP composite material are shown to be better than those of previously reported bare AG and AG-GaN networks. Robustness, elastic behavior and excellent translation of the mechanical deformation to variations in electrical conductivity highlight the prospects of AG-InP applications in tactile/strain sensors and other device structures related to flexible electronics